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    METROLOGY METHOD AND DEVICE
    2.
    发明申请
    METROLOGY METHOD AND DEVICE 审中-公开

    公开(公告)号：WO2023041274A1

    公开(公告)日：2023-03-23

    申请号：PCT/EP2022/072840

    申请日：2022-08-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KOOLEN, Armand, Eugene, Albert ,  COENE, Willem, Marie, Julia, Marcel ,  KONIJNENBERG, Alexander, Prasetya ,  TUKKER, Teunis, Willem ,  DEN BOEF, Arie, Jeffrey

    IPC: G06T5/00 ,  G06T5/10

    Abstract: Disclosed is a metrology method and associated devices. The method comprises obtaining a first image, said first image being subject to one or more non-isoplanatic aberrations of an optical system used to capture said image; and non-iteratively correcting said first image for the effect of said one or more non-isoplanatic aberrations by performing one or both of: a field non-isoplanatic correction operation in field space for said first image, said field space corresponding to a field plane of the optical system; and a pupil non-isoplanatic correction operation in pupil space for said first image, said pupil space corresponding to a pupil plane of the optical system. Said one or more non-isoplanatic aberrations comprise a class of non-isoplanatic aberrations describable as a convolution combined with an object distortion and/or a pupil distortion.

    INSPECTION APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING DEVICES AND COMPUTER PROGRAM
    3.
    发明申请
    INSPECTION APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING DEVICES AND COMPUTER PROGRAM 审中-公开
    检查设备和方法，光刻设备，制造设备和计算机程序的方法

    公开(公告)号：WO2017153133A1

    公开(公告)日：2017-09-14

    申请号：PCT/EP2017/053305

    申请日：2017-02-14

    Applicant: ASML NETHERLANDS B.V.

    Inventor： COENE, Willem, Marie, Julia, Marcel ,  KONIJNENBERG, Alexander, Prasetya

    IPC: G01N21/956

    CPC classification number: G01N21/47 ,  G01N21/33 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7092

    Abstract: Disclosed is a method of obtaining data describing an object structure. The method comprising the steps of: (a) illuminating the object structure with illuminating radiation; (b) modulating the phase of the illuminating radiation after scattering by the object structure, the modulation comprising applying a first phase factor dependent upon at least one controllable parameter and an aberration function having a form of a subadditive function of a vector norm; (c) capturing a plurality of intensity patterns, wherein each intensity pattern corresponds to a unique value of the at least one controllable parameter; and (d) reconstructing the data describing the object structure based on the plurality of intensity patterns. Also disclosed are corresponding inspection and lithographic apparatuses, a method of manufacturing devices and a computer program.

    Abstract translation: 公开了一种获得描述对象结构的数据的方法。 该方法包括以下步骤：（a）用照射辐射照射物体结构; （b）调制被所述物体结构散射后的照射辐射的相位，所述调制包括应用取决于至少一个可控参数的第一相位因子和具有矢量范数的子加性函数形式的像差函数; （c）捕获多个强度图案，其中每个强度图案对应于所述至少一个可控参数的唯一值; （d）基于所述多个强度图案重建描述所述对象结构的数据。 还公开了相应的检查和光刻设备，制造设备的方法和计算机程序。

    SUBSTRATE AND PATTERNING DEVICE FOR USE IN METROLOGY, METROLOGY METHOD AND DEVICE MANUFACTURING METHOD
    5.
    发明申请
    SUBSTRATE AND PATTERNING DEVICE FOR USE IN METROLOGY, METROLOGY METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
    用于计量学，计量方法和器件制造方法的基板和图案装置

    公开(公告)号：WO2015172963A1

    公开(公告)日：2015-11-19

    申请号：PCT/EP2015/058238

    申请日：2015-04-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： QUINTANILHA, Richard ,  COENE, Willem, Marie, Julia, Marcel

