公开(公告)号：WO2007133252A3

公开(公告)日：2007-11-22

申请号：PCT/US2006/042858

申请日：2006-11-01

Applicant: ADVANTECH GLOBAL, LTD. ,  MARCANIO, Joseph, A. ,  CONRAD, Jeffrey, W.

Inventor： MARCANIO, Joseph, A. ,  CONRAD, Jeffrey, W.

IPC: B05D1/32 ,  B05D5/00

Abstract: In a method of preparing and using an aperture mask, a temperature of an aperture mask is increased to a first, mounting temperature (T1), whereupon the size of the aperture mask increases according to its coefficient of thermal expansion (CTEam), until at least one dimension thereof is of a first desired extent. The temperature of a frame is also increased to T1, whereupon the size of the frame grows according to its coefficient of thermal expansion (CTEf), which is lower than CTEam. The aperture mask is fixedly mounted to the frame at T1. The frame mounted aperture mask is then used for depositing a material on a substrate at a deposition temperature T2 that is less than T1, whereupon the frame holds the shadow mask in tension with the one dimension at a second desired extent.

公开(公告)号：WO2006058081A2

公开(公告)日：2006-06-01

申请号：PCT/US2005042468

申请日：2005-11-22

Applicant: ADVANTECH GLOBAL LTD ,  CONRAD JEFFREY W

Inventor： CONRAD JEFFREY W

IPC: H01L21/3205

CPC classification number: C23C14/042

Abstract: The present invention is a multi-layer shadow mask and method of use thereof. The multi-layer shadow mask includes a sacrificial mask bonded to a deposition mask. The sacrificial mask provides protection against an accumulation of evaporant on the deposition mask which would cause the deposition mask to deform.

Abstract translation: 本发明是一种多层荫罩及其使用方法。 多层荫罩包括结合到沉积掩模的牺牲掩模。 牺牲掩模提供防止沉积掩模上的蒸发剂积聚的保护，这将使沉积掩模变形。

公开(公告)号：WO2007133252A2

公开(公告)日：2007-11-22

申请号：PCT/US2006042858

申请日：2006-11-01

Applicant: ADVANTECH GLOBAL LTD ,  MARCANIO JOSEPH A ,  CONRAD JEFFREY W

Inventor： MARCANIO JOSEPH A ,  CONRAD JEFFREY W

IPC: H02M5/42

CPC classification number: C23C14/042 ,  H05K3/1225 ,  H05K2201/068 ,  H05K2203/0169 ,  H05K2203/1105

Abstract: In a method of preparing and using an aperture mask, a temperature of an aperture mask is increased to a first, mounting temperature (T1), whereupon the size of the aperture mask increases according to its coefficient of thermal expansion (CTEam), until at least one dimension thereof is of a first desired extent. The temperature of a frame is also increased to T1, whereupon the size of the frame grows according to its coefficient of thermal expansion (CTEf), which is lower than CTEam. The aperture mask is fixedly mounted to the frame at T1. The frame mounted aperture mask is then used for depositing a material on a substrate at a deposition temperature T2 that is less than T1, whereupon the frame holds the shadow mask in tension with the one dimension at a second desired extent.

Abstract translation: 在制备和使用孔径掩模的方法中，孔径掩模的温度增加到第一安装温度（T1），于是孔径掩模的尺寸根据其热膨胀系数（CTEam）而增加，直到在 其至少一个维度具有第一期望的程度。 帧的温度也增加到T1，随着帧的大小根据其低于CTEam的热膨胀系数（CTEf）而增长。 光圈掩模在T1固定安装到框架上。 然后将框架安装孔径掩模用于在小于T1的沉积温度T2下将材料沉积在基底上，于是框架以相反的尺寸在一个维度上保持荫罩的张力。

公开(公告)号：WO2006071671A3

公开(公告)日：2006-07-06

申请号：PCT/US2005/046348

申请日：2005-12-20

Applicant: ADVANTECH GLOBAL, LTD. ,  BRODY, Thomas, P. ,  MARCANIO, Joseph, A. ,  CONRAD, Jeffrey, W. ,  COWEN, Timothy, A.

Inventor： BRODY, Thomas, P. ,  MARCANIO, Joseph, A. ,  CONRAD, Jeffrey, W. ,  COWEN, Timothy, A.

IPC: H01L21/4763 ,  C23C16/00

Abstract: Via holes are formed in a continuous inline shadow mask production system by depositing a first conductor layer and subsequently depositing a first insulator layer over a portion of the first conductor layer. The first insulator layer is deposited in a manner to define at least one notch along its edge. The second insulator layer is then deposited on another portion of the first conductor layer in a manner whereupon the second insulator layer slightly overlaps each notch of the first insulator layer, thereby forming the one or more via holes. A conductive filler can optionally be deposited in each via hole. Lastly, a second conductive layer can be deposited over the first insulator layer, the second insulator layer and, if provided, the conductive filler.

公开(公告)号：WO2006047305A3

公开(公告)日：2007-05-31

申请号：PCT/US2005037937

申请日：2005-10-20

Applicant: ADVANTECH GLOBAL LTD ,  BRODY THOMAS P ,  MALMBERG PAUL R ,  CONRAD JEFFREY W

Inventor： BRODY THOMAS P ,  MALMBERG PAUL R ,  CONRAD JEFFREY W

IPC: C23C16/00

CPC classification number: C23C14/042

Abstract: The present invention is a substrate holder system for and method of providing a substrate-to-mask alignment mechanism, securing mechanism and temperature control mechanism. The substrate holder system is suitable for use in an automated shadow mask vacuum deposition process. The substrate holder system includes a system controller, and a substrate arranged between a magnetic chuck assembly and a mask holder assembly. The magnetic chuck assembly includes a magnetic chuck, a thermoelectric device, a plurality of thermal sensors and a plurality of light sources. The mask holder assembly includes a shadow mask, a mask holder, a motion control system and a plurality of cameras. The substrate holder system of the present invention provides close contact between the substrate and the shadow mask thereby avoiding the possibility of evaporant material entering into a gap therebetween.

