公开(公告)号：WO2015020814A1

公开(公告)日：2015-02-12

申请号：PCT/US2014/048186

申请日：2014-07-25

Applicant: APPLIED MATERIALS, INC.

Inventor： MACK, James Francis ,  MOFFATT, Stephen

IPC: H01L21/30 ,  H05K3/00

CPC classification number: G03F7/704 ,  G03F7/70375 ,  G03F7/70383

Abstract: A fine feature formation method and apparatus provide photon induced deposition, etch and thermal or photon based treatment in an area of less than the diameter or cross section of a STED depleted laser beam. At least two STED depleted beams are directed to a reaction location on a substrate where a beam overlap region having an area smaller than the excitation portion of the beams is formed. A reactant or reactants introduced to the reaction region is excited by the combined energy of the excitation portions of the two beams, but not excited outside of the overlap region of the two excitation portions of the beams. A reactant is caused to occur only in the overlap region. The overlap region may be less that 20nm wide, and less than 1nm in width, to enable the formation of substrate features, or the change in the substrate, in a small area.

Abstract translation: 精细的特征形成方法和装置在小于STED耗尽的激光束的直径或横截面的区域中提供光子诱导的沉积，蚀刻和基于热或光子的处理。 至少两个STED耗尽的光束被引导到衬底上的反应位置，其中形成了具有小于光束的激发部分的面积的光束重叠区域。 引入到反应区域的反应物被两个光束的激发部分的组合能激发，但不被激发在光束的两个激发部分的重叠区域外面。 使反应物仅在重叠区域中发生。 重叠区域可以小于20nm宽，并且宽度小于1nm，以便在小的区域中形成衬底特征或衬底的变化。

公开(公告)号：WO2010005831A3

公开(公告)日：2010-04-08

申请号：PCT/US2009049207

申请日：2009-06-30

Applicant: UNIV KANSAS STATE ,  HIGGINS DANIEL A ,  ITO TAKASHI ,  YAO XIAO

Inventor： HIGGINS DANIEL A ,  ITO TAKASHI ,  YAO XIAO

IPC: H01L21/3065

CPC classification number: G03F7/7085 ,  G03F7/2053 ,  G03F7/70375 ,  G03F7/70383 ,  G03F7/70525 ,  G03F7/70566 ,  G03F7/70608

Abstract: Improved, high resolution, laser ablated grayscale assembles (A) are provided including a substrate (24a) and a polymer layer (24b) having an etched region (R) presenting areas of different, predetermined thicknesses. Preferably, the region (R) exhibits a maximum RMS roughness value of up to about 5 ran. The fabrication method involves providing a sample (24) having a substrate (24a) and polymer layer (24b), and laser ablating the layer (24b) by multiphoton photolithography to give the different thickness areas characteristic of a desired grayscale pattern. Preferably, the fabrication involves transmissivc laser ablation wherein the incident laser beam is transmitted through the substrate (24a) to ablate the layer (24b). Advantageously, the polymer layer (24b) comprises a poly(alkylene dioxythiophene):poly(styrene sulfonate) mixture.

Abstract translation: 提供了改进的高分辨率激光烧蚀灰度组件（A），其包括具有呈现不同预定厚度的区域的蚀刻区域（R）的基板（24a）和聚合物层（24b）。 优选地，区域（R）呈现高达约5nm的最大RMS粗糙度值。 该制造方法涉及提供具有基板（24a）和聚合物层（24b）的样品（24），并且通过多光子光刻术激光烧蚀该层（24b）以给出期望的灰度图案的不同厚度区域特征。 优选地，制造涉及透射式激光烧蚀，其中入射激光束透射通过衬底（24a）以烧蚀层（24b）。 有利地，聚合物层（24b）包含聚（亚烷基二氧噻吩）：聚（苯乙烯磺酸盐）混合物。

