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公开(公告)号：WO2023085217A1
公开(公告)日：2023-05-19
申请号：PCT/JP2022/041296
申请日：2022-11-07
Applicant: 株式会社レゾナック
IPC: G01N21/88 , G01N21/956
Abstract: 検査対象物の表面に存在する散乱体を種別に応じて効率的に検出するための検査条件を提示する。検査条件提示装置は、異なる種別の散乱体が存在する検査対象物の表面に複数の入射条件候補に従って検査光を照射したときの散乱光の強度分布を計算する強度計算部と、散乱光の強度が最大となる入射条件候補をユーザに提示する入射条件提示部と、を備える。
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公开(公告)号：WO2023072880A1
公开(公告)日：2023-05-04
申请号：PCT/EP2022/079675
申请日：2022-10-24
Applicant: ASML NETHERLANDS B.V.
Inventor： CAPPELLI, Douglas, C.
Abstract: An inspection apparatus includes a radiation source, an optical system, and a detector. The radiation source generates a beam of radiation. The optical system directs the beam along an optical axis and toward a target so as to produce scattered radiation from the target. The optical system includes a beam displacer including four reflective surfaces having a spatial arrangement. The beam displacer receives the beam along the optical axis, performs reflections of the beam so as to displace the optical axis of the beam, rotates to shift the displaced optical axis, and preserves polarization of the beam such that a polarization state of the beam along the deflected optical axis is invariant to the rotating based on the spatial arrangement of the four reflective surfaces. The detector receives the scattered radiation to generate a measurement signal based on the received scattered radiation.
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公开(公告)号：WO2023066617A1
公开(公告)日：2023-04-27
申请号：PCT/EP2022/076754
申请日：2022-09-27
Applicant: ASML NETHERLANDS B.V.
Inventor： KUZUCU, Oktay, Onur
IPC: G03F7/20 , G01N21/956
Abstract: Disclosed is method of correcting a metrology image for an out-of-band leakage signal contribution resultant from leakage of measurement radiation at suppressed wavelengths. The method comprises: obtaining at least one correction image, said correction image obtained using measurement radiation with all wavelengths or wavelength bands maximally suppressed by a radiation modulation device; obtaining a metrology image using measurement radiation comprising modulated broadband radiation, modulated by the radiation modulation device to obtain a configured spectrum; and using the at least one correction image to correct the metrology image.
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公开(公告)号：WO2023033627A1
公开(公告)日：2023-03-09
申请号：PCT/KR2022/013347
申请日：2022-09-06
Applicant: 삼성전자 주식회사 , 서울대학교산학협력단
IPC: G01N21/88 , G01N21/956 , G01N21/95
Abstract: 설계하는 방법에서, 방법은 상기 돔 조명의 홀에 따른 반경 감소분에 기반하여 상기 돔 조명과 상기 동축 조명 사이의 거리를 결정하는 동작, 상기 동축 조명에서 방사된 광선의 광로에 기반하여 상기 동축 조명의 크기를 결정하는 동작 및 상기 동축 조명에서 방사된 광선이 대상체에 반사되는 돌아오는 광로에 기반하여 상기 돔 조명의 PCB 구조를 결정하는 동작을 포함할 수 있다. 다양한 실시예에 따른 광학 시스템에서, 광학 시스템은 돔 조명, 및 동축 조명을 포함하고, 상기 돔 조명의 홀에 따른 반경 감소분에 기반하여 결정된 상기 돔 조명 상기 동축 조명 사이의 거리에 대응하여 상기 돔 조명과 상기 동축 조명이 배치되고, 상기 동축 조명에서 방사된 광선의 광로에 기반하여 상기 동축 조명의 크기가 결정되고, 상기 동축 조명에서 방사된 광선이 대상체에 반사되는 돌아오는 광로에 기반하여 상기 돔 조명의 PCB 구조가 결정되는 것을 특징으로 할 수 있다. 이 밖에 다양한 실시예들이 가능하다.
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公开(公告)号：WO2023027931A1
公开(公告)日：2023-03-02
申请号：PCT/US2022/040674
申请日：2022-08-18
Applicant: KLA CORPORATION
Inventor： LIN, Brian C. , LI, Jiqiang , WU, Song , ZHAN, Tianrong , LAGODZINSKI, Andrew
IPC: G01N21/95 , G01N21/956 , G01N21/88 , G01B11/24 , H01L21/66
Abstract: Methods and systems for selecting measurement locations on a wafer for subsequent detailed measurements employed to characterize the entire wafer are described herein. High throughput measurements are performed at a relatively large number of measurement sites on a wafer. The measurement signals are transformed to a new mathematical basis and reduced to a significantly smaller dimension in the new basis. A set of representative measurement sites is selected based on analyzing variation of the high throughput measurement signals. In some embodiments, the spectra are subdivided into a set of different groups. The spectra are grouped together to minimize variance within each group. Furthermore, a die location is selected that is representative of the variance exhibited by the die in each group. A spectrum of a measurement site and corresponding wafer location is selected to correspond most closely to the center point of each cluster.
