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1.发明申请
公开(公告)号：WO2021239479A1
公开(公告)日：2021-12-02
申请号：PCT/EP2021/062894
申请日：2021-05-14
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： GOORDEN, Sebastianus, Adrianus , ALPEGGIANI, Filippo , HUISMAN, Simon, Reinald , BASELMANS, Johannes, Jacobus, Matheus , KOK, Haico, Victor , SWILLAM, Mohamed , BEUKMAN, Arjan, Johannes, Anton
IPC: G03F7/20
Abstract: A metrology system includes a radiation source, first, second, and third optical systems, and a processor. The first optical system splits the radiation into first and second beams of radiation and impart one or more phase differences between the first and second beams. The second optical system directs the first and second beams toward a target structure to produce first and second scattered beams of radiation. The third optical system interferes the first and second scattered beams at an imaging detector. The imaging detector generates a detection signal based on the interfered first and second scattered beams. The metrology system modulates one or more phase differences of the first and second scattered beams based on the imparted one or more phase differences. The processor analyzes the detection signal to determine a property of the target structure based on at least the modulated one or more phase differences.
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2.发明申请
公开(公告)号：WO2022122565A1
公开(公告)日：2022-06-16
申请号：PCT/EP2021/084056
申请日：2021-12-02
Inventor： KREUZER, Justin, Lloyd , HUISMAN, Simon, Reinald , GOORDEN, Sebastianus, Adrianus , ALPEGGIANI, Filippo
IPC: G03F7/20
Abstract: The system includes a radiation source, a diffractive element, an optical system, a detector, and a processor. The radiation source generates radiation. The diffractive element diffracts the radiation to generate a first beam and a second beam. The first beam includes a first non-zero diffraction order and the second beam includes a second non-zero diffraction order that is different from the first non-zero diffraction order. The optical system receives a first scattered beam and a second scattered radiation beam from a target structure and directs the first scattered beam and the second scattered beam towards a detector. The detector generates a detection signal. The processor analyzes the detection signal to determine a target structure property based on at least the detection signal. The first beam is attenuated with respect to the second beam or the first scattered beam is purposely attenuated with respect to the second scattered beam.
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公开(公告)号：WO2021110391A1
公开(公告)日：2021-06-10
申请号：PCT/EP2020/082170
申请日：2020-11-16
Applicant: ASML NETHERLANDS B.V.
Inventor： SOKOLOV, Sergei , ALPEGGIANI, Filippo , GOORDEN, Sebastianus, Adrianus , HUISMAN, Simon, Reinald
Abstract: Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.
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Patent Agency Ranking
公开(公告)号：WO2023030832A1
公开(公告)日：2023-03-09
申请号：PCT/EP2022/072151
申请日：2022-08-05
Applicant: ASML NETHERLANDS B.V.
Abstract: Systems, apparatuses, and methods are provided for correcting an alignment measurement or overlay error. An example method can include measuring an observable in response to an illumination of a region of a surface by a radiation beam, such as interference between radiation diffracted from the region. The example method can further include generating a measurement signal indicative of the observable. In some aspects, the measurement signal can include interference fringe pattern data indicative of the measured interference. The example method can further include determining a correction to a measurement value based on measurement signal. Optionally, the correction can include a correction to an alignment measurement of an alignment sensor, a correction to an overlay error of an overlay sensor, or both.
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公开(公告)号：WO2022156978A1
公开(公告)日：2022-07-28
申请号：PCT/EP2021/086861
申请日：2021-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： ALPEGGIANI, Filippo , BELT, Harm, Jan, Willem , GOORDEN, Sebastianus, Adrianus , SETIJA, Irwan, Dani , HUISMAN, Simon, Reinald , PELLEMANS, Henricus, Petrus, Maria
Abstract: Disclosed is a method for measuring a parameter of interest from a target and associated apparatuses. The method comprises obtaining measurement acquisition data relating to measurement of the target and finite-size effect correction data and/or a trained model operable to correct for at least finite-size effects in the measurement acquisition data. At least finite-size effects in the measurement acquisition data is corrected for using the finite-size effect correction data and/or a trained model to obtain corrected measurement data and/or a parameter of interest; and, where the correction step does not directly determine the parameter of interest, determining the parameter of interest from the corrected measurement data.
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公开(公告)号：WO2022135870A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/084063
申请日：2021-12-02
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： BEUKMAN, Arjan, Johannes, Anton , GOORDEN, Sebastianus, Adrianus , ROUX, Stephen , SOKOLOV, Sergei , ALPEGGIANI, Filippo
Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
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公开(公告)号：WO2021249711A1
公开(公告)日：2021-12-16
申请号：PCT/EP2021/062487
申请日：2021-05-11
Applicant: ASML NETHERLANDS B.V.
Inventor： GOORDEN, Sebastianus, Adrianus , HUISMAN, Simon, Reinald , PELLEMANS, Henricus, Petrus, Maria , ALPEGGIANI, Filippo , BRINKHOF, Ralph
IPC: G03F7/20 , G03F9/00 , G03F7/70633 , G03F9/7003 , G03F9/7046 , G03F9/7092
Abstract: Disclosed is method of determining a position value relating to at least one target, and associated apparatuses. The method comprises obtaining measurement data relating to measurement of at least one target; wherein the measurement data comprises at least two parameter distributions which each describe variation of a parameter value over at least part of said target, and where said at least two parameter distributions comprises at least one position distribution which describes variation of said position value over at least part of said target. The method further comprises determining a weighting factor for at least one of said at least two parameter distributions and a corresponding weighted position distribution, wherein the weighting factor(s) minimizes a variation metric in the weighted position distribution, and said weighted position distribution comprises a combination of said at least two parameter distributions subject to said weighting factor(s).
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公开(公告)号：WO2021083704A1
公开(公告)日：2021-05-06
申请号：PCT/EP2020/079372
申请日：2020-10-19
Applicant: ASML NETHERLANDS B.V.
Inventor： ALPEGGIANI, Filippo , PELLEMANS, Henricus, Petrus, Maria , GOORDEN, Sebastianus, Adrianus , HUISMAN, Simon, Reinald
IPC: G03F9/00
Abstract: Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.
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