公开(公告)号：WO2009134762A3

公开(公告)日：2010-02-18

申请号：PCT/US2009041923

申请日：2009-04-28

Applicant: MASSACHUSETTS INST TECHNOLOGY ,  KIM DAEKEUN ,  SO PETER T C

Inventor： KIM DAEKEUN ,  SO PETER T C

IPC: G02B21/06 ,  G01N21/25 ,  G01N21/64

CPC classification number: G03F7/70375

Abstract: An imaging system is provided that includes a optical pulse generator for providing an optical pulse having a spectral bandwidth and includes monochromatic waves having different wavelengths. A dispersive element receives a second optical pulse associated with the optical pulse and disperses the second optical pulse at different angles on the surface of the dispersive element depending on wavelength. One or more focal elements receives the dispersed second optical pulse produced on the dispersive element. The one or more focal element recombine the dispersed second optical pulse at a focal plane on a specimen where the width of the optical pulse is restored at the focal plane.

Abstract translation: 提供了一种成像系统，其包括用于提供具有光谱带宽的光脉冲的光脉冲发生器，并且包括具有不同波长的单色波。 分散元件接收与光脉冲相关联的第二光脉冲，并且根据波长在分散元件的表面上以不同的角度分散第二光脉冲。 一个或多个焦点元件接收在分散元件上产生的分散的第二光脉冲。 一个或多个焦点元件将分散的第二光脉冲重叠在光脉冲的宽度在焦平面处恢复的样本上的焦平面处。

公开(公告)号：WO2006125576A3

公开(公告)日：2007-05-24

申请号：PCT/EP2006004810

申请日：2006-05-20

Applicant: ZEISS CARL SMT AG ,  SCHELLHORN UWE ,  MANGER MATTHIAS ,  KEIL MICHAEL

Inventor： SCHELLHORN UWE ,  MANGER MATTHIAS ,  KEIL MICHAEL

IPC: G03F7/20

CPC classification number: G03F7/706 ,  G03F7/70375 ,  G03F7/70466

Abstract: The invention relates to an optical grid system comprising at least one optical grid (3a, 3b) with a grid substrate, to a device for carrying out a moiré measuring technique of an optical test object and to a device and method for substrate structuring by multiple exposure. The invention is characterized by producing at least one grid structure in the grid substrate by wave excitation, especially with a variably adjustable phase and/or with predetermined wavelength or frequency ratio of the wave excitation for two optical grids, e.g. for use in moiré distortion measurements. The invention can be used, e.g., in metrology and in multiple exposure technology of microlithography projection exposure systems.

Abstract translation: 本发明涉及一种光学栅格阵列与至少一个光栅（3A，3B），其具有一个光栅基片，以用于测试，以及用于通过多个曝光衬底图案化的装置和方法的光学装置的莫尔测量的装置。 光栅结构是至少根据通过在衬底晶格波激励而产生，特别是与可变地可调节相位和/或波激发的两个光栅可预定的波长或频率比，例如本发明。 至于莫尔失真测量。 使用ž。 作为计量和微光​​刻投射曝光系统的多次曝光技术。

公开(公告)号：WO2005088395A2

公开(公告)日：2005-09-22

申请号：PCT/US2005008281

申请日：2005-03-11

Applicant: WORCESTER POLYTECH INST ,  CYGANSKI DAVID ,  MCGIMPSEY GRANT W

Inventor： CYGANSKI DAVID ,  MCGIMPSEY GRANT W

IPC: G03F20060101 ,  G03F7/20 ,  G03F

CPC classification number: G03F7/70466 ,  G03F7/0045 ,  G03F7/031 ,  G03F7/203 ,  G03F7/70375 ,  G03F7/70575

Abstract: Preferred embodiments of the present invention provide methods of forming a photolithographic pattern by patternwise imaging each of two or more different modalities of light onto a multiphoton-specific photoinitiator material to form a photolithographic pattern on the surface where each of the patterns of the two or more different wavelengths of light overlap. In various embodiments, the invention provides a method of semiconductor fabrication capable of permitting the formation of an imaged feature having a dimension smaller than lambda/(2NA), where lambda is the smallest wavelength of imaging light, and NA is the numerical aperture of the imaging system.

