公开(公告)号：WO2015104074A1

公开(公告)日：2015-07-16

申请号：PCT/EP2014/072717

申请日：2014-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： CEKLI, Hakki Ergün ,  LIU, Xing Lan ,  SLOTBOOM, Daan, Maurits ,  TEL, Wim, Tjibbo ,  VAN DER SANDEN, Stefan, Cornelis, Theodorus ,  VAN HAREN, Richard, Johannes, Franciscus

IPC: G03F9/00 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F9/7003 ,  G03F9/7092

Abstract: A lithographic apparatus (LA) applies a pattern repeatedly to target portions (fields, C) across a substrate (W). Prior to applying the pattern an alignment sensor (AS) measures positions of marks in the plane of the substrate and a level sensor (LS) measures height deviations in a direction normal to the plane of the substrate. The apparatus applies the pattern to the substrate while (a) positioning the applied pattern using the positions measured by the alignment sensor and (b) focusing the pattern using the height deviations measured by the level sensor. The apparatus is further arranged (c) to calculate and apply corrections in the positioning of the applied pattern, based on derivatives of the measured height deviations. The corrections may be calculated on intrafield and/or interfield basis. The corrections may be based on changes between the observed height deviations and height deviations measured previously on the same substrate.

Abstract translation: 光刻设备（LA）通过衬底（W）重复地对目标部分（场，C）施加图案。 在施加图案之前，对准传感器（AS）测量标记在基板的平面中的位置，并且液位传感器（LS）测量垂直于基板平面的方向的高度偏差。 该装置将图案应用于基板，同时（a）使用由对准传感器测量的位置定位所施加的图案，并且（b）使用由液位传感器测量的高度偏差对图案进行聚焦。 该设备还被布置为（c）基于所测量的高度偏差的导数来计算和应用所施加的图案的定位中的校正。 校正可以在场内和/或场间基础上计算。 校正可以基于先前在同一衬底上测量的观察到的高度偏差和高度偏差之间的变化。

公开(公告)号：WO2014009100A1

公开(公告)日：2014-01-16

申请号：PCT/EP2013/062361

申请日：2013-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： DANILIN, Alexander, Alexandrovich ,  ARRIZABALAGA, Alejandro ,  MENCHTCHIKOV, Boris ,  PADIY, Alexandre, Viktorovych

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70516 ,  G03F7/70725

Abstract: A A method of calibrating a substrate positioning system of a lithographic apparatus, the method including: exposing a pattern with the lithographic apparatus on an exposed layer on the surface of a substrate having a reference layer, wherein the pattern corresponds to a movement of the substrate by the substrate positioning system; measuring overlay data between the exposed layer and the reference layer on a plurality of positions on the substrate; transforming the overlay data from a spatial domain to a frequency domain by a discrete cosine transformation; modifying the overlay data in the frequency domain by selecting a subset of the overlay data; transforming the modified overlay data from the frequency domain back to the spatial domain by an inverse discrete cosine transformation; calibrating the substrate positioning system by using the modified overlay data in the spatial domain.

Abstract translation: AA方法，其校准光刻设备的衬底定位系统，所述方法包括：在具有参考层的衬底的表面上的暴露层上暴露具有光刻设备的图案，其中所述图案对应于所述衬底的移动 基板定位系统; 在所述衬底上的多个位置上测量所述暴露层和所述参考层之间的覆盖数据; 通过离散余弦变换将叠加数据从空间域变换到频域; 通过选择覆盖数据的子集来修改频域中的覆盖数据; 通过反相离散余弦变换将经修改的覆盖数据从频域转换回空间域; 通过使用空间域中的修改的覆盖数据来校准衬底定位系统。

公开(公告)号：WO2013117435A1

公开(公告)日：2013-08-15

申请号：PCT/EP2013/051308

申请日：2013-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： TINNEMANS, Patricius

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70516 ,  G03F7/70525

Abstract: There is disclosed a lithography or exposure apparatus and system, a method of calibrating a lithography or exposure apparatus, and a device manufacturing method. In an embodiment, there is provided an exposure system including a first exposure apparatus and a second exposure apparatus, wherein a data processing device of each of the first and second apparatuses is configured to calculate a control signal using a response function; the combined performance of the programmable patterning device and projection system of each of the first and second apparatuses differs, at least due to manufacturing error; and the response function used by the first apparatus is identical to the response function used by the second apparatus.