Abstract translation: 本发明是一种用于提供基板到掩模对准机构，固定机构和温度控制机构的基板保持器系统和方法。 衬底保持器系统适用于自动阴影真空沉积工艺。 衬底保持器系统包括系统控制器和布置在磁性吸盘组件和面罩保持器组件之间的衬底。 磁性卡盘组件包括磁卡盘，热电装置，多个热传感器和多个光源。 面罩支架组件包括荫罩，面罩座，运动控制系统和多个相机。 本发明的基板保持器系统提供了基板和荫罩之间的紧密接触，从而避免了蒸发材料进入其间的间隙的可能性。

公开(公告)号：WO2006071671A2

公开(公告)日：2006-07-06

申请号：PCT/US2005046348

申请日：2005-12-20

Applicant: ADVANTECH GLOBAL LTD ,  BRODY THOMAS P ,  MARCANIO JOSEPH A ,  CONRAD JEFFREY W ,  COWEN TIMOTHY A

Inventor： BRODY THOMAS P ,  MARCANIO JOSEPH A ,  CONRAD JEFFREY W ,  COWEN TIMOTHY A

IPC: H01L21/4763

CPC classification number: H01L21/76802 ,  H01L21/67173 ,  H01L21/67207 ,  H05K1/0393 ,  H05K3/143 ,  H05K3/4076 ,  H05K3/467 ,  H05K2203/1545 ,  Y10S438/944 ,  Y10S438/945

Abstract: Via holes are formed in a continuous inline shadow mask production system by depositing a first conductor layer and subsequently depositing a first insulator layer over a portion of the first conductor layer. The first insulator layer is deposited in a manner to define at least one notch along its edge. The second insulator layer is then deposited on another portion of the first conductor layer in a manner whereupon the second insulator layer slightly overlaps each notch of the first insulator layer, thereby forming the one or more via holes. A conductive filler can optionally be deposited in each via hole. Lastly, a second conductive layer can be deposited over the first insulator layer, the second insulator layer and, if provided, the conductive filler.

Abstract translation: 通过沉积第一导体层并随后在第一导体层的一部分上沉积第一绝缘体层，在连续的在线荫罩制备系统中形成通孔。 以沿其边缘限定至少一个凹口的方式沉积第一绝缘体层。 然后以第二绝缘体层与第一绝缘体层的每个凹口稍微重叠的方式将第二绝缘体层沉积在第一导体层的另一部分上，从而形成一个或多个通孔。 可以任选地在每个通孔中沉积导电填料。 最后，第二导电层可以沉积在第一绝缘体层，第二绝缘体层上，如果提供，则沉积在导电填料上。

公开(公告)号：WO2006058081A3

公开(公告)日：2006-06-01

申请号：PCT/US2005/042468

申请日：2005-11-22

Applicant: ADVANTECH GLOBAL, LTD. ,  CONRAD, Jeffrey, W.

Inventor： CONRAD, Jeffrey, W.

IPC: H01L21/00 ,  H01L21/44

Abstract: The present invention is a multi-layer shadow mask and method of use thereof. The multi-layer shadow mask includes a sacrificial mask bonded to a deposition mask. The sacrificial mask provides protection against an accumulation of evaporant on the deposition mask which would cause the deposition mask to deform.

公开(公告)号：WO2006047305A2

公开(公告)日：2006-05-04

申请号：PCT/US2005/037937

申请日：2005-10-20

Applicant: ADVANTECH GLOBAL, LTD. ,  BRODY, Thomas, P. ,  MALMBERG, Paul, R. ,  CONRAD, Jeffrey, W.

Inventor： BRODY, Thomas, P. ,  MALMBERG, Paul, R. ,  CONRAD, Jeffrey, W.

IPC: C23C16/00

CPC classification number: C23C14/042

Abstract: The present invention is a substrate holder system for and method of providing a substrate-to-mask alignment mechanism, securing mechanism and temperature control mechanism. The substrate holder system is suitable for use in an automated shadow mask vacuum deposition process. The substrate holder system includes a system controller, and a substrate arranged between a magnetic chuck assembly and a mask holder assembly. The magnetic chuck assembly includes a magnetic chuck, a thermoelectric device, a plurality of thermal sensors and a plurality of light sources. The mask holder assembly includes a shadow mask, a mask holder, a motion control system and a plurality of cameras. The substrate holder system of the present invention provides close contact between the substrate and the shadow mask thereby avoiding the possibility of evaporant material entering into a gap therebetween.

Abstract translation: 本发明是一种用于提供基板到掩模对准机构，固定机构和温度控制机构的基板保持器系统和方法。 衬底保持器系统适用于自动阴影真空沉积工艺。 衬底保持器系统包括系统控制器和布置在磁性吸盘组件和面罩保持器组件之间的衬底。 磁性卡盘组件包括磁卡盘，热电装置，多个热传感器和多个光源。 面罩支架组件包括荫罩，面罩座，运动控制系统和多个相机。 本发明的基板保持器系统提供了基板和荫罩之间的紧密接触，从而避免了蒸发材料进入其间的间隙的可能性。