公开(公告)号：WO2012076300A1

公开(公告)日：2012-06-14

申请号：PCT/EP2011/070147

申请日：2011-11-15

Applicant: ASML Netherlands B.V. ,  VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  DE MAN, Hendrik

Inventor： VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  DE MAN, Hendrik

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70216 ,  G03F7/70258 ,  G03F7/70266 ,  G03F7/70275 ,  G03F7/70375 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704

Abstract: A system for controlling the focus of a maskless lithographic apparatus is provided, in which a projection system for projecting an image of a programmable patterning device onto a substrate is provided. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is also provided, that is configured to project an image of the programmable patterning device onto said lens. Furthermore, a second actuator system is provided, configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.

Abstract translation: 提供了一种用于控制无掩模光刻设备的焦点的系统，其中提供了用于将可编程图案形成装置的图像投影到基板上的投影系统。 第一致动器系统被配置为沿着垂直于投影系统的光轴的方向移动投影系统的透镜中的至少一个。 还提供了辐射束扩展器，其被配置为将可编程图案形成装置的图像投影到所述透镜上。 此外，提供第二致动器系统，其被配置为沿着平行于投影系统的光轴的方向移动辐射束扩展器，以便控制投射到基板上的图像的焦点。

公开(公告)号：WO2011144387A1

公开(公告)日：2011-11-24

申请号：PCT/EP2011/055500

申请日：2011-04-08

Applicant: ASML NETHERLANDS B.V. ,  ONVLEE, Johannes ,  DEKKER, Albert ,  SPIERDIJK, Johannus ,  DE MAN, Hendrik

Inventor： ONVLEE, Johannes ,  DEKKER, Albert ,  SPIERDIJK, Johannus ,  DE MAN, Hendrik

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70916 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70808 ,  G03F7/70833 ,  G03F7/70883

Abstract: A lithographic apparatus including an optical column to project a beam on a target portion of a substrate is disclosed, the optical column having a projection system configured to project the beam onto the target portion. The apparatus further includes an actuator to move the optical column or at least part thereof with respect to the substrate and a window (940) between the moving part of the optical column and the target portion of the substrate and/or between the moving part of the optical column and a non -moving part of the optical column, the window constructed and arranged within the apparatus to reduce or minimize movement of the window.

Abstract translation: 公开了一种包括在基板的目标部分上投射光束的光学柱的光刻设备，该光学柱具有被配置为将光束投影到目标部分上的投影系统。 该装置还包括致动器，用于相对于基板移动光学柱或其至少一部分，以及在光学柱的运动部分和基板的目标部分之间和/或在基板的移动部分之间的窗口（940） 光学柱和光学柱的非移动部分，窗口构造和布置在设备内以减少或最小化窗口的移动。

公开(公告)号：WO2011104175A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052403

申请日：2011-02-18

Applicant: ASML Netherlands B.V. ,  VAN ZWET ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik ,  DEKKER, Albert ,  P. F. SPIERDIJK, Johannus ,  DE MAN, Hendrik

Inventor： DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik ,  DEKKER, Albert ,  P. F. SPIERDIJK, Johannus ,  DE MAN, Hendrik

IPC: G03F7/20

CPC classification number: G03F7/704 ,  G03F7/70258 ,  G03F7/70391

Abstract: The invention relates to a lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate. The optical column may be provided with a self emissive contrast device configured to emit beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. The projection system further comprises an adjustable member (936) to adjust a position of at least one lens (930) of the movable optical column or part thereof in respect of the movable optical column or part thereof.

Abstract translation: 本发明涉及一种光刻设备，其包括能够在基板的目标部分上产生图案的光学柱。 光学柱可以设置有被配置为发射光束的自发射对比度装置和被配置为将光束投影到目标部分上的投影系统。 该装置可以设置有致动器，以相对于基板移动光学柱或其一部分。 投影系统还包括可调节构件（936），用于相对于可移动光学柱或其一部分来调节可移动光学柱或其部分的至少一个透镜（930）的位置。