公开(公告)号：WO2009011878A3

公开(公告)日：2009-01-22

申请号：PCT/US2008/008715

申请日：2008-07-16

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. ,  WU, Wei ,  FATTAL, David ,  SANTORI, Charles ,  BICKNELL, Robert, N. ,  WANG, Shih-Yuan ,  WILLIAMS, R., Stanley ,  QUITORIANO, Nathaniel, J.

Inventor： WU, Wei ,  FATTAL, David ,  SANTORI, Charles ,  BICKNELL, Robert, N. ,  WANG, Shih-Yuan ,  WILLIAMS, R., Stanley ,  QUITORIANO, Nathaniel, J.

IPC: G02B6/34

Abstract: Optical devices (100) including waveguide grating structures (102) are described. In accordance with one embodiment, an optical device (100) is provided comprising a horizontal waveguide grating structure (102) having at least one waveguiding layer (104) and at least one subwavelength periodic grating layer (106). The optical device (100) further comprises upper and lower cladding layers (108, 110) immediately adjoining respective upper and lower surfaces (209, 205) of the waveguide grating structure and having refractive indices lower than a lowest-index one of the waveguiding layers, incident radiation propagating (IN) through one of the upper and lower cladding layers (108, 110) toward the waveguide grating structure. The waveguide grating structure (102) is configured for peak reflection of the incident radiation at a peak reflection frequency. A cumulative thickness of the waveguiding layers (104) is less than one tenth of a free space wavelength of the incident radiation at the peak reflection frequency divided by an average refractive index of the waveguiding layers.

公开(公告)号：WO2008121252A1

公开(公告)日：2008-10-09

申请号：PCT/US2008/003789

申请日：2008-03-21

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. ,  WU, Wei ,  WILLIAMS, Stanley, R. ,  ROBINETT, Warren ,  SNIDER, Gregory ,  YU, Zhaoning ,  WANG, Shih-yuan ,  STEWART, Duncan

Inventor： WU, Wei ,  WILLIAMS, Stanley, R. ,  ROBINETT, Warren ,  SNIDER, Gregory ,  YU, Zhaoning ,  WANG, Shih-yuan ,  STEWART, Duncan

IPC: H01L27/108 ,  H01L27/04

CPC classification number: H01L27/101 ,  B82Y10/00 ,  G11C13/00 ,  G11C13/0023 ,  G11C13/0033 ,  G11C2213/71 ,  G11C2213/79 ,  G11C2213/81 ,  H01L2924/0002 ,  Y10S977/762 ,  H01L2924/00

Abstract: Various embodiments of the present invention are directed to three-dimensionall crossbar arrays (500, 1000). In one aspect of the present invention, a three-dimensional crossbar array (1000) includes a plurality of crossbar arrays (1102-1104), a first demultiplexer (1106), a second demultiplexer (1108), and a third demultiplexer (1110). Each crossbar array includes a first layer of nanowires (702-704), a second layer of nanowires (706-708) overlaying the first layer of nanowires, and a third layer of nanowires (710-712) overlaying the second layer of nanowires. The first demultiplexer is configured to address nanowires in the first layer of nanowires of each crossbar array, the second demultiplexer is configured to address nanowires in the second layer of nanowires of each crossbar array, and the third demultiplexer is configured to supply a signal to the nanowires in the third layer of nanowires of each crossbar array.

Abstract translation: 本发明的各种实施例涉及三维全横杆阵列（500,1000）。 在本发明的一个方面中，三维交叉列阵列（1000）包括多个交叉列阵列（1102-1104），第一解复用器（1106），第二解复用器（1108）和第三解复用器（1110） 。 每个横杆阵列包括第一层纳米线（702-704），覆盖第一纳米线层的第二纳米线层（706-708）和覆盖第二纳米线层的第三纳米线层（710-712）。 第一解复用器被配置为寻址每个交叉列阵列的纳米线的第一层中的纳米线，第二解复用器被配置为寻址每个交叉列阵列的第二纳米线层中的纳米线，并且第三解复用器被配置为向 纳米线在每个交叉列阵列的第三层纳米线中。

