光電変換素子及び撮像素子
    12.
    发明申请
    光電変換素子及び撮像素子 审中-公开
    光电转换元件和图像拾取元件

    公开(公告)号:WO2011118578A1

    公开(公告)日:2011-09-29

    申请号:PCT/JP2011/056829

    申请日:2011-03-22

    Abstract:  有機光電変換層を備える光電変換素子で、光照射による感度劣化を抑制する。 基板101上に第1電極層104と有機材料を含む光電変換層15と第2電極層108とが積層されてなる光電変換素子100であって、光電変換層15がP型有機半導体とN型有機半導体のバルクへテロ構造体を備え、該P型有機半導体のイオン化ポテンシャルと前記バルクへテロ構造体の見かけのイオン化ポテンシャルとの差が0.50eV以下とする。これにより、光照射による感度劣化を抑制することが可能となる。

    Abstract translation: 公开了一种包含有机光电转换层的光电转换元件,其中抑制了由于光照射导致的灵敏度劣化。 具体公开了通过层叠在基板(101)上的第一电极层(104),含有有机材料的光电转换层(15)和第二电极层( 108)。 光电转换层(15)包括P型有机半导体的体异质结构和N型有机半导体,P型有机半导体的电离电位与体异质结构的表观电离电位之间的差为 0.50 eV以下。 因此,可以抑制由于光照射引起的灵敏度劣化。

    PHOTON DETECTOR
    14.
    发明申请
    PHOTON DETECTOR 审中-公开
    光电探测器

    公开(公告)号:WO2008104761A3

    公开(公告)日:2009-01-15

    申请号:PCT/GB2008000646

    申请日:2008-02-27

    CPC classification number: H01L31/0352 H01L31/0304 H01L31/102 Y02E10/544

    Abstract: A photon detector comprising a plurality of quantum dots, a sensing region and measurement means for measuring an electrical characteristic of the sensing region, said sensing region being located such that a change in the charged state of said quantum dots causes a change in the electrical characteristics of said sensing region, the detector further comprising photon counting means for determining the number of photons detected in a pulse of radiation from changes in the electrical characteristics of the sensing region.

    Abstract translation: 包括多个量子点的光子检测器,感测区域和用于测量感测区域的电特性的测量装置,所述感测区域被定位成使得所述量子点的充电状态的变化导致电特性的变化 所述检测器还包括光子计数装置,用于根据感测区域的电特性的变化来确定在辐射脉冲中检测的光子的数量。

    INTEGRATED CIRCUIT COMPRISING AN ACTIVE OPTICAL DEVICE HAVING AN ENERGY BAND ENGINEERED SUPERLATTICE AND ASSOCIATED FABRICATION METHODS
    17.
    发明申请
    INTEGRATED CIRCUIT COMPRISING AN ACTIVE OPTICAL DEVICE HAVING AN ENERGY BAND ENGINEERED SUPERLATTICE AND ASSOCIATED FABRICATION METHODS 审中-公开
    包含具有能量带工程超级实体的有源光学装置的集成电路及相关制造方法

    公开(公告)号:WO2006031601A1

    公开(公告)日:2006-03-23

    申请号:PCT/US2005/032029

    申请日:2005-09-08

    Abstract: An integrated circuit may include at least one active optical device including a superlattice including a plurality of stacked groups of layers. Each group of layers of the superlattice may include a plurality of stacked base semiconductor monolayers defining a base semiconductor portion and an energy band-modifying layer thereon. The energy-band modifying layer may include at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. The integrated circuit may further include a waveguide coupled to the at least one active optical device.

    Abstract translation: 集成电路可以包括至少一个有源光学器件,该有源光学器件包括包含多个堆叠的层组的超晶格。 超晶格的每一组层可以包括多个堆叠的基础半导体单层,其限定基础半导体部分和其上的能带改性层。 能带修改层可以包括约束在相邻基础半导体部分的晶格内的至少一个非半导体单层。 集成电路可以进一步包括耦合到至少一个有源光学器件的波导。

    光电探测器
    18.
    发明申请
    光电探测器 审中-公开

    公开(公告)号:WO2023065573A1

    公开(公告)日:2023-04-27

    申请号:PCT/CN2022/075716

    申请日:2022-02-09

    Abstract: 本公开实施例提供的光电探测器,包括:波导结构、限光结构及吸收结构;其中,所述波导结构延伸至所述限光结构中,且所述波导结构的第一侧壁所在的第一边与所述限光结构的第二侧壁所在的第二边相切;所述波导结构用于将入射光以与所述第一边相切的方向导入所述限光结构中;通过所述限光结构侧壁的全反射将导入的光限制在限光结构内进行环形传输,并通过限光结构将导入的光耦合到吸收结构中;所述吸收结构位于所述限光结构上;通过所述吸收结构侧壁的全反射将耦合的光在水平方向上限制在吸收结构内做进行环形传输,并将耦合的光转化为电子和空穴。

    DEPTH IMAGE SENSOR WITH ALWAYS-DEPLETED PHOTODIODES

    公开(公告)号:WO2022139955A1

    公开(公告)日:2022-06-30

    申请号:PCT/US2021/057490

    申请日:2021-11-01

    Abstract: The use of an always-depleted photodiode in a Time-of-Flight, ToF, depth image sensor is disclosed. One example provides a method of operating a pixel (400) of a depth image sensor, the method comprising receiving photons in a photocharge generation region (410, 412) of the pixel (400), the photocharge generation region (410, 412) of the pixel comprising an always-depleted photodiode formed by a doped first region (410) comprising one of p-doping or n-doping and a more lightly-doped second region (412) comprising the other of p-doping or n-doping. The method further comprises, during an integration phase, energizing a clock gate for a pixel tap, thereby directing photocharge generated in the photocharge generation region (410), 412) to an in-pixel storage comprising a capacitor, and in a readout phase, reading charge out from the in-pixel storage. Pixel (400) further comprises shallow trench isolation, STI, regions (414a, 414b) disposed at the transistor side of pixel (400), and/or a divider region (416) disposed within second region (412) and between clock gates (404a, 404b). Divider region (416) comprises a different doping than more lightly-doped second region (412). The depth image sensor also includes deep trench isolation, DTI, regions (420) comprising a dielectric material disposed between pixels. An always- depleted region is created by P-N junction (402) extending through the thickness of the pixel. As a result, a permanent electric field is created that extends substantially or completely through the depth of the pixel.

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