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公开(公告)号：WO2019197126A1
公开(公告)日：2019-10-17
申请号：PCT/EP2019/057040
申请日：2019-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： CHENG, Su-Ting , SOKOLOV, Sergei , KOOLEN, Armand, Eugene, Albert
IPC: G03F7/20
Abstract: Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.
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公开(公告)号：WO2019197091A1
公开(公告)日：2019-10-17
申请号：PCT/EP2019/055937
申请日：2019-03-11
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: A component of a lithographic apparatus, the component having a contaminant trap surface provided with recesses configured to trap contaminant particles and to reduce specular reflection of DUV radiation. The recesses can have at least one dimension less than or equal to about 2 µm, desirably less than 1 µm.
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公开(公告)号：WO2019185298A1
公开(公告)日：2019-10-03
申请号：PCT/EP2019/055131
申请日：2019-03-01
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHOORMANS, Carolus, Johannes, Catharina , ADRIAENS, Johannes, Mathias, Theodorus, Antonius , VOSS, Thomas
Abstract: The invention provides a position measurement system for determining a position of an object, the position measurement system comprising a first interferometer and a second interferometer arranged to determine a distance of the object in a first direction when the object is in a first measurement area by emitting beams onto a target surface of the object. The position measurement system further comprises a third interferometer and a fourth interferometer arranged to determine a distance of the object in the first direction when the object is in a second measurement area by emitting beams onto the target surface of the object. An arrangement of relative positions in a second direction of beams spots impinging on the target surface from the beams emitted by the first and second interferometer is different from an arrangement of relative positions in the second direction of beams spots impinging on the target surface from the beams emitted by the third and fourth interferometer.
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公开(公告)号：WO2019170379A1
公开(公告)日：2019-09-12
申请号：PCT/EP2019/053613
申请日：2019-02-14
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GMBH
Inventor： KIMMAN, Maarten, Hartger , WESSELINGH, Jasper
IPC: G03F7/20 , H02K41/03 , H02K41/035
Abstract: A positioning system to position a structure comprises an actuator and a control unit to control the actuator in response to a position setpoint received by the control unit. The actuator comprises a magnet assembly comprises a magnet configured to provide a magnetic flux, and a coil assembly, wherein the coil assembly and the magnet assembly are movable relative to each other, the coil assembly comprising a coil, an actuation of the coil by a drive current providing for a force between the magnet assembly and the coil assembly. The magnet assembly comprises a further electric conductor, the further electric conductor comprising a non-ferromagnetic electrically conductive material, wherein the further electric conductor is magnetically coupled to the coil of the coil assembly and forms a short circuit path for an inductive electrical current induced in the further electric conductor as a result of an actuator current in the coil.
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公开(公告)号：WO2019166164A1
公开(公告)日：2019-09-06
申请号：PCT/EP2019/051950
申请日：2019-01-28
Applicant: STICHTING VU , STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , UNIVERSITEIT VAN AMSTERDAM , ASML NETHERLANDS B.V.
Inventor： KURILOVICH, Dmitry , VERSOLATO, Oscar, Oreste , PINHEIRO DE FARIA PINTO, Tiago , WITTE, Stefan, Michiel
IPC: H05G2/00
Abstract: A radiation source (SO) of a laser-produced plasma type is described. The radiation source (SO) comprises a droplet generator (3a) configured to provide a fuel droplet (60). The radiation source (SO) comprises a laser system (1) configured to provide a pre-pulse and a main-pulse. The pre-pulse is operative to condition the fuel droplet (60) for receipt of main pulse. The main pulse is operative to convert the conditioned fuel droplet (60) into plasma. The radiation source (SO) comprises a sensing system (16) configured for sensing a characteristic of an oscillation of a spatial mass distribution of the fuel droplet (60). The radiation source (SO) comprises a control system (44) operative to adjust a polarization of the pre-pulse under control of the sensed characteristic. The polarization of the pre- pulse may affect the spatial mass distribution of the conditioned fuel droplet (60).
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Patent Agency Ranking
公开(公告)号：WO2019162275A1
公开(公告)日：2019-08-29
申请号：PCT/EP2019/054098
申请日：2019-02-19
Applicant: ASML NETHERLANDS B.V.
