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公开(公告)号：WO2021018643A1
公开(公告)日：2021-02-04
申请号：PCT/EP2020/070395
申请日：2020-07-18
Applicant: ASML NETHERLANDS B.V.
Inventor： FANG, Wei , REN, Weiming , CHEN, Zhong-wei
IPC: H01J37/28
Abstract: Inspection systems and methods are disclosed. An inspection system may include a first energy source configured to provide a first landing energy beam and a second energy source configured to provide a second landing energy beam. The inspection system may also include a beam controller configured to selectively deliver one of the first and second landing energy beams towards a same field of view, and to switch between delivery of the first and second landing energy beams according to a mode of operation of the inspection system.
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公开(公告)号：WO2020239507A1
公开(公告)日：2020-12-03
申请号：PCT/EP2020/063833
申请日：2020-05-18
Applicant: ASML NETHERLANDS B.V.
Inventor： REN, Weiming , LIU, Xuedong , HU, Xuerang , CHEN, Zhong-wei
IPC: H01J37/12
Abstract: Systems and methods of reducing the Coulomb interaction effects in a charged particle beam apparatus are disclosed. The charged particle beam apparatus may comprise a charged particle source and a source conversion unit comprising an aperture-lens forming electrode plate configured to be at a first voltage, an aperture lens plate configured to be at a second voltage that is different from the first voltage for generating a first electric field, which enables the aperture-lens forming electrode plate and the aperture lens plate to form aperture lenses of an aperture lens array to respectively focus a plurality of beamlets of the charged particle beam, and an imaging lens configured to focus the plurality of beamlets on an image plane. The charged particle beam apparatus may comprise an objective lens configured to focus the plurality of beamlets onto a surface of the sample and form a plurality of probe spots thereon.
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公开(公告)号：WO2019211072A1
公开(公告)日：2019-11-07
申请号：PCT/EP2019/059206
申请日：2019-04-11
Applicant: ASML NETHERLANDS B.V.
Inventor： HU, Xuerang , LIU, Xuedong , CHEN, Zhongwei , REN, Weiming
IPC: H01J37/317
Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro- structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.
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公开(公告)号：WO2023078628A1
公开(公告)日：2023-05-11
申请号：PCT/EP2022/077738
申请日：2022-10-05
Applicant: ASML NETHERLANDS B.V.
Inventor： JI, Xiaoyu , GONG, Zizhou , REN, Weiming
Abstract: An improved method of wafer inspection is disclosed. The improved method includes a non- transitory computer-readable medium storing a set of instructions that are executable by at least one processor of a device to cause the device to perform a method comprising: placing the wafer at a location on a stage; moving one or more movable segments of a conductive ring inward in a radial direction to enable the conductive ring to be within a predetermined distance from an edge of the wafer; and adjusting a voltage applied to the conductive ring or to a voltage applied to the wafer so that to enable the voltage applied to the conductive ring to be substantially equal to the voltage applied to the wafer to provide a substantially consistent electric field across an inner portion of the conductive ring and an outer portion of the wafer.
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公开(公告)号：WO2021073868A1
公开(公告)日：2021-04-22
申请号：PCT/EP2020/077276
申请日：2020-09-30
Applicant: ASML NETHERLANDS B.V.
Inventor： REN, Weiming , LIU, Xuedong , CHEN, Zhong-wei , JI, Xiaoyu , CHEN, Xiaoxue , ZHOU, Weimin , ZHANG, Frank, Nan
Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged- particle beam used to inspect the sample surface.
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Patent Agency Ranking
公开(公告)号：WO2020239504A1
公开(公告)日：2020-12-03
申请号：PCT/EP2020/063829
申请日：2020-05-18
Applicant: ASML NETHERLANDS B.V.
Inventor： REN, Weiming , LIU, Xuedong , HU, Xuerang , CHEN, Zhong-wei , MAASSEN, Martinus, Gerardus, Maria, Johannes
Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.
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17.发明申请
公开(公告)号：WO2020193102A1
公开(公告)日：2020-10-01
申请号：PCT/EP2020/055959
申请日：2020-03-06
Applicant: ASML NETHERLANDS B.V.
Inventor： XI, Qingpo , HU, Xuerang , LIU, Xuedong , REN, Weiming , CHEN, Zhong-wei
IPC: H01J37/05 , H01J37/147 , H01J37/28
Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.
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公开(公告)号：WO2019057644A1
公开(公告)日：2019-03-28
申请号：PCT/EP2018/074985
申请日：2018-09-14
Applicant: ASML NETHERLANDS B.V.
Inventor： MAASSEN, Martinus, Gerardus, Maria, Johannes , HEMPENIUS, Peter, Paul , REN, Weiming , CHEN, Zhongwei
Abstract: A charged particle beam apparatus includes a beamlet forming unit configured to form and scan an array of beamlets (410) on a sample (440). A first portion of the array of beamlets is focused onto a focus plane (430), and a second portion of the array of beamlets has at least one beamlet with a defocusing level (490) with respect to the focus plane. The charged particle beam apparatus also includes a detector configured to detect an image of the sample formed by the array of beamlets, and a processor configured to estimate a level of separation between the focus plane and the sample based on the detected image and then reduce the level of separation based on the estimated level.
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19.发明申请
公开(公告)号：WO2019020396A1
公开(公告)日：2019-01-31
申请号：PCT/EP2018/068980
申请日：2018-07-12
Applicant: ASML NETHERLANDS B.V. , HERMES MICROVISION, INC.
Inventor： REN, Weiming , LIU, Xuedong , HU, Xuerang , LUO, Xinan , CHEN, Zhongwei
IPC: H01J37/05 , H01J37/147 , H01J37/28 , H01J37/244
Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.
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20.发明申请
公开(公告)号：WO2022135920A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/084694
申请日：2021-12-08
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Yongxin , KRUPIN, Oleg , REN, Weiming , HU, Xuerang , LIU, Xuedong
IPC: H01J37/244 , H01J37/28
Abstract: A method of detecting charged particles may include detecting beam intensity as a primary charged particle beam moves along a first direction; acquiring a secondary beam spot projection pattern as the primary charged particle beam moves along a second direction; and determining a parameter of a secondary beam spot based on the acquired secondary beam spot projection pattern. A method of compensating for beam spot changes on a detector may include acquiring a beam spot projection pattern on the detector, determining a change of the beam spot projection pattern, and adjusting a parameter of a detector cell of the detector based on the change. Another method may be provided for forming virtual apertures with respect to detector cells of a detector.
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