Abstract translation: 本发明的优选实施例提供了通过将多个光子特异性光引发剂材料的两种或多种不同光学模式中的每一种图案成像来形成光刻图案的方法，以在表面上形成光刻图案，其中两个或更多个 不同波长的光重叠。 在各种实施例中，本发明提供一种能够允许形成尺寸小于λ/（2NA）的成像特征的半导体制造方法，其中λ是成像光的最小波长，NA是数字孔径 成像系统。

公开(公告)号：WO2004044944A3

公开(公告)日：2004-08-19

申请号：PCT/US0334785

申请日：2003-10-31

Applicant: APPLIED MATERIALS ISRAEL LTD ,  APPLIED MATERIALS INC ,  ALONI MEIR ,  FREIDMAN MULA ,  VISHNIPOLSKY JIMMY ,  ALMOGY GILAD ,  LITMAN ALON ,  LEHMAN YONATAN ,  MESHULACH DORON ,  TIROSH EHUD

Inventor： ALONI MEIR ,  FREIDMAN MULA ,  VISHNIPOLSKY JIMMY ,  ALMOGY GILAD ,  LITMAN ALON ,  LEHMAN YONATAN ,  MESHULACH DORON

IPC: G03F7/20 ,  H01J37/317

CPC classification number: G03F7/70375 ,  G03F7/70275

Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.

Abstract translation: 用于在基底上写入主图像的方法包括将主图像分成帧矩阵，每个帧包括在主图像内的相应帧位置中定义相应帧图像的像素阵列。 当电子束在相应的帧位置上扫描时，电子束在衬底上以光栅图案扫描，同时响应于每个帧的相应帧图像而对电子束进行整形，使得在每一帧中，电子束 同时将多个像素写入到衬底上。

公开(公告)号：WO02095353A3

公开(公告)日：2003-02-27

申请号：PCT/US0215132

申请日：2002-05-17

Applicant: UNIV MARYLAND ,  SHIH YANHUA ,  D ANGELO MILENA ,  CHEKHOVA MARIA

Inventor： SHIH YANHUA ,  D ANGELO MILENA ,  CHEKHOVA MARIA

IPC: G03F7/20 ,  G01N21/63

CPC classification number: G03F7/70375

Abstract: A microscope for observing a lithographic product where multi-photon entangled light passes through a first lens (Lens 1), a second lens (Lens 2) and impinges on a surface plane (Image) to observe a specimen.

Abstract translation: 用于观察多光子纠缠光通过第一透镜（透镜1），第二透镜（透镜2）并撞击在表面（图像）上以观察样品的光刻产品的显微镜。

公开(公告)号：WO2003001869A2

公开(公告)日：2003-01-09

申请号：PCT/US2002/016872

申请日：2002-05-29

Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

Inventor： KIK, Pieter, G. ,  ATWATER, Harry, A.

IPC: G03F1/00 ,  G03F1/54 ,  G03F7/20

CPC classification number: B82Y10/00 ,  G03F1/00 ,  G03F1/50 ,  G03F1/54 ,  G03F7/70375 ,  G03F7/70408

Abstract: A method and apparatus for replicating patterns with a resolution well below the diffraction limit, uses broad beam illumination and standard photoresist. In particular, visible exposure (λ = 410 nm) of silver nanoparticles in close proximity to a thin film of g-line resist (AZ 1813) can produce selectively exposed areas with a diameter smaller than λ/20. The technique relies on the local field enhancement around metal nanostructures when illuminated at the surface plasmon resonance frequency. The method is extended to various metals, photosensitive layers, and particle shapes.

