公开(公告)号：WO2021249711A1

公开(公告)日：2021-12-16

申请号：PCT/EP2021/062487

申请日：2021-05-11

Applicant: ASML NETHERLANDS B.V.

Inventor： GOORDEN, Sebastianus, Adrianus ,  HUISMAN, Simon, Reinald ,  PELLEMANS, Henricus, Petrus, Maria ,  ALPEGGIANI, Filippo ,  BRINKHOF, Ralph

IPC: G03F7/20 ,  G03F9/00 ,  G03F7/70633 ,  G03F9/7003 ,  G03F9/7046 ,  G03F9/7092

Abstract: Disclosed is method of determining a position value relating to at least one target, and associated apparatuses. The method comprises obtaining measurement data relating to measurement of at least one target; wherein the measurement data comprises at least two parameter distributions which each describe variation of a parameter value over at least part of said target, and where said at least two parameter distributions comprises at least one position distribution which describes variation of said position value over at least part of said target. The method further comprises determining a weighting factor for at least one of said at least two parameter distributions and a corresponding weighted position distribution, wherein the weighting factor(s) minimizes a variation metric in the weighted position distribution, and said weighted position distribution comprises a combination of said at least two parameter distributions subject to said weighting factor(s).

公开(公告)号：WO2021239754A1

公开(公告)日：2021-12-02

申请号：PCT/EP2021/063947

申请日：2021-05-25

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin

IPC: H01J37/244 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/24495 ,  H01J2237/24521 ,  H01J2237/2817

Abstract: A detector includes a plurality of sensing elements, section circuitry that communicatively couples a first set of sensing elements to an input of first signal processing circuitry, and a switch network that connects sets of sensing elements. Inter-element switches may connect adjacent sensing elements, including those in a diagonal direction. An output bus may be connected to each sensing element of the first set by a switching element. There may be a common output (pickup point) arranged at one sensing element that is configured to output signals from the first set. Various switching and wiring schemes are proposed. For example, the common output may be directly connected to the switch network. A switch may be provided between the output bus and first signal processing circuitry. A switch may be provided between the switch network and the first signal processing circuitry.

公开(公告)号：WO2021239448A1

公开(公告)日：2021-12-02

申请号：PCT/EP2021/062263

申请日：2021-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： MARELLI, Mattia ,  HAJIAHMADI, Mohammadreza

IPC: G03F9/00 ,  G03F7/20

Abstract: Disclosed is a method for determining a focus parameter value used to expose at least one structure on a substrate. The method comprises obtaining measurement data relating to a measurement of said at least one structure, wherein the at least one structure comprises a single periodic structure per measurement location and decomposing said measurement data into component data comprising one or more components of said measurement data. At least one of said components is processed to extract processed component data having a reduced dependence on non-focus related effects and a value for the focus parameter is determined from said processed component data. Associated apparatuses and patterning devices are also disclosed.

公开(公告)号：WO2021239334A1

公开(公告)日：2021-12-02

申请号：PCT/EP2021/060157

申请日：2021-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： ROY, Sarathi ,  HENKE, Wolfgang, Helmut ,  TEN BERGE, Peter

IPC: G03F7/20 ,  G01N21/95 ,  H01L21/02

Abstract: Disclosed is a method and associated apparatuses for optimizing a sampling scheme which defines sampling locations on a bonded substrate, having undergone a wafer to wafer bonding process. The method comprises determining a sampling scheme for a metrology process and optimizing the sampling scheme with respect to a singularity (SG) defined by a large overlay error and/or grid deformation at a central location on the bonded substrate to obtain a modified sampling scheme.

公开(公告)号：WO2021233615A1

公开(公告)日：2021-11-25

申请号：PCT/EP2021/060007

申请日：2021-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： DE GERSEM, Gudrun, Ghilaine, Agnes ,  HAMELINCK, Roger, Franciscus, Mattheus, Maria ,  VAN DUIVENBODE, Jeroen

IPC: H02K41/03 ,  G03F7/20 ,  H02K55/00 ,  H01F6/06

Abstract: The invention provides a magnet assembly for a planar electromagnetic motor, the magnet assembly comprising: - a first plurality of superconductive (SC) coils, inside an outer circumference and arranged in a planar pattern such as a rectangular pattern, - a second plurality of SC coils, arranged along an outer boundary of the planar pattern, a coil of the first plurality of SC coils having a first in-plane shape and a coil of the second plurality of SC coils having a second in-plane shape, different from the first in-plane shape, wherein the second plurality of SC coils is arranged at least partly inside the outer circumference.