Inventor： KOOIMAN, Marleen
IPC: G03F7/20
Abstract: A method, involving computing a first intensity of a first aerial image and a second intensity of a second aerial image, the first aerial image corresponding to a first location within a resist layer and the second aerial image corresponding to a second location within the resist layer. The method further involves, performing, by a hardware computer system using a resist model, a computer simulation of the resist layer to obtain a value of a parameter for a resist layer feature based on a difference between the first and second intensities or on a difference between a resist model result for the first intensity and a resist model result for the second intensity.
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公开(公告)号：WO2019161993A1
公开(公告)日：2019-08-29
申请号：PCT/EP2019/050766
申请日：2019-01-14
Applicant: ASML NETHERLANDS B.V.
Inventor： TEL, Wim, Tjibbo , KEA, Marc, Jurian , ANUNCIADO, Roy
IPC: G03F7/20
Abstract: Described herein is a method for determining adjustment to a patterning process. The method includes obtaining a probability density function of a parameter related to a feature of a substrate subject to the patterning process based on measurements of the parameter, determining, by a hardware computer system, an asymmetry of the probability density function, and determining, by the hardware computer system, an adjustment to the patterning process based on the asymmetry of the probability density function of the parameter so as to reduce a probability of the feature having a parameter value that falls outside a range between threshold values of the parameter.
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公开(公告)号：WO2019158682A1
公开(公告)日：2019-08-22
申请号：PCT/EP2019/053785
申请日：2019-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： HSU, Duan-Fu, Stephen , LIU, Jingjing , HOWELL, Rafael C. , PENG, Xingyue
Abstract: Described herein is a method to determine a mask pattern for a patterning device. The method includes obtaining a target pattern to be printed on a substrate, (ii) an initial continuous tone image of the patterning device corresponding to the target pattern, (iii) a binarization function (e.g., a sigmoid, an arctan, a step function, etc.) configured to transform the initial continuous tone image, and (iv) a process model configured to predict a pattern on the substrate from an output of the binarization function; and generating, by a hardware computer system, a binarized image having a mask pattern corresponding to the initial continuous tone image by iteratively updating the initial continuous tone image based on a cost function such that the cost function is reduced. The cost function (e.g., EPE) determines a difference between a predicted pattern determined by the process model and the target pattern.
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公开(公告)号：WO2019149477A1
公开(公告)日：2019-08-08
申请号：PCT/EP2019/050306
申请日：2019-01-08
Applicant: ASML NETHERLANDS B.V.
Inventor： KUMAR, Nitish , QUINTANILHA, Richard , VAN KRAAIJ, Markus, Gerardus, Martinus, Maria , TSIGUTKIN, Konstantin , COENE, Willem, Marie, Julia, Marcel
Abstract: Disclosed is a method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method comprises performing the inspection using first inspection radiation obtained from a high harmonic generation source and having one or more first wavelengths within a first wavelength range of between 20nm and 150nm. Also disclosed is a method comprising performing (310) a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing (320) a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, said second wavelength range comprising wavelengths shorter than said first wavelength range.
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公开(公告)号：WO2019149467A1
公开(公告)日：2019-08-08
申请号：PCT/EP2019/050132
申请日：2019-01-04
Applicant: ASML NETHERLANDS B.V.
Inventor： DE GROOT, Pieter, Cristiaan , BASELMANS, Johannes, Jacobus, Matheus , CHONG, Derick, Yun, Chek , CHOWDHURY, Yassin
Abstract: A two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises a substrate provided with a square array of through- apertures, wherein the diffraction grating is self-supporting. It will be appreciated that for a substrate provided with a square array of through-apertures to be self-supporting at least some substrate material is provided between each through-aperture and the adjacent through apertures. A method of designing a two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises: selecting a general geometry for the two-dimensional diffraction grating, the general geometry having at least one parameter; and selecting values for the least one parameter that result in a grating efficiency map for the two-dimensional diffraction grating so as to control the contributions to a first harmonic of a phase stepping signal.
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