Abstract translation: 复制具有远低于衍射极限的分辨率的图案的方法和装置使用宽光束照明和标准光致抗蚀剂。 特别地，靠近g线抗蚀剂（AZ1813）薄膜的银纳米颗粒的可见曝光（λ= 410nm）可以产生直径小于λ/ 20的选择性曝光区域。 该技术依赖于在表面等离子体共振频率下照射时金属纳米结构周围的局部场增强。 该方法扩展到各种金属，感光层和颗粒形状。

公开(公告)号：WO01071778A3

公开(公告)日：2002-03-14

申请号：PCT/IL2001/000269

申请日：2001-03-20

IPC: B82B3/00 ,  C23C14/04 ,  G03F7/00 ,  G03F7/20 ,  C23C14/22

CPC classification number: B82Y30/00 ,  B82B3/00 ,  B82Y40/00 ,  C23C14/048 ,  G03F1/78 ,  G03F7/001 ,  G03F7/70375

Abstract: A method for the controlled nanometer-scale deposition of atomic or molecular species on a surface (24), by means of coherently controlled optical focusing. The coherent control is conveniently performed by inducing a linear superposition of excited atomic states or molecular bound states respectively, by means of electromagnetic fields supplied by an applied laser beam (13). The optical focusing is conveniently performed by passing a beam (10) of such suitably prepared species through another electromagnetic field supplied by a standing wave (14, 18) induced by two interacting laser beams (20, 22). Altering the characteristics of the laser beams alters the forces operating on the species, thus directing them to the desired position on the surface (24). Selection of the frequencies, intensities, and relative phases of the electromagnetic fields, as well as the geometry of the interaction between the beam and the electromagnetic fields, enables deposition of aperiodic patterns (26) on the surface with a resolution of 10 to 15 nanometers. Such nanoscale focusing of atoms or molecules by coherent light can be used for executing nanometric lithographic processes.

Abstract translation: 通过相干控制的光学聚焦在表面（24）上控制的纳米级沉积原子或分子物质的方法。 通过借助施加的激光束（13）提供的电磁场分别诱导激发的原子态或分子束缚状态的线性叠加来方便地执行相干控制。 通过使这种适当制备的物质的束（10）通过由两个相互作用的激光束（20,22）感应的驻波（14,18）提供的另一电磁场来方便地执行光学聚焦。 改变激光束的特性改变了对物质作用的力，从而将它们引导到表面（24）上的期望位置。 电磁场的频率，强度和相对相位的选择以及光束和电磁场之间的相互作用的几何形状使得能够以10至15纳米的分辨率沉积非周期性图案（26）在表面上 。 通过相干光的原子或分子的这种纳米尺度聚焦可用于执行纳米光刻工艺。

公开(公告)号：WO01071431A1

公开(公告)日：2001-09-27

申请号：PCT/US2000/024618

申请日：2000-09-08

IPC: G03F7/00 ,  G03F7/20 ,  G03H1/02 ,  G11B7/0065 ,  G11B7/244 ,  G11B7/25 ,  G11C13/04 ,  G03H1/04

CPC classification number: G11B7/245 ,  B82Y10/00 ,  G03F7/001 ,  G03F7/70375 ,  G03F7/70408 ,  G03H1/02 ,  G03H2001/026 ,  G03H2260/12 ,  G11B7/00455 ,  G11B7/0065 ,  G11B7/24044 ,  G11B7/244 ,  G11B7/25 ,  G11C13/042 ,  Y10S359/90

Abstract: A process and photoactive media for holographic recording and micro/nanofabrication of optical and bio-optical structures via the simultaneous absorption of two-photons by the photoactive media to induce a simultaneous photochemical change in regions of constructive interference within a holographic pattern is disclosed. The photochemical process of polymerization resulting from the simultaneous absorption of two-photons may be used for the microfabrication of micro and nanoscaled features, holographic data storage, and the formation of switchable diffraction gratings. In a specific example, a two beam holographic configuration is used in a set-up (100) with various optics (110, 112, 114) for dividing a single beam and impinging the two beams on a sample plane (118) to interfere with one another.

Abstract translation: 公开了一种用于全息记录和光学和生物光学结构的微/纳米制造的工艺和光活性介质，其通过光活性介质同时吸收双光子以引起全息图案内的建构性干扰区域的同时光化学变化。 由同时吸收双光子引起的聚合的光化学过程可用于微观和纳米尺度特征的微细加工，全息数据存储和可切换衍射光栅的形成。 在具体示例中，在具有各种光学器件（110,112,114）的设置（100）中使用双光束全息构造，用于分割单个光束并将两个光束照射在样品平面（118）上以干扰 另一个。