公开(公告)号：WO2008013778A3

公开(公告)日：2008-05-08

申请号：PCT/US2007016580

申请日：2007-07-24

Applicant: HEWLETT PACKARD DEVELOPMENT CO ,  WU WEI ,  STEWART DUNCAN ,  WANG SHIH-YUAN ,  WILLIAMS R STANLEY

Inventor： WU WEI ,  STEWART DUNCAN ,  WANG SHIH-YUAN ,  WILLIAMS R STANLEY

IPC: G03F7/00 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold (110) to a substrate (130) during a contact lithography process: and modifying the mold (110) to compensate for the distortions. A contact lithography system includes a design subsystem (210) configured to generate data describing a lithography pattern: an analysis subsystem (220) configured to identify one or more distortions likely to occur when using a mold (110) created from the data; and a mold modification subsystem (230) configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem (220).

Abstract translation: 接触光刻的方法包括预测在接触光刻过程期间将图案从模具（110）转移到衬底（130）时可能发生的变形;以及修改模具（110）以补偿变形。 接触光刻系统包括设计子系统（210），其被配置为生成描述光刻图案的数据：分析子系统（220），其被配置为识别当使用由所述数据创建的模具（110）时可能发生的一个或多个失真; 以及模具修改子系统（230），其被配置为修改所述数据以补偿由所述分析子系统（220）识别的所述一个或多个失真。

公开(公告)号：WO2008013798A3

公开(公告)日：2008-03-20

申请号：PCT/US2007016621

申请日：2007-07-24

Applicant: HEWLETT PACKARD DEVELOPMENT CO ,  WU WEI ,  WANG SHIH-YUAN ,  WILLIAMS R STANLEY

Inventor： WU WEI ,  WANG SHIH-YUAN ,  WILLIAMS R STANLEY

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/7035 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7038 ,  G03F9/7042 ,  G03F9/7088 ,  G03F9/7096

Abstract: A contact lithography system includes a patterning tool (110) having a pattern for transfer to a substrate (130); and at least one alignment device (140) coupled to the patterning tool (110). The alignment device (140) is configured to measure alignment between the patterning tool (110) and a substrate (130) for receiving the pattern of the patterning tool (110). A contact lithograpny method includes aligning a patterning tool (110) having a pattern for transfer with a substrate (130) for receiving the pattern of the patterning tool (110) using at least one alignment device (140) coupled to the patterning tool (110).

Abstract translation: 接触光刻系统包括具有用于转移到衬底（130）的图案的图案形成工具（110）; 以及耦合到图案形成工具（110）的至少一个对准装置（140）。 对准装置（140）被配置为测量图案形成工具（110）和用于接收图案形成工具（110）的图案的基底（130）之间的对准。 接触光刻方法包括使具有用于转移的图案的图案形成工具（110）与衬底（130）对准，用于使用联接到图案形成工具（110）的至少一个对准装置（140）接收图案形成工具（110）的图案 ）。

公开(公告)号：WO2008013778A2

公开(公告)日：2008-01-31

申请号：PCT/US2007/016580

申请日：2007-07-24

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. ,  WU, Wei ,  STEWART, Duncan ,  WANG, Shih-Yuan ,  WILLIAMS, R., Stanley

Inventor： WU, Wei ,  STEWART, Duncan ,  WANG, Shih-Yuan ,  WILLIAMS, R., Stanley

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold (110) to a substrate (130) during a contact lithography process: and modifying the mold (110) to compensate for the distortions. A contact lithography system includes a design subsystem (210) configured to generate data describing a lithography pattern: an analysis subsystem (220) configured to identify one or more distortions likely to occur when using a mold (110) created from the data; and a mold modification subsystem (230) configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem (220).

