CYLINDRICAL ROTATING MAGNETRON SPUTTERING CATHODE DEVICE AND METHOD OF DEPOSITING MATERIAL USING RADIO FREQUENCY EMISSIONS
    1.
    发明申请
    CYLINDRICAL ROTATING MAGNETRON SPUTTERING CATHODE DEVICE AND METHOD OF DEPOSITING MATERIAL USING RADIO FREQUENCY EMISSIONS 审中-公开
    圆柱旋转磁珠溅射阴极器件和使用无线电频率发射材料沉积的方法

    公开(公告)号:WO2011123646A2

    公开(公告)日:2011-10-06

    申请号:PCT/US2011/030726

    申请日:2011-03-31

    Abstract: A rotating magnetron sputtering cathode apparatus comprising a radio frequency power supply, a power delivery assembly, a cylindrical rotating cathode, a shaft and a drive motor, wherein the power delivery assembly comprises a magnetic field source positioned within the cathode and an electrode extending within said cathode to transmit radio frequency energy to target material on the outer surface of the cathode. The electrode is electrically isolated from the shaft, and is formed from non-ferrous materials, and the shaft is mechanically connected to the cathode such that they remain electrically isolated while the cathode rotates about the magnetic field source and a portion of the electrode. The power supply is adapted to supply radio frequency energy at frequencies of 1 MHz or higher and is electrically connected to the electrode. A method of depositing material with a rotating cylindrical magnetron sputtering cathode apparatus comprising a radio frequency power supply and a cylindrical rotating cathode is also disclosed wherein the outer surface of the rotating cathode comprises a target material formed of an oxide. The method comprises the steps of causing the power supply to supply radio frequency energy at frequencies of 1 MHz or higher, causing the cathode to rotate, and positioning a substrate proximate to said outside surface of said cathode whereby the radio frequency energy causes the cathode to eject particles from the target material onto the substrate.

    Abstract translation: 一种旋转磁控溅射阴极装置,包括射频电源,电力输送组件,圆柱形旋转阴极,轴和驱动电动机,其中功率输送组件包括位于阴极内的磁场源和在所述阴极内延伸的电极 阴极将射频能量传输到阴极外表面上的目标材料。 电极与轴电隔离,由有色金属材料形成,并且轴与阴极机械连接,使得它们保持电绝缘,同时阴极围绕磁场源和电极的一部分旋转。 该电源适于提供1MHz或更高频率的射频能量并且电连接至电极。 还公开了一种用包括射频电源和圆柱形旋转阴极的旋转圆柱形磁控溅射阴极装置沉积材料的方法,其中旋转阴极的外表面包括由氧化物形成的靶材料。 该方法包括以下步骤:使电源以1MHz或更高的频率提供射频能量,使阴极旋转,并将衬底定位成靠近所述阴极的所述外表面,由此射频能量使阴极 将颗粒从目标材料喷射到基底上。

    SMART MATERIAL ACTUATOR ADAPTED FOR RESONANT OPERATION
    2.
    发明申请
    SMART MATERIAL ACTUATOR ADAPTED FOR RESONANT OPERATION 审中-公开
    智能材料执行器适用于谐振操作

    公开(公告)号:WO2011029081A2

    公开(公告)日:2011-03-10

    申请号:PCT/US2010047931

    申请日:2010-09-06

    CPC classification number: H02N2/043 H02N2/06

    Abstract: A smart material actuator having a fixed supporting member, mechanical web, actuating arm, and piezoelectric or smart material stack is disclosed, together with a sensor adapted to indicate the degree of motion of the actuating arms and controller adapted to allow safe operation of the actuator in resonant conditions. Methods of maintaining resonant operation, avoiding resonant operation, and adjusting resonant frequencies are also disclosed.

