COMPOSITIONS, LAYERS AND FILMS FOR OPTOELECTRONIC DEVICES, METHODS OF PRODUCTION AND USES THEREOF
    2.
    发明申请
    COMPOSITIONS, LAYERS AND FILMS FOR OPTOELECTRONIC DEVICES, METHODS OF PRODUCTION AND USES THEREOF 审中-公开
    光电器件的组合物,层和膜,其生产方法及其用途

    公开(公告)号:WO2008124711A1

    公开(公告)日:2008-10-16

    申请号:PCT/US2008/059612

    申请日:2008-04-08

    Abstract: Crosslinkable compositions are disclosed herein that comprise at least one silicon-based material comprising at least one alkyl group and at least one aryl or aromatic group, at least one catalyst, and at least one solvent. Optoelectronic devices are described that include: a) a surface within the device, and b) at least one sufficiently light-transmissive crosslinked film, wherein the film is formed from at least one silicon-based material, at least one catalyst, and at least one solvent. Optoelectronic device (105) are also disclosed, which include: a) a surface within the device (120), and b) at least one light-transmissive crosslinkable composition (140), wherein the composition comprises at least one silicon-based material, at least one crosslinking agent and at least one solvent. Methods of producing optoelectronic devices (105) are also disclosed that include: a) providing a surface (120), b) providing at least one sufficiently light-transmissive crosslinkable composition (140), wherein the composition comprises at least one silicon-based material and at least one catalyst, c) applying the crosslinkable material to the surface, and d) curing the crosslinkable material to form a sufficiently light-transmissive crosslinked composition. Crosslinkable compositions are disclosed that comprise: polyphenylsilsesquioxane, polyphenylsiloxane or a combination thereof, tetramethylammonium nitrate, at least one solvent, and an aminopropyl triethoxysilane-based compound.

    Abstract translation: 本文公开的可交联组合物包含至少一种包含至少一个烷基和至少一个芳基或芳族基团的硅基材料,至少一种催化剂和至少一种溶剂。 描述了光电器件,其包括:a)器件内的表面,以及b)至少一个足够透光的交联膜,其中所述膜由至少一种硅基材料,至少一种催化剂形成,并且至少 一种溶剂。 还公开了光电子器件(105),其包括:a)器件(120)内的表面,和b)至少一种透光性可交联组合物(140),其中所述组合物包含至少一种硅基材料, 至少一种交联剂和至少一种溶剂。 还公开了制造光电器件(105)的方法,其包括:a)提供表面(120),b)提供至少一种足够透光的可交联组合物(140),其中所述组合物包含至少一种硅基材料 和至少一种催化剂,c)将所述可交联材料施加到所述表面,以及d)固化所述可交联材料以形成足够透光的交联组合物。 公开了可交联组合物,其包含:聚苯基倍半硅氧烷,聚苯基硅氧烷或其组合,四甲基硝酸铵,至少一种溶剂和氨基丙基三乙氧基硅烷基化合物。

    THICK CRACK-FREE SILICA FILM BY COLLOIDAL SILICA INCORPORATION
    3.
    发明申请
    THICK CRACK-FREE SILICA FILM BY COLLOIDAL SILICA INCORPORATION 审中-公开
    由胶体二氧化硅纳入的厚裂纹二氧化硅薄膜

    公开(公告)号:WO2007053407A2

    公开(公告)日:2007-05-10

    申请号:PCT/US2006041719

    申请日:2006-10-26

    Abstract: The invention relates to low temperature curable spin-on glass materials which are useful for electronic applications, such as optical devices, in particular for flat panel displays. A substantially crack-free silicon polymer film is produced by (a) preparing a composition comprising at least one silicon containing pre-polymer, colloidal silica, an optional catalyst, and optional water; (b) coating a substrate with the composition to form a film on the substrate, (c) crosslinking the composition by heating to produce a substantially crack-free silicon polymer film, having a thickness of from about 700 Å to about 20,000 Å, and a transparency to light in the range of about 400 nm to about 800 nm of about 90% or more.

    Abstract translation: 本发明涉及低温固化旋涂玻璃材料,其可用于电子应用,例如光学装置,特别是用于平板显示器。 通过(a)制备包含至少一种含硅预聚物,胶态二氧化硅,任选的催化剂和任选的水的组合物来制备基本上无裂缝的硅聚合物膜; (b)用该组合物涂覆基底以在基底上形成膜,(c)通过加热使该组合物交联以产生厚度为约至约的基本上无裂缝的硅聚合物膜和 对于约400nm至约800nm范围内的光的透明度为约90%或更多。

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