公开(公告)号：WO2010005700A3

公开(公告)日：2010-03-04

申请号：PCT/US2009047357

申请日：2009-06-15

Applicant: KLA TENCOR CORP ,  HESS CARL E ,  XIONG YALIN

Inventor： HESS CARL E ,  XIONG YALIN

IPC: H01L21/66 ,  H01L21/027

CPC classification number: G03F1/84 ,  G03F1/36

Abstract: Disclosed are methods and apparatus for inspecting a sub-resolution assist features (SRAF) on a reticle. A test flux measurement for a boundary area that encompasses a width and a length portion of a test SRAF is determined, and at least one