Abstract translation: 接触光刻的方法包括预测在接触光刻过程中将图案从模具（110）转印到基板（130）时可能发生的扭曲：以及修改模具（110）以补偿 为扭曲。 一种接触光刻系统包括被配置为产生描述光刻图案的数据的设计子系统（210）：分析子系统（220），其被配置为识别在使用从数据创建的模具（110）时可能发生的一个或多个失真; 和模具修改子系统（230），其被配置为修改数据以补偿由分析子系统（220）识别的一个或多个失真。

公开(公告)号：WO2007146031A2

公开(公告)日：2007-12-21

申请号：PCT/US2007/013374

申请日：2007-06-06

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. ,  WU, Wei ,  WANG, Shih-Yuan ,  YU, Zhaoning ,  WILLIAMS, R. Stanley,

Inventor： WU, Wei ,  WANG, Shih-Yuan ,  YU, Zhaoning ,  WILLIAMS, R. Stanley,

CPC classification number: B29C37/005 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An apparatus for forming a pattern in a curable material carried on a substrate (108) having one or more components with coefficients of thermal expansion that are substantially equal to the coefficient of thermal expansion of the substrate (108).

Abstract translation: 在具有一个或多个具有基本上等于基板（108）的热膨胀系数的热膨胀系数的部件的基板（108）上形成图案的装置。

公开(公告)号：WO2006081565A1

公开(公告)日：2006-08-03

申请号：PCT/US2006/003264

申请日：2006-01-26

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. ,  ISLAM, M., Saiful ,  WANG, Shih-Yuan ,  WU, Wei ,  LI, Zhiyong ,  WILLIAMS, R., Stanley

Inventor： ISLAM, M., Saiful ,  WANG, Shih-Yuan ,  WU, Wei ,  LI, Zhiyong ,  WILLIAMS, R., Stanley

IPC: G01N21/65 ,  G01J3/44

CPC classification number: G01N21/658 ,  G01N2201/0873

Abstract: Devices, systems, and methods for enhancing Raman spectroscopy and hyper-Raman are disclosed. A molecular analysis device (100', 100") for performing Raman spectroscopy comprises a substrate (110) and a laser source (120) disposed on the substrate (110). The laser source (120) may be configured for generating a laser radiation (125), which may irradiate an analyte (31 ) disposed on a Raman enhancement structure (300). The Raman enhancement structure (300) may be disposed in a waveguide (130). The molecular analysis device (100', 100") also includes a wavelength demultiplexer (240) and radiation sensors (290) disposed on the substrate (110) and configured for receiving a Raman scattered radiation (160), which may be generated by the irradiation of the analyte (310) and Raman enhancement structure (300).

Abstract translation: 公开了用于增强拉曼光谱和超拉曼的装置，系统和方法。 用于进行拉曼光谱分析的分子分析装置（100'，100“）包括基板（110）和设置在基板（110）上的激光源（120），激光源（120）可以被配置为产生激光辐射 （125），其可以照射设置在拉曼增强结构（300）上的分析物（31），拉曼增强结构（300）可以设置在波导管（130）中，分子分析装置（100'，100“） 还包括布置在衬底（110）上并被配置用于接收拉曼散射辐射（160）的波长解复用器（240）和辐射传感器（290），其可以通过分析物（310）的照射和拉曼增强结构 （300）。

公开(公告)号：WO2006073526A2

公开(公告)日：2006-07-13

申请号：PCT/US2005037203

申请日：2005-10-14

Applicant: HEWLETT PACKARD DEVELOPMENT CO ,  WANG SHIH-YUAN ,  ISLAM M SAIFUL

Inventor： WANG SHIH-YUAN ,  ISLAM M SAIFUL

IPC: H01S5/183 ,  G01N21/63 ,  H01L33/00 ,  H01S5/06 ,  H04N9/04

CPC classification number: G01N21/658 ,  G01J3/02 ,  G01J3/021 ,  G01J3/0256 ,  G01J3/10 ,  G01J3/44 ,  G02B2006/1213 ,  H01S5/1032 ,  H01S5/105 ,  H01S5/18302 ,  H01S5/18394 ,  H01S5/2027

Abstract: Irradiation devices (100, 100', 200 and 200') and methods of amplification and irradiation are disclosed. The devices and methods may be used for displaying pixels 460 and Surface Enhanced Spectroscopy (SERS) analysis. The devices included an optical modulator (300 and 300'), which may be configured for operation in a variably transmissive state. An active region (130 and 130') may be formed in an optical waveguide 105 with the optical modulator (300 and 300') configured substantially adjacent at least one surface of the active region (130 and 130').

