PROCESS FOR THE PREPARATION OF ENOLATE SALTS OF 4-FLUORO-2-HYDROXYMETHYLENE-3-OXO-BUTYRATES
    11.
    发明申请
    PROCESS FOR THE PREPARATION OF ENOLATE SALTS OF 4-FLUORO-2-HYDROXYMETHYLENE-3-OXO-BUTYRATES 审中-公开
    4-氟-2-羟基乙烯基-3-氧代丁酸酯的增溶盐的制备方法

    公开(公告)号:WO2012007142A1

    公开(公告)日:2012-01-19

    申请号:PCT/EP2011003445

    申请日:2011-07-11

    Abstract: Enolate salts of 4-fluoro-2-hydroxymethylene-3-oxobutyrates of formula wherein R1 is C1-10 alkyl, R2 and R3 are independently hydrogen or fluorine, M is an alkali or alkaline earth metal, and n is 1 or 2, are prepared from enolate salts of the corresponding 4-fluoro-3-oxobutyrates and carbon monoxide. The enolate salts of formula I can be alkylated or acylated to obtain the corresponding enol ethers and esters. The 4-fluoro-3-oxobutyrate starting material can be prepared from 1,1-difluoroethyl methyl ethers by SbF5-catalyzed fluoromethane elimination followed by halogen exchange with lithium chloride, reacting the thus obtained fluoroacetyl chloride with ketene and quenching with the appropriate alcohol R1-OH.

    Abstract translation: 4-氟-2-羟基亚甲基-3-氧代丁酸烯醇盐,其中R1是C1-10烷基,R2和R3独立地是氢或氟,M是碱金属或碱土金属,n是1或2是 由相应的4-氟-3-氧代丁酸乙酯和一氧化碳的烯醇盐制备。 式I的烯醇化盐可被烷基化或酰化,得到相应的烯醇醚和酯。 4-氟-3-氧代丁酸酯原料可以由1,1-二氟乙基甲基醚通过SbF 5催化的氟甲烷消除制备,随后与氯化锂进行卤素交换,使得到的氟乙酰氯与乙烯酮反应,并用适当的醇R 1 -哦。

    エッチングガス
    12.
    发明申请
    エッチングガス 审中-公开
    蚀刻气体

    公开(公告)号:WO2011068039A1

    公开(公告)日:2011-06-09

    申请号:PCT/JP2010/070656

    申请日:2010-11-19

    Abstract: 開示されているのは、CHF 2 COFを含んでなるエッチングガスである。このエッチングガスは、O 2 、O 3 、CO、CO 2 、F 2 、NF 3 、Cl 2 、Br 2 、I 2 、XF n (式中、XはCl、IまたはBrを表し、nは1≦n≦7の整数を表す。)、CH 4 、CH 3 F、CH 2 F 2 、CHF 3 、N 2 、He、Ar、Ne、Krなど、または、CH 4 、C 2 H 2 ,C 2 H 4 ,C 2 H 6 、C 3 H 4 、C 3 H 6 、C 3 H 8 、HI、HBr、HCl、CO、NO、NH 3 、H 2 など、または、CH 4 、CH 3 F、CH 2 F 2 、CHF 3 の中から選ばれた少なくとも1種のガスを添加物として含んでもよい。このエッチングガスは、対レジスト選択比や加工形状のエッチング性能に優れるだけでなく、入手が容易で、環境に負荷をかけるCF 4 を実質的に副生しない。

    Abstract translation: 公开了含有CHF 2 COF的蚀刻气体。 蚀刻气体可以含有选自O 2,O 3,CO,CO 2,F 2,NF 3,Cl 2,Br 2,I 2,X F n中的至少一种气体作为添加剂(其中X为Cl,I或Br; n为 CH 4,C 2 H 2,C 2 H 4,C 2 H 6,C 3 H 4,C 3 H 6,C 3 H 8,C 4 H 4,C 4 H 6,C 3 H 8, HI,HBr,HCl,CO,NO,NH 3,H 2等,或从CH 4,CH 3 F,CH 2 F 2和CHF 3中。 作为副产物,蚀刻气体容易获得蚀刻选择性(基板与抗蚀剂的蚀刻速率比)和蚀刻轮廓等优异的蚀刻性能,并且基本上不产生CF4(这是环境负荷的原因)。

    PRODUCTION OF ORGANIC COMPOUNDS WHICH ARE LOW IN FLUORIDE
    16.
    发明申请
    PRODUCTION OF ORGANIC COMPOUNDS WHICH ARE LOW IN FLUORIDE 审中-公开
    有机氟化合物的制备

    公开(公告)号:WO0001647A3

    公开(公告)日:2000-04-06

    申请号:PCT/EP9904477

    申请日:1999-06-29

    Abstract: Organic compounds, e.g., fluoro-organic compounds such as fluorocarboxylic acids or carboxylic acid chlorides can contain small quantities of carboxylic acid fluorides, HF or hydrolysable fluoride. Corrosive fluorides or hydrofluoric acid are then formed during derivatization, e.g., esterification. The invention relates to a method for producing especially fluoro-organic compounds such as carboxylic acids, carboxylic acid chlorides and derivatives thereof, e.g., carboxylic acid esters, from carboxylic acid chlorides containing acid fluorides or hydrolysable fluoride as appropriate, and alcohols, using the catalytic effect of "onium" salts of carboxylic acids. The products are low in fluoride. Alternatively, an inorganic-oxidic sorbent is used. The method is particularly suitable for producing esters of trifluoroacetic acid, chlorodifluoroacetic acid and trifluoroacetoacetic acid and difluoroacetoacetic acid.