Abstract translation: 公开了光刻或曝光装置和系统，校准光刻或曝光装置的方法以及装置制造方法。 在一个实施例中，提供了一种包括第一曝光装置和第二曝光装置的曝光系统，其中第一和第二装置中的每一个的数据处理装置被配置为使用响应函数来计算控制信号; 至少由于制造误差，第一和第二装置中的可编程图案形成装置和投影系统的组合性能不同。 并且第一装置使用的响应功能与第二装置使用的响应功能相同。

公开(公告)号：WO2016146217A1

公开(公告)日：2016-09-22

申请号：PCT/EP2015/079282

申请日：2015-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： CEKLI, Hakki, Ergün ,  LIU, Xing, Lan ,  VAN DER SANDEN, Stefan, Cornelis, Theodorus ,  VAN HAREN, Richard, Johannes, Franciscus

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70633 ,  G03F7/70258 ,  G03F7/70358 ,  G03F9/7046

Abstract: A lithographic method comprises exposing number of fields on a substrate, obtaining data about a field (1001) and correcting exposure of the field in subsequent exposures. The method includes defining one or more sub-fields (408, 1011a, 1011b) of the field based on the obtained data. Data relating to each sub-field is processed to produce sub- field correction information. The subsequent exposures of the sub-fields are corrected using the sub-field correction information. By controlling a lithographic apparatus by reference to data of a particular sub-field (408) within a field, overlay error can be minimized for critical features, rather than being averaged over the whole field. By controlling a lithographic apparatus with reference to sub-fields rather than only the whole field, residual errors (1103) can be reduced in each sub-field.

Abstract translation: 光刻方法包括曝光基底上的场数，获得关于场（1001）的数据并校正后续曝光中场的曝光。 该方法包括基于获得的数据来定义场的一个或多个子场（408,1011a，1011b）。 处理与每个子场相关的数据以产生子场校正信息。 使用子场校正信息校正子场的后续曝光。 通过参考场内的特定子场（408）的数据来控制光刻设备，可以将关键特征的覆盖误差最小化，而不是在整个场上进行平均。 通过参照子场控制光刻设备而不仅仅是整个场，可以在每个子场中减少残留误差（1103）。

公开(公告)号：WO2015024783A1

公开(公告)日：2015-02-26

申请号：PCT/EP2014/066919

申请日：2014-08-06

Applicant: ASML NETHERLANDS B.V.

Inventor： SCHMITT-WEAVER, Emil, Peter ,  HENKE, Wolfgang ,  HOOGENBOOM, Thomas, Leo, Maria ,  IZIKSON, Pavel ,  LUEHRMANN, Paul, Frank ,  SLOTBOOM, Daan, Maurits ,  STAECKER, Jens ,  YPMA, Alexander

IPC: G03F7/20

CPC classification number: G03F7/70516 ,  G03F7/70491 ,  G03F7/70525 ,  G03F7/70625 ,  G03F7/70633

Abstract: A lithography system configured to apply a pattern to a substrate, the system including a lithography apparatus configured to expose a layer of the substrate according to the pattern, and a machine learning controller configured to control the lithography system to optimize a property of the pattern, the machine learning controller configured to be trained on the basis of a property measured by a metrology unit configured to measure the property of the exposed pattern in the layer and/or a property associated with exposing the pattern onto the substrate, and to correct lithography system drift by adjusting one or more selected from: the lithography apparatus, a track unit configured to apply the layer on the substrate for lithographic exposure, and/or a control unit configured to control an automatic substrate flow among the track unit, the lithography apparatus, and the metrology unit.

Abstract translation: 一种光刻系统，被配置为将图案应用于基底，所述系统包括被配置为根据图案暴露基底层的光刻设备，以及机器学习控制器，被配置为控制光刻系统以优化图案的特性， 机器学习控制器被配置为基于由测量单元测量的属性来进行训练，所述测量单元被配置成测量所述层中的暴露图案的性质和/或与将图案暴露于衬底相关联的属性，并且修正光刻系统 通过调整选自以下的一个或多个漂移：光刻设备，被配置为将该层施加在用于光刻曝光的基板上的轨道单元和/或控制单元，被配置为控制轨道单元，光刻设备之间的自动衬底流动， 和计量单位。

公开(公告)号：WO2013186136A2

公开(公告)日：2013-12-19

申请号：PCT/EP2013/061781

申请日：2013-06-07

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DRENT, William, Peter ,  VERVOORDELDONK, Michael, Johannes

IPC: G03F7/20

CPC classification number: G03F7/70766

Abstract: A lithographic apparatus having two substrate tables or two support structures for patterning devices that are positioned by planar motors acting against a magnet plate has one or more balance masses also driven against the magnet plate so as to minimize movement of the magnet plate. Thereby, non-repeating positioning errors related to variations in the position of the magnet plate are reduced.