    IPC: G03F7/20

    CPC classification number: G03F7/70633 ,  G03F7/70683

    Abstract: A pattern from a patterning device (M) is applied to a substrate (W) by a lithographic apparatus (LA). The applied pattern includes product features and metrology targets (600, 604). The metrology targets include large targets (600a) which are for measuring overlay using X-ray scattering (metrology apparatus 104) and small targets (600b, 604) which are for measuring overlay by diffraction of visible radiation (metrology apparatus 102). Some of the smaller targets (604) are distributed at locations between the larger targets, while other small targets (600b) are placed at the same locations as a large target. By comparing values measured using a small target (600b) and large target (600a) at the same location, parameter values (704) measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes (SL) while the small targets are distributed within product areas (602, D).

    Abstract translation: 来自图案形成装置（M）的图案通过光刻装置（LA）施加到基板（W）。 应用模式包括产品功能和度量目标（600,604）。 计量目标包括用于使用X射线散射（计量装置104）测量覆盖物的大目标（600a）和用于通过可见辐射的衍射测量覆盖物的测量小尺寸（600b，604）（计量装置102）。 一些较小的目标（604）分布在较大目标之间的位置，而其他小目标（600b）被放置在与大目标相同的位置处。 通过比较在相同位置使用小目标（600b）和大目标（600a）测量的值，可以校正使用所有小目标测量的参数值（704）以获得更好的精度。 大目标主要位于划线（SL）内，而小目标分布在产品区域（602，D）内。

    OBJECT IDENTIFICATION AND COMPARISON
    8.
    发明申请
    OBJECT IDENTIFICATION AND COMPARISON 审中-公开

    公开(公告)号：WO2018172039A1

    公开(公告)日：2018-09-27

    申请号：PCT/EP2018/055164

    申请日：2018-03-02

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KOOPMAN, Adrianus, Cornelis, Matheus ,  MIDDLEBROOKS, Scott, Anderson ,  COENE, Willem, Marie, Julia, Marcel

    IPC: G03F7/20

    Abstract: A method including selecting a shaped feature from a set of shaped features, each shaped feature of the set of shaped features having a set of points on a perimeter of the shape of the shaped feature, creating a plurality of shape context descriptors for the selected shaped feature, wherein each shape context descriptor provides an indication of a location in a shape context descriptor framework of a first focus point of the set of points in relation to a second point of the set of points, and identifying a shaped feature from the set of shaped features having a same or similar shape as the selected shaped feature based on data from the plurality of shape context descriptors.

    METHOD AND APPARATUS FOR IMAGE ANALYSIS
    10.
    发明申请
    METHOD AND APPARATUS FOR IMAGE ANALYSIS 审中-公开
    图像分析的方法和装置

    公开(公告)号：WO2016091534A1

    公开(公告)日：2016-06-16

    申请号：PCT/EP2015/076540

    申请日：2015-11-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： MIDDLEBROOKS, Scott, Anderson ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  KOOPMAN, Adrianus, Cornelis, Matheus ,  HUNSCHE, Stefan ,  COENE, Willem, Marie, Julia, Marcel

    IPC: G06T7/00 ,  G03F7/20

    CPC classification number: G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G06T7/12 ,  G06T7/149 ,  G06T7/60 ,  G06T2207/10061 ,  G06T2207/20161 ,  G06T2207/30148

    Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non- nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

    Abstract translation: 描述了图像的检测，配准和定量的方法和装置。 该方法可以包括获得光刻创建的结构的图像，以及将水平集合方法应用于表示图像的结构的对象，以创建该结构的数学表示。 该方法可以包括在参数的标称条件下获得代表结构的参考图像对象的第一数据集，以及在参数的非标称条件下获得表示该结构的模板图像对象的第二数据集。 该方法还可以包括获得代表第一数据集和第二数据集之间变化的变形域。 可以通过变换第二数据集来将模板图像对象投影到参考图像对象上来生成变形场。 可以获得变形场与参数变化之间的依赖关系。

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