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    APPARATUS FOR AND METHOD OF OPTICAL COMPONENT ALIGNMENT
    1.
    发明申请
    APPARATUS FOR AND METHOD OF OPTICAL COMPONENT ALIGNMENT 审中-公开

    公开(公告)号：WO2022046402A1

    公开(公告)日：2022-03-03

    申请号：PCT/US2021/045324

    申请日：2021-08-10

    Applicant: CYMER, LLC

    Inventor： YE, Hong

    IPC: G03F7/20 ,  H01S3/00

    Abstract: Apparatus for and method of aligning optical components such as mirrors to facilitate proper beam alignment using an image integration optical system is used to integrate images from multiple optical features such as from both left mirror bank and right mirror bank to present the images simultaneously to the camera system. A fluorescent material may be used to render a beam footprint visible and the relative positions of the footprint and an alignment feature may be used to align the optical feature.

    REDUCING FRETTING CORROSION IN A GAS DISCHARGE CHAMBER SUPPORT DEVICE
    2.
    发明申请
    REDUCING FRETTING CORROSION IN A GAS DISCHARGE CHAMBER SUPPORT DEVICE 审中-公开

    公开(公告)号：WO2021167760A1

    公开(公告)日：2021-08-26

    申请号：PCT/US2021/015114

    申请日：2021-01-26

    Applicant: CYMER, LLC

    Inventor： STEIGER, Thomas, Dickson

    IPC: H01J61/12 ,  F16C35/00 ,  H01J61/16 ,  H01J61/28 ,  G03F7/20 ,  H01S3/036

    Abstract: A light source apparatus (100) includes: a chamber (101) having a chamber wall (103) defining an opening (107); and a support apparatus (110) including a support device (111) positioned within the opening of the chamber wall. The support device includes: a cup (112) having an inner surface (114) configured to retain a movable apparatus and an outer surface (116) having a first outer diameter; and a plurality of rods (118) arranged at the outer surface of the cup such that the arrangement of the plurality of rods defines a second outer diameter, the second outer diameter greater than the first outer diameter. The chamber wall is configured to hold the support device such that the chamber wall contacts the plurality of rods when the support device is positioned within the opening of the chamber wall, and the outer surface of the cup does not contact the chamber wall.

    ENERGY CORRECTION MODULE FOR AN OPTICAL SOURCE APPARATUS
    4.
    发明申请
    ENERGY CORRECTION MODULE FOR AN OPTICAL SOURCE APPARATUS 审中-公开

    公开(公告)号：WO2021126527A1

    公开(公告)日：2021-06-24

    申请号：PCT/US2020/062820

    申请日：2020-12-02

    Applicant: CYMER, LLC

    Inventor： ZHAO, Yingbo ,  IMAM, Md, Hossain, Toufiq

    IPC: G03F7/20 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/7005 ,  G03F7/70558

    Abstract: A system for deep ultraviolet (DUV) optical lithography includes an optical source apparatus including N optical oscillators, N being an integer number greater than or equal to two, and each of the N optical oscillators is configured to produce a pulse of light in response to an excitation signal; and a control system coupled to the optical source apparatus. The control system is configured to determine a corrected excitation signal for a first one of the N optical oscillators based on an input signal, the input signal including an energy property of a pulse of light produced by another one of the N optical oscillators.

    A RADIATION SYSTEM FOR CONTROLLING BURSTS OF PULSES OF RADIATION
    5.
    发明申请
    A RADIATION SYSTEM FOR CONTROLLING BURSTS OF PULSES OF RADIATION 审中-公开

    公开(公告)号：WO2021091730A1

    公开(公告)日：2021-05-14

    申请号：PCT/US2020/057570

    申请日：2020-10-27

    Applicant: CYMER, LLC

    Inventor： ZHAO, Yingbo

    IPC: G03F7/20 ,  H01S3/00 ,  H01S3/10 ,  H01S3/08

    Abstract: A radiation system for controlling bursts of pulses of radiation comprises: an optical element; a controller; an actuator; and a sensor. The optical element is configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, the characteristic of the pulses of radiation being dependent on a configuration of the optical element. The controller is operable to generate a control signal. The actuator is configured to receive the control signal from the controller and to control a configuration of the optical element in dependence on the control signal. The sensor is operable to determine the characteristic of pulses having interacted with the optical element. The control signal for a given pulse in a given burst is dependent on the determined characteristic of a corresponding pulse from a previous burst.

    RADIATION SOURCE TESTING
    6.
    发明申请
    RADIATION SOURCE TESTING 审中-公开

    公开(公告)号：WO2021086640A1

    公开(公告)日：2021-05-06

    申请号：PCT/US2020/055987

    申请日：2020-10-16

    Applicant: CYMER, LLC

    Inventor： BURDT, Russell, Allen ,  DUFFEY, Thomas, Patrick

    IPC: G03F7/20

    Abstract: A method of generating a test for a radiation source for a lithographic apparatus comprises a step of receiving data corresponding to a plurality of firing patterns of the radiation source. The method further comprises the step of analyzing the data to determine parameters for configuring one or more further firing patterns for testing the radiation source. The parameters are determined such that a stability of the radiation source when executing the one or more further firing patterns configured using the parameters is substantially the same as, or within predefined bounds relative to, a stability of the radiation source when executing the plurality of firing patterns. Furthermore, parameters are determined such that a total duration of the one or more further firing patterns when executed by the radiation source will be less than a duration of the plurality of firing patterns when executed by the radiation source.

    SMART GAS TEMPERATURE CONTROL IN A LASER SOURCE
    7.
    发明申请
    SMART GAS TEMPERATURE CONTROL IN A LASER SOURCE 审中-公开

    公开(公告)号：WO2021080842A1

    公开(公告)日：2021-04-29

    申请号：PCT/US2020/055723

    申请日：2020-10-15

    Applicant: CYMER, LLC

    Inventor： MINAKAIS, Matthew

    IPC: H01S3/134 ,  H01S3/041 ,  H01S3/131 ,  G03F7/20 ,  H01S3/10 ,  H01S3/102 ,  H01S3/104 ,  H01S3/23

    Abstract: A laser source includes a first laser chamber configured to generate a first laser beam and a second laser chamber configured to receive the first laser beam and amplify the first laser beam to generate a second laser beam. The laser source further includes first and second temperature actuators configured to control, respectively, a first temperature of a gas in the first laser chamber and a second temperature of a gas in the second laser chamber. The laser source also includes a temperature control system configured to receive data from the first and second temperature actuators and determine a threshold associated with the first and second temperature actuators based on the received data. The threshold is used by the first and second temperature actuators in controlling the first and second temperatures.

    FLUORINE DETECTION IN A GAS DISCHARGE LIGHT SOURCE
    8.
    发明申请
    FLUORINE DETECTION IN A GAS DISCHARGE LIGHT SOURCE 审中-公开

    公开(公告)号：WO2021041224A1

    公开(公告)日：2021-03-04

    申请号：PCT/US2020/047430

    申请日：2020-08-21

    Applicant: CYMER, LLC

    Inventor： ZURITA, Omar

    IPC: G01N33/00 ,  G01N33/52 ,  H01S3/104 ,  H01S3/225

    Abstract: A method includes: receiving at least a portion of a mixed gas from a gas discharge chamber, wherein the mixed gas includes fluorine; reacting the fluorine in the mixed gas portion with a hydroxide to form a new gas mixture including oxygen and water; sensing a concentration of water within the new gas mixture; and estimating a concentration of fluorine within the mixed gas portion based on the sensed concentration of water.

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