    Abstract translation: 公开了具有固定支撑构件,机械腹板,致动臂和压电或智能材料堆的智能材料致动器,以及适于指示致动臂和控制器的运动程度的传感器,其适于允许执行器的安全操作 在谐振条件下。 还公开了保持谐振操作,避免谐振操作和调节谐振频率的方法。

    APPARATUS AND METHOD FOR THE EVAPORATION AND DEPOSITION OF MATERIALS
    3.
    发明申请
    APPARATUS AND METHOD FOR THE EVAPORATION AND DEPOSITION OF MATERIALS 审中-公开
    用于材料蒸发和沉积的装置和方法

    公开(公告)号:WO2013028977A3

    公开(公告)日:2013-05-10

    申请号:PCT/US2012052281

    申请日:2012-08-24

    Abstract: An apparatus and method for the evaporation and deposition of materials onto a substrate. A material hopper assembly may receive source material. An agitator mechanism may be controlled for urging or advancing forward the source material. A grinding mechanism may be controlled for grinding source material. A heating pot vessel may be heated to evaporate the source material. The evaporated source material may be deposited on a proximate substrate. The rate of the deposition may be controlled in part by the agitator mechanism and/or the grinding mechanism. Temperature zones in a heating pot vessel may be independently controlled to evaporate the source material. A reactor chamber may be heated to allow the evaporated source materials to interact. A heated mesh may be charged to accelerate particles of the evaporated source materials onto the substrate.

    Abstract translation: 一种用于将材料蒸发和沉积到衬底上的设备和方法。 料斗组件可以接收源材料。 可以控制搅拌器机构来推动或前进源材料。 研磨机构可以被控制用于研磨源材料。 加热罐容器可以被加热以蒸发源材料。 蒸发的源材料可以沉积在邻近的基底上。 沉积速率可部分由搅拌器机构和/或研磨机构控制。 加热锅容器中的温度区域可以被独立控制以蒸发源材料。 可以加热反应室以允许蒸发的源材料相互作用。 加热的网可以被充电以将蒸发的源材料的粒子加速到衬底上。

    CYLINDRICAL ROTATING MAGNETRON SPUTTERING CATHODE DEVICE AND METHOD OF DEPOSITING MATERIAL USING RADIO FREQUENCY EMISSIONS
    4.
    发明申请
    CYLINDRICAL ROTATING MAGNETRON SPUTTERING CATHODE DEVICE AND METHOD OF DEPOSITING MATERIAL USING RADIO FREQUENCY EMISSIONS 审中-公开
    圆柱形旋转磁控溅射阴极装置以及使用射频发射沉积材料的方法

    公开(公告)号:WO2011123646A3

    公开(公告)日:2011-12-22

    申请号:PCT/US2011030726

    申请日:2011-03-31

    Abstract: A rotating magnetron sputtering cathode apparatus comprising a radio frequency power supply, a power delivery assembly, a cylindrical rotating cathode, a shaft and a drive motor, wherein the power delivery assembly comprises a magnetic field source positioned within the cathode and an electrode extending within said cathode to transmit radio frequency energy to target material on the outer surface of the cathode. The electrode is electrically isolated from the shaft, and is formed from non-ferrous materials, and the shaft is mechanically connected to the cathode such that they remain electrically isolated while the cathode rotates about the magnetic field source and a portion of the electrode. The power supply is adapted to supply radio frequency energy at frequencies of 1 MHz or higher and is electrically connected to the electrode. A method of depositing material with a rotating cylindrical magnetron sputtering cathode apparatus comprising a radio frequency power supply and a cylindrical rotating cathode is also disclosed wherein the outer surface of the rotating cathode comprises a target material formed of an oxide. The method comprises the steps of causing the power supply to supply radio frequency energy at frequencies of 1 MHz or higher, causing the cathode to rotate, and positioning a substrate proximate to said outside surface of said cathode whereby the radio frequency energy causes the cathode to eject particles from the target material onto the substrate.