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Patent Agency Ranking
公开(公告)号：WO2023009684A1
公开(公告)日：2023-02-02
申请号：PCT/US2022/038603
申请日：2022-07-28
Applicant: KLA CORPORATION
Inventor： FIELDEN, John , CHUANG, Yung-Ho, Alex
Abstract: An amorphous layer is used as a protective coating for hygroscopic nonlinear optical crystals. The amorphous layer consists of one or more alkali metal borates and/or alkali earth metal borates. The amorphous layer slows or prevents water and/or oxygen from diffusing into the hygroscopic nonlinear optical crystal, thus simplifying handling, storage and operating environmental requirements. One or multiple additional coating layers may be placed on top of the amorphous layer, with the additional coating layers including conventional optical materials. The thicknesses of the amorphous layer and/or additional layers may be chosen to reduce reflectance of the optical component at one or more specific wavelengths. The coated nonlinear optical crystal is used in an illumination source utilized in a semiconductor inspection system, a metrology system, or a lithography system.
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公开(公告)号：WO2022265919A1
公开(公告)日：2022-12-22
申请号：PCT/US2022/032925
申请日：2022-06-10
Applicant: KLA CORPORATION
Inventor： PANDEV, Stilian Ivanov , MOON, Min-Yeong
Abstract: Methods and systems for measurement of wafer tilt and overlay are described herein. In some embodiments, the measurements are based on the value of an asymmetry response metric and known wafer statistics. Spectral measurements are performed at two different azimuth angles, preferably separated by one hundred eighty degrees. A sub-range of wavelengths is selected with significant signal sensitivity to wafer tilt or overlay. An asymmetry response metric is determined based on a difference between the spectral signals measured at the two different azimuth angles within the selected sub-range of wavelengths. The value of the asymmetry response metric is mapped to an estimated value of wafer tilt or overlay. In some other embodiments, the measurement of wafer tilt or overlay is based on a trained measurement model. Training data may be programmed or determined based on one or more asymmetry response metrics at two different azimuth angles.
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公开(公告)号：WO2022264773A1
公开(公告)日：2022-12-22
申请号：PCT/JP2022/021568
申请日：2022-05-26
Applicant: 株式会社デンソー
Inventor： 林 邦彦
IPC: G01N21/956 , G01C3/00 , G01C3/06 , G01S7/481
Abstract: 照射光の反射に基づき距離を計測する光計測装置の製造工程において、可視域外の所定の波長範囲の光を透過するように構成された光透過部材の第１の面に設けられたランドに接着部材を用いて電子部品を取り付ける部品取付工程よりも後に実施される接着状態の検査方法である。接着状態の検査方法は、前記光透過部材に前記第１の面とは反対側の第２の面から前記波長範囲内の透過光を照射して、その反射光を受光すること（Ｓ１０２）と、前記反射光に基づき前記接着状態を検出すること（Ｓ１０３～Ｓ１０５）と、を含む。前記部品取付工程において、前記接着部材は、前記ランドからはみ出すように塗布される。
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公开(公告)号：WO2022252698A1
公开(公告)日：2022-12-08
申请号：PCT/CN2022/076878
申请日：2022-02-18
Applicant: 清华大学深圳国际研究生院
IPC: G01N21/956 , G01N21/88 , G06T7/00
Abstract: 一种基于结构光场视频流的缺陷检测方法和装置，方法包括：A1：构建包含基于主动式编码结构光源和光场视觉传感器的检测装置；A2：用白图像对光场视觉传感器进行标定，根据标定结果解码光场视觉传感器获取的结构光场视频流，得到实时微透镜图像视频流；A3：对实时微透镜图像视频流进行运动校正、灰度校正以及感兴趣区域校正后计算帧间相似度，建立对微透镜的局部缺陷检测结果；A4：利用光场视频的空域、时域相关性，统计缺陷特征在相邻微透镜上的分布情况，得到结构光场视频缺陷检测结果，结合编码结构光技术与光场成像技术，在更高的维度上捕捉表面缺陷在光场视频流中导致的编码图案几何畸变，提高了机器视觉缺陷检测的准确度与稳定性。
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公开(公告)号：WO2022251108A1
公开(公告)日：2022-12-01
申请号：PCT/US2022/030520
申请日：2022-05-23
Inventor： CHOWHAN, Tushar , LINFORD, Brandon Paul , SCHMIDT, Scott
IPC: G01N21/956 , G06T7/529 , G06T7/13
Abstract: Embodiments of the invention relate to automatically dull grading drill bits and portions thereof based on three-dimensional digital models made from one or more images of the drill bits taken at a drilling site by an electronic device with a time-of-flight camera, wherein a method for evaluating drill bits at a site of a drilling rig is disclosed. The method includes receiving, from a requestor, a plurality of images of a drill bit that has been used, at least some of the plurality of images including time-of-flight images that have been captured by an electronic device (e.g„ a computing device, an electronic device, etc.) on-site at or near a drill rig. The method includes generating a digital model of the drill bit based on the plurality of images.
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