Abstract translation: 公开了照射装置（100,100'，200和200'）以及放大和照射的方法。 装置和方法可用于显示像素460和表面增强光谱（SERS）分析。 这些装置包括光调制器（300和300'），其可以被配置为在可变透射状态下操作。 可以在光波导105中形成有源区域（130和130'），其中光学调制器（300和300'）基本上邻近有源区域（130和130'）的至少一个表面配置。

公开(公告)号：WO2006055798A1

公开(公告)日：2006-05-26

申请号：PCT/US2005/041857

申请日：2005-11-18

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. ,  KUEKES, Phillip, J. ,  WANG, Shih-Yuan ,  BEAUSOLEIL, Raymond, G. ,  BRATKOVSKI, Alexandre, M. ,  WU, Wei ,  ISLAM, M., Saiful

Inventor： KUEKES, Phillip, J. ,  WANG, Shih-Yuan ,  BEAUSOLEIL, Raymond, G. ,  BRATKOVSKI, Alexandre, M. ,  WU, Wei ,  ISLAM, M., Saiful

IPC: H01Q3/44 ,  H01Q15/00 ,  G02F1/01 ,  G02F1/29

CPC classification number: H01Q15/0086 ,  G02F1/0126 ,  G02F1/29 ,  H01Q3/44 ,  Y10T29/4902 ,  Y10T29/49798

Abstract: An apparatus (100) for controlling propagation of incident electromagnetic radiation (110) is described, comprising a composite material (102) having electromagnetically reactive cells (106) of small dimension relative to a wavelength of the incident electromagnetic radiation (110). At least one of a capacitive and inductive property of at least one of the electromagnetically reactive cells (106) is temporally controllable to allow temporal control of an associated effective refactive index encountered by the incident electromagnetic radiation (110) while propagating through the composite material (106).

Abstract translation: 描述了一种用于控制入射电磁辐射（110）的传播的装置（100），其包括相对于入射电磁辐射（110）的波长具有小尺寸的电磁反应池（106）的复合材料（102）。 电磁反应池（106）中的至少一个电容和电感性质中的至少一个在时间上是可控的，以便允许对入射电磁辐射（110）遇到的相关联的有效反射指数进行时间控制，同时传播通过复合材料 106）。

公开(公告)号：WO2006036800A1

公开(公告)日：2006-04-06

申请号：PCT/US2005/034192

申请日：2005-09-23

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. ,  WANG, Shih-Yuan ,  ISLAM, M. Saiful, ,  BRATKOVSKI, Alexandre M, ,  BEAUSOLEIL, Raymond G,

Inventor： WANG, Shih-Yuan ,  ISLAM, M. Saiful, ,  BRATKOVSKI, Alexandre M, ,  BEAUSOLEIL, Raymond G,

IPC: H01S5/10 ,  G01N21/39 ,  G01N21/55

CPC classification number: G01N21/774 ,  B82Y20/00 ,  G01N21/45 ,  G01N2021/7779 ,  G02B6/12004 ,  G02B6/1225 ,  G02B2006/12104 ,  G02B2006/12159 ,  H01S5/026 ,  H01S5/0656 ,  H01S5/105 ,  H01S5/22 ,  H01S2301/18

Abstract: A sensor apparatus (400, 500, 500', 700) includes a laser (402, 502, 602) optically coupled to a photonic crystal structure (404, 504, 706) configured to provide an evanescent field through a sensed medium region (416, 512, 708) such that the photonic crystal structure (404, 504, 706) functions as a cavity/resonator for the laser (402, 502, 602).

Abstract translation: 传感器装置（400,500,500'，700）包括光学耦合到光子晶体结构（404,504,706）的激光器（402,502,602），该激光器配置成通过感测的介质区域（416）提供消逝场 ，512,708），使得所述光子晶体结构（404,504,706）用作所述激光器（402,502,602）的腔/谐振器。