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公开(公告)号：WO2022144205A1
公开(公告)日：2022-07-07
申请号：PCT/EP2021/086783
申请日：2021-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： TIEMERSMA, Bart, Jacobus, Martinus , ONOSE, Alexandru , VERHEUL, Nick , DIRKS, Remco
Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.
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公开(公告)号：WO2022144204A1
公开(公告)日：2022-07-07
申请号：PCT/EP2021/086782
申请日：2021-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： ONOSE, Alexandru , TIEMERSMA, Bart, Jacobus, Martinus , VERHEUL, Nick , DIRKS, Remco , BARBIERI, Davide , VAN LAARHOVEN, Hendrik, Adriaan
Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.
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公开(公告)号：WO2022144156A1
公开(公告)日：2022-07-07
申请号：PCT/EP2021/085051
申请日：2021-12-09
Applicant: ASML NETHERLANDS B.V.
Inventor： BOSCH, Niels, Johannes, Maria , WANG, Xu , HEMPENIUS, Peter, Paul , WANG, Yongqiang , BUTLER, Hans , WANG, Youjin , GRASMAN, Jasper, Hendrik , SUI, Jianzi , CHEN, Tianming , WU, Aimin
Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.
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54.发明申请
公开(公告)号：WO2022135938A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/084837
申请日：2021-12-08
Applicant: ASML NETHERLANDS B.V.
Inventor： WANG, Zhe , YU, Liangjiang , PU, Lingling
IPC: G06T7/00
Abstract: An improved systems and methods for generating a synthetic defect image are disclosed. An improved method for generating a synthetic defect image comprises acquiring a machine learning-based generator model; providing a defect-free inspection image and a defect attribute combination as inputs to the generator model; and generating by the generator model, based on the defect-free inspection image, a predicted synthetic defect image with a predicted defect that accords with the defect attribute combination.
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公开(公告)号：WO2022135870A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/084063
申请日：2021-12-02
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： BEUKMAN, Arjan, Johannes, Anton , GOORDEN, Sebastianus, Adrianus , ROUX, Stephen , SOKOLOV, Sergei , ALPEGGIANI, Filippo
Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
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Patent Agency Ranking
公开(公告)号：WO2022135852A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/083667
申请日：2021-11-30
Applicant: ASML NETHERLANDS B.V.
Inventor： SINKE, Arnold , KLARENBEEK, Eduard, Martinus , VAN DER PASCH, Engelbertus, Antonius, Fransiscus
IPC: G01B9/02015 , G01B9/0209
Abstract: An interferometer head is disclosed. A first portion of an input radiation beam is incident on a first partially-reflective surface and reflected from a first reference surface towards a first output terminal. A second portion of the input radiation beam is incident on a second partially-reflective surface and reflected from a second reference surface towards a second output terminal. A third portion of the input radiation beam is transmitted towards a measurement surface. A first portion of a reflected beam from the measurement surface is reflected from the second partially-reflective surface towards the second output terminal. A second portion of the reflected beam from the measurement surface is reflected from the first partially-reflective surface towards the first output terminal. An offset angle is implemented between a first output radiation beam from the first output terminal and a second output radiation beam from the second output terminal.
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公开(公告)号：WO2022128688A1
公开(公告)日：2022-06-23
申请号：PCT/EP2021/084830
申请日：2021-12-08
Applicant: ASML NETHERLANDS B.V.
Abstract: Disclosed is method of determining at least one homogeneity metric describing homogeneity of an etched trench on a substrate formed by a lithographic manufacturing process. The method comprises obtaining one or more images of the etched trench, wherein each of said one or more images comprises a spatial representation of one or more parameters of scattered radiation as detected by a detector or camera following scattering and/or diffraction from the etched trench; and measuring homogeneity along the length of the etched trench on said one or more images to determine said at least one homogeneity metric.
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公开(公告)号：WO2022128687A1
公开(公告)日：2022-06-23
申请号：PCT/EP2021/084829
申请日：2021-12-08
Applicant: ASML NETHERLANDS B.V.
Abstract: A method of simulating an electromagnetic response of a metrology target comprising first and second gratings, wherein the second grating is below the first grating, the method comprising: receiving a model defining (i) the first grating as having a first number of grating lines within a pitch, each of the first number of grating lines separated by a first pitch; and (ii) the second grating as having a second number of grating lines within the pitch, each of the second number of grating lines separated by a second pitch; using the model and the first pitch to simulate properties of the first grating and generate a first scattering matrix; using the model and the second pitch to simulate properties of the second grating and generate a second scattering matrix; generating a scattering matrix defining properties of the metrology target by combining the first scattering matrix and the second scattering matrix.
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公开(公告)号：WO2022122546A1
公开(公告)日：2022-06-16
申请号：PCT/EP2021/083968
申请日：2021-12-02
Applicant: ASML NETHERLANDS B.V. [NL]/[NL]
Inventor： DAVIS, Timothy, Dugan , MATHIJSSEN, Simon, Gijsbert, Josephus , BHATTACHARYYA, Kaustuve , GOORDEN, Sebastianus, Adrianus , KOOLEN, Armand, Eugene, Albert , JEON, Sera , LIN, Shuo-Chun
Abstract: Disclosed is a method of metrology. The method comprises measuring at least one surrounding observable parameter relating to a surrounding signal contribution to a metrology signal which comprises a contribution to said metrology signal which is not attributable to at least one target being measured and determining a correction from said surrounding signal observable parameter. The correction is used to correct first measurement data relating to measurement of one or more targets using measurement radiation forming a measurement spot on one or more of said one or more targets which is larger than one of said targets.
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公开(公告)号：WO2022122285A1
公开(公告)日：2022-06-16
申请号：PCT/EP2021/081219
申请日：2021-11-10
Applicant: ASML NETHERLANDS B.V. [NL]/[NL]
Inventor： BLAUW, Michiel, Alexander , DER KINDEREN, Ronny
IPC: G03F7/20
Abstract: There is provided a reticle stage for a lithography apparatus, said reticle stage comprising: at least one optical element having an area to be cleaned; a radiation beam target; and a control system configured to direct a radiation beam to the radiation beam target wherein the interaction of the radiation beam and a gas creates an optical element-cleaning plasma, wherein the radiation beam target is located to provide the optical element-cleaning plasma to the at least one optical element to clean the optical element, and wherein the at least one optical element is a different element than the radiation beam target, preferably wherein the heat sensitive element is a fiducial. Also described are a fiducial for a lithographic apparatus comprising at least one curved edge, a lithographic apparatus comprising the reticle stage or fiducial, and a method of cleaning an optical element of a reticle stage.
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