METHOD FOR DETECTION OF OVERSIZED SUB-RESOLUTION ASSIST FEATURES
    1.
    发明申请
    METHOD FOR DETECTION OF OVERSIZED SUB-RESOLUTION ASSIST FEATURES 审中-公开
    用于检测超分辨率分析辅助特征的方法

    公开(公告)号:WO2010005700A3

    公开(公告)日:2010-03-04

    申请号:PCT/US2009047357

    申请日:2009-06-15

    CPC classification number: G03F1/84 G03F1/36

    Abstract: Disclosed are methods and apparatus for inspecting a sub-resolution assist features (SRAF) on a reticle. A test flux measurement for a boundary area that encompasses a width and a length portion of a test SRAF is determined, and at least one reference flux measurement for one or more boundary areas of one or more reference SRAF's is determined. The test flux measurement is compared with the reference flux measurements. The comparison is used to then determine whether the test SRAF is undersized or oversized. If the test SRAF is determined to be oversized, it may then be determined whether the test SRAF is defective based on the comparison using a first threshold.

    Abstract translation: 公开了用于检查掩模版上的分解度辅助特征(SRAF)的方法和装置。 确定包含测试SRAF的宽度和长度部分的边界区域的测试磁通量测量,并且确定一个或多个参考SRAF的一个或多个边界区域的至少一个参考通量测量。 将测试磁通量测量与参考通量测量值进行比较。 比较用于确定测试SRAF是否尺寸过小或过大。 如果测试SRAF被确定为过大,则可以基于使用第一阈值的比较来确定测试SRAF是否有缺陷。

    FOCUS OFFSET CONTAMINATION INSPECTION
    2.
    发明申请
    FOCUS OFFSET CONTAMINATION INSPECTION 审中-公开
    焦点偏移污染检查

    公开(公告)号:WO2012051245A3

    公开(公告)日:2012-06-21

    申请号:PCT/US2011055891

    申请日:2011-10-12

    Inventor: HESS CARL E

    CPC classification number: G01N21/94 G01N21/956 G01N2021/95676 G03F1/84

    Abstract: A system and method for detecting defects on a reticle is disclosed. The method may comprise determining a best focus setting for imaging the reticle; obtaining a first image of the reticle, the first image obtained at the best focus setting plus a predetermined offset; obtaining a second image of the reticle, the second image obtained at the best focus setting minus the predetermined offset; generating a differential image, the differential image representing a difference between the first image and the second image; and identifying a defect on the reticle based on the differential image. The method in accordance with the present disclosure may also be utilized for detecting defects on at least a portion of the reticle.

    Abstract translation: 公开了用于检测光罩上的缺陷的系统和方法。 该方法可以包括确定用于对掩模版进行成像的最佳焦点设置; 获得所述掩模版的第一图像,所述第一图像在所述最佳焦点设置处获得,加上预定的偏移量; 获得所述标线的第二图像,所述第二图像在最佳聚焦设置减去所述预定偏移后获得; 产生差分图像,所述差分图像表示所述第一图像和所述第二图像之间的差异; 以及基于差分图像来识别掩模版上的缺陷。 根据本公开的方法也可以用于检测至少一部分光罩上的缺陷。

    FOCUS OFFSET CONTAMINATION INSPECTION
    3.
    发明申请
    FOCUS OFFSET CONTAMINATION INSPECTION 审中-公开
    焦点偏差污染检查

    公开(公告)号:WO2012051245A2

    公开(公告)日:2012-04-19

    申请号:PCT/US2011/055891

    申请日:2011-10-12

    Inventor: HESS, Carl E.

    CPC classification number: G01N21/94 G01N21/956 G01N2021/95676 G03F1/84

    Abstract: A system and method for detecting defects on a reticle is disclosed. The method may comprise determining a best focus setting for imaging the reticle; obtaining a first image of the reticle, the first image obtained at the best focus setting plus a predetermined offset; obtaining a second image of the reticle, the second image obtained at the best focus setting minus the predetermined offset; generating a differential image, the differential image representing a difference between the first image and the second image; and identifying a defect on the reticle based on the differential image. The method in accordance with the present disclosure may also be utilized for detecting defects on at least a portion of the reticle.

    Abstract translation: 公开了一种用于检测掩模版上的缺陷的系统和方法。 该方法可以包括确定用于使掩模版成像的最佳聚焦设置; 获得掩模版的第一图像,在最佳焦点设置处获得的第一图像加上预定的偏移; 获得所述掩模版的第二图像,在最佳焦点设置处获得的所述第二图像减去所述预定偏移; 产生差分图像,差分图像表示第一图像和第二图像之间的差异; 以及基于所述差分图像来识别所述掩模版上的缺陷。 根据本公开的方法还可以用于检测掩模版的至少一部分上的缺陷。

    METHOD FOR DETECTION OF OVERSIZED SUB-RESOLUTION ASSIST FEATURES
    4.
    发明申请
    METHOD FOR DETECTION OF OVERSIZED SUB-RESOLUTION ASSIST FEATURES 审中-公开
    用于检测过分的子分辨率辅助特征的方法

    公开(公告)号:WO2010005700A2

    公开(公告)日:2010-01-14

    申请号:PCT/US2009/047357

    申请日:2009-06-15

    CPC classification number: G03F1/84 G03F1/36

    Abstract: Disclosed are methods and apparatus for inspecting a sub-resolution assist features (SRAF) on a reticle. A test flux measurement for a boundary area that encompasses a width and a length portion of a test SRAF is determined, and at least one reference flux measurement for one or more boundary areas of one or more reference SRAF's is determined. The test flux measurement is compared with the reference flux measurements. The comparison is used to then determine whether the test SRAF is undersized or oversized. If the test SRAF is determined to be oversized, it may then be determined whether the test SRAF is defective based on the comparison using a first threshold.

    Abstract translation: 公开了用于检查光罩上的次分辨率辅助特征(SRAF)的方法和设备。 确定包含测试SRAF的宽度和长度部分的边界区域的测试通量测量,并且确定一个或多个参考SRAF的一个或多个边界区域的至少一个参考通量测量。 测试通量测量值与参考通量测量值进行比较。 比较用于确定测试SRAF是否过小或过大。 如果测试SRAF被确定为过大,则可以基于使用第一阈值的比较来确定测试SRAF是否有缺陷。

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