    Abstract translation: 有机化合物,例如 氟代有机化合物如氟代羧酸或碳酰氯可能含有少量的羧酸氟化物,HF或可水解的氟化物。 在衍生中,例如 然后通过腐蚀性氟化物或HF形成酯化。 描述了一种特别制备有机氟化合物如羧酸,羧酸氯化物及其衍生物的方法, 在羧酸的“鎓”盐的催化作用下,相应的酰基氟化物或含可水解的氟化物的羧酸氯化物和醇的羧酸酯,其中产物得到贫氟化物。 或者,使用无机 - 氧化吸附剂。 该方法特别适用于制备三氟乙酸,一氯二氟乙酸和三氟乙酸以及二氟乙酰乙酸的酯。

    PRODUCTION OF ORGANIC COMPOUNDS WHICH ARE LOW IN FLUORIDE
    17.
    发明申请
    PRODUCTION OF ORGANIC COMPOUNDS WHICH ARE LOW IN FLUORIDE 审中-公开
    PRODUCING FLUORIDE ARMS有机化合物

    公开(公告)号:WO00001647A2

    公开(公告)日:2000-01-13

    申请号:PCT/EP1999/004477

    申请日:1999-06-29

    Abstract: Organic compounds, e.g., fluoro-organic compounds such as fluorocarboxylic acids or carboxylic acid chlorides can contain small quantities of carboxylic acid fluorides, HF or hydrolysable fluoride. Corrosive fluorides or hydrofluoric acid are then formed during derivatization, e.g., esterification. The invention relates to a method for producing especially fluoro-organic compounds such as carboxylic acids, carboxylic acid chlorides and derivatives thereof, e.g., carboxylic acid esters, from carboxylic acid chlorides containing acid fluorides or hydrolysable fluoride as appropriate, and alcohols, using the catalytic effect of "onium" salts of carboxylic acids. The products are low in fluoride. Alternatively, an inorganic-oxidic sorbent is used. The method is particularly suitable for producing esters of trifluoroacetic acid, chlorodifluoroacetic acid and trifluoroacetoacetic acid and difluoroacetoacetic acid.

    Abstract translation: 有机化合物,例如 作为氟羧酸或羧酸氯化物如有机氟化合物可以含有少量羧酸氟化物,HF或可水解的氟化物的。 在衍生化,例如 酯化然后形成腐蚀性氟化物和HF。 公开了一种用于的制备方法,在如羧酸,羧酸氯化物和它们的衍生物,例如这样的特定氟有机化合物 从通过的羧酸,其中所述产品被获得fluoridarm“鎓”盐催化作用相应的酸氟化物或可水解的含氟化物的羧酰氯和醇羧酸酯。 可替代地,使用无机氧化物的吸附剂。 该方法特别适合于三氟乙酸,氯二氟乙酸和trifluoroacetoacetic酸和氟乙酰乙酸的酯的制备。

    PRODUCTION OF CARBOXYLIC ACID FLUORIDES
    18.
    发明申请
    PRODUCTION OF CARBOXYLIC ACID FLUORIDES 审中-公开
    生产碳素酰基氟

    公开(公告)号:WO1998024750A1

    公开(公告)日:1998-06-11

    申请号:PCT/EP1997006647

    申请日:1997-11-28

    Abstract: The invention relates to a method for the production of carboxylic acid fluorides of the formula RCFXC(O)F, wherein X designates F or Cl. Compounds of the formula RCFXCHFCl are reacted with oxygen by photochemical oxidation in the gaseous phase. This yields good quantities of highly selective carboxylic acid fluorides. It is preferable to work under sensitization with chlorine and light at a wavelength of lambda >/=280 nm. This makes it possible to work without the use of pressure. Glass apparatus may be covered with a protective coating so as to protect it against traces of hydrogen fluoride. To this end, for example, heat-shrinkable sleeves made of translucent hydrogen fluoride-resistant material may be used. Polytetrafluoroethylene, polyfluoropropylene or a mixture thereof are especially suitable for this purpose. This type of protection is also suited for other reactions, such as photo-induced fluoro-dediazonation in hydrogen fluoride/pyridine for the production of aromatic compounds fluorinated in the nucleus or the oxidation of CHCL2 groups for the production of carboxylic acid fluorides.

    Abstract translation: 公开的是用于制备式RCFXC(O)F,其中X是F或Cl的羧酸氟化物的方法。 反应与氧气式RCFXCHFCl的化合物转化成在气相中的光化学氧化。 形成以良好的收率和高选择性的羧酸氟化物。 优选在敏化进行与波长为λ的氯和光> / = 280纳米。这是可能的,而不的工作压力。 玻璃装置可被提供用于防止RF迹线以保护涂层。 对于这一个就可以了,例如, 热收缩使用耐HF,半透明材料制成。 作为该材料聚四氟乙烯,Polyfluorpropylen或它们的混合物是特别合适的。 这种保护也适用于其它反应,例如,光诱导氟dediazoniation在氟化氢/吡啶生产核氟化的芳族化合物的或CHCl 2的基团为羧酸氯化物的制剂的目的氧化的目的。

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