公开(公告)号：WO2021228517A1

公开(公告)日：2021-11-18

申请号：PCT/EP2021/060304

申请日：2021-04-21

Applicant: STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM ,  STICHTING VU ,  ASML NETHERLANDS B.V.

Inventor： BEHNKE, Lars, Peter

IPC: G03F7/20 ,  H05G2/00 ,  G02F1/39

Abstract: An EUV radiation source comprising a fuel emitter configured to produce fuel droplets; a laser system configured to illuminate a fuel droplet at a plasma formation region, the laser system comprising: a first laser configured to produce radiation of a first wavelength in a first radiation beam, a second laser configured to produce radiation of a second wavelength in a second radiation beam, and a first parametric amplifier arranged to receive the radiation of the first wavelength and radiation of the second wavelength and generate an amplified radiation beam; and a beam delivery system for delivering the amplified radiation beam to the plasma formation region.

公开(公告)号：WO2021224009A1

公开(公告)日：2021-11-11

申请号：PCT/EP2021/060403

申请日：2021-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ZWIER, Olger, Victor ,  VAN DER SCHAAR, Maurits ,  BOS, Hilko, Dirk ,  VAN DER LAAN, Hans ,  AL ARIF, S. M. Masudur Rahman ,  VAN BUEL, Henricus, Wilhelmus, Maria ,  KOOLEN, Armand, Eugene, Albert ,  CALADO, Victor, Emanuel ,  BHATTACHARYYA, Kaustuve ,  LIAN, Jin ,  GOORDEN, Sebastianus, Adrianus ,  LIM, Hui Quan

IPC: G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F1/42 ,  G03F7/20 ,  G03F9/00

Abstract: Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.

公开(公告)号：WO2021213870A1

公开(公告)日：2021-10-28

申请号：PCT/EP2021/059714

申请日：2021-04-14

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN RENS, Jasper, Frans, Mathijs ,  MANGNUS, Albertus, Victor, Gerardus

IPC: H01J37/147 ,  H01J37/28

Abstract: The present disclosure relates to an inspection tool having a charged particle source to provide a charged particle beam, a sample holder to hold a sample, and a scanning system configured to scan the charged particle beam over an area of the sample in a scanning pattern. The scanning system may comprise a microwave or RF wave supporting structure to provide a first oscillating electromagnetic field to periodically deflect the charged particle beam in order to scan the charged particle beam over the area of the sample. The charged particle beam may be an electron beam, so that the inspection tool may be a scanning electron microscope. The scanning system may be configured to continuously scan the charged particle beam over the area of the sample.

公开(公告)号：WO2021213745A1

公开(公告)日：2021-10-28

申请号：PCT/EP2021/057121

申请日：2021-03-19

Applicant: ASML NETHERLANDS B.V.

Inventor： HUIBERTS, Sjoerd, Martijn ,  VAN DER MEULEN, René, Josephus, Johannes ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus

IPC: G03F7/20 ,  H02K41/00 ,  G02B7/182

Abstract: Disclosed is an actuator unit for positioning an optical element, comprising a first reluctance actuator comprising a first stator part and a first mover part separated by a gap in a first direction. The first mover part is constructed and arranged to be connected to the optical element and for moving the optical element. The first stator part is constructed and arranged to exert a magnetic force on the first mover part along a first line of actuation. The first mover part is movable relative to the first stator part in the first direction. The first stator part and the first mover part are constructed and arranged such that the first line of actuation is, in operational use, moving along with the first mover part in a second direction perpendicular to the first direction, for at least a predetermined movement range of the first mover part in the second direction.

公开(公告)号：WO2021209273A1

公开(公告)日：2021-10-21

申请号：PCT/EP2021/058739

申请日：2021-04-01

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： PAWLOWSKI, Michal, Emanuel ,  BENDIKSEN, Aage ,  DOHAN, Christopher, Michael ,  ONVLEE, Johannes

IPC: G01N21/25 ,  G01N21/47 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F7/20 ,  G01N21/88 ,  G01N21/95

Abstract: An inspection system, a lithography apparatus, and an inspection method are provided. The inspection system includes an illumination system, a detection system, and processing circuitry. The illumination system generates a broadband beam and illuminates a surface of an object with the broadband illumination beam. The broadband beam has a continuous spectral range. The detection system receives radiation scattered at the surface and by a structure near the surface. The detection system generates a detection signal based on an optical response to the broadband illumination beam. The processing circuitry analyzes the detection signal. The processing circuitry distinguishes between a spurious signal and a signal corresponding to a defect on the surface based on the analyzing. The spurious signal is diminished for at least a portion of the continuous spectral range.