Abstract translation: 具有两个基板台或两个用于图案形成装置的支撑结构的平版印刷装置，其平面电动机作用在磁板上，其特征在于还具有一个或多个平衡块，其驱动抵靠磁板，以最小化磁体板的运动。 由此，与磁体板的位置的变化有关的非重复定位误差降低。

公开(公告)号：WO2013143729A1

公开(公告)日：2013-10-03

申请号：PCT/EP2013/052199

申请日：2013-02-05

Applicant: ASML NETHERLANDS B.V.

Inventor： HOEKS, Martinus ,  BLEEKER, Arno

IPC: G03F7/20

CPC classification number: G03F7/20 ,  G03F7/70191 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

Abstract: There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target.

Abstract translation: 公开了一种曝光装置，装置制造方法和衰减器的制造方法。 根据实施例，曝光装置包括可编程图案形成装置，其被配置为提供多个可单独控制的辐射束; 投影系统，被配置为将每个辐射束投射到目标上的相应位置; 以及衰减器，其被配置为减少可以作为靶上的位置的函数的辐射束可以施加到目标的最大辐射通量或背景曝光水平的标准偏差。

公开(公告)号：WO2013107684A2

公开(公告)日：2013-07-25

申请号：PCT/EP2013/050402

申请日：2013-01-10

Applicant: ASML NETHERLANDS B.V.

Inventor： LOOPSTRA, Erik ,  DONDERS, Sjoerd ,  ZAAL, Koen ,  CADEE, Theodorus Petrus Maria

IPC: G03F7/20

CPC classification number: G03F7/70791 ,  G03F7/707 ,  H01L21/67778

Abstract: A method of loading a flexible substrate, a device manufacturing method, an apparatus for loading a flexible substrate, and a lithography apparatus. According to an embodiment, there is provided a method of loading a flexible substrate onto a support for use in an exposure apparatus, including transferring the substrate progressively from a substrate carrier to the support in a way that a boundary line separating a region of the substrate that is loaded onto the support and a region of the substrate that is not yet loaded onto the support remains substantially straight during the loading process.

Abstract translation: 装载柔性基板的方法，装置制造方法，装载柔性基板的装置和光刻装置。 根据实施例，提供了一种将柔性基板装载到用于曝光设备的支撑件上的方法，包括将基板从基板载体逐渐地以基板载体分离到基板的边界线的方式 其被加载到支撑件上，并且未装载到支撑件上的基板的区域在加载过程中保持基本上直线。

公开(公告)号：WO2013107595A1

公开(公告)日：2013-07-25

申请号：PCT/EP2012/076319

申请日：2012-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： TINNEMANS, Patricius ,  BLEEKER, Arno

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70358 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70525 ,  G03F7/70558

Abstract: A lithographic or exposure apparatus (1) has a projection system (12, 14, 18) and a controller (500). The projection system includes a stationary part (12) and a moving part (14, 18). The projection system is configured to project a plurality of radiation beams onto locations on a target. The locations are selected based on a pattern. The controller is configured to control the apparatus to operate in a first mode or a second mode. In the first mode the projection system delivers a first amount of energy to the selected locations. In the second mode the projection system delivers a second amount of energy to the selected locations. The second amount of energy is greater than the first amount of energy.

Abstract translation: 光刻或曝光设备（1）具有投影系统（12,14,18）和控制器（500）。 投影系统包括固定部分（12）和移动部分（14,18）。 投影系统被配置为将多个辐射束投影到目标上的位置上。 基于模式选择位置。 控制器被配置为控制设备以第一模式或第二模式操作。 在第一模式中，投影系统向选定位置传送第一量的能量。 在第二模式中，投影系统将第二量的能量传送到所选择的位置。 第二量的能量大于第一能量。

公开(公告)号：WO2013104482A1

公开(公告)日：2013-07-18

申请号：PCT/EP2012/075450

申请日：2012-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： LOOPSTRA, Erik ,  HOEKS, Martinus

IPC: G03F7/20

CPC classification number: G03B27/72 ,  G03B27/32 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/70508

Abstract: An apparatus or method to calculate target dose values to be applied by a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.

Abstract translation: 一种计算在多个不同时间由多个辐射束施加的目标剂量值以在目标上形成所需剂量图案的装置或方法，每个目标剂量值定义由 施加目标剂量值的辐射束，其中每个斑点曝光的剂量分布中的特征点的标称位置位于点曝光栅格的点处，并且以分辨率提供目标剂量值 通过计算较低分辨率网格上的网格点处的目标剂量值的点曝光网格，具有低于点曝光网格的分辨率的较低分辨率网格，以及针对每个计算的目标剂量值，在每个计算的目标剂量值 点曝光网格中的多个点。