    Abstract translation: 一种旋转磁控溅射阴极装置,包括射频电源,功率输送组件,圆柱形旋转阴极,轴和驱动电机,其中功率输送组件包括位于阴极内的磁场源和在所述阴极内延伸的电极 阴极将射频能量发射到阴极外表面上的靶材料。 电极与轴电隔离,并且由非铁材料形成,并且轴与阴极机械连接,使得它们保持电隔离,同时阴极围绕磁场源和电极的一部分旋转。 电源适用于提供频率为1MHz或更高的射频能量,并电连接到电极。 还公开了一种用包括射频电源和圆柱形旋转阴极的旋转圆柱形磁控管溅射阴极装置沉积材料的方法,其中旋转阴极的外表面包括由氧化物形成的靶材料。 该方法包括以下步骤:使电源以1MHz或更高的频率提供射频能量,使阴极旋转,以及将衬底定位在所述阴极的所述外表面附近,由此射频能量使阴极 将颗粒从目标材料喷射到基板上。

    APPARATUS AND METHOD FOR THE EVAPORATION AND DEPOSITION OF MATERIALS
    5.
    发明申请
    APPARATUS AND METHOD FOR THE EVAPORATION AND DEPOSITION OF MATERIALS 审中-公开
    用于材料蒸发和沉积的装置和方法

    公开(公告)号:WO2013028977A2

    公开(公告)日:2013-02-28

    申请号:PCT/US2012/052281

    申请日:2012-08-24

    Abstract: An apparatus and method for the evaporation and deposition of materials onto a substrate. A material hopper assembly may receive source material. An agitator mechanism may be controlled for urging or advancing forward the source material. A grinding mechanism may be controlled for grinding source material. A heating pot vessel may be heated to evaporate the source material. The evaporated source material may be deposited on a proximate substrate. The rate of the deposition may be controlled in part by the agitator mechanism and/or the grinding mechanism. Temperature zones in a heating pot vessel may be independently controlled to evaporate the source material. A reactor chamber may be heated to allow the evaporated source materials to interact. A heated mesh may be charged to accelerate particles of the evaporated source materials onto the substrate.

    Abstract translation: 用于将材料蒸发和沉积到基底上的装置和方法。 材料料斗组件可以接收源材料。 可以控制搅拌器机构以推动或推进源材料。 可以控制研磨机构用于研磨源材料。 加热锅容器可以被加热以蒸发源材料。 蒸发的源材料可以沉积在邻近的基底上。 沉积速率可以部分地由搅拌器机构和/或磨削机构来控制。 可以独立地控制加热罐容器中的温度区域以蒸发源材料。 可以加热反应室以允许蒸发的源材料相互作用。 可以加热加热的网以将蒸发的源材料的颗粒加速到基底上。

    HUMIDITY PROTECTED APPARATUS
    6.
    发明申请
    HUMIDITY PROTECTED APPARATUS 审中-公开
    湿度保护装置

    公开(公告)号:WO2009152409A1

    公开(公告)日:2009-12-17

    申请号:PCT/US2009/047163

    申请日:2009-06-12

    CPC classification number: H01L41/0533 H02N2/043

    Abstract: An apparatus (10) having a support structure (12) with at least one surface for movement by a smart material actuator (32), such as a piezoelectric actuator, in which the actuator can be protected from humidity, moisture, and/or other harmful substances by, for example, a continuous layer of a barrier compound contacting the support structure and coating the actuator, or at least one film affixed to the support structure for enclosing the actuator, or both. Methods for the protection of an actuator are provided.

    Abstract translation: 一种具有支撑结构(12)的装置(10),所述支撑结构具有至少一个由智能材料致动器(32)移动的表面,例如压电致动器,其中所述致动器可被保护免受潮湿,湿气和/或其它影响 有害物质通过例如与支撑结构接触的阻挡化合物的连续层并涂覆致动器,或至少一个胶片固定到支撑结构上,以封闭致动器,或两者。 提供了用于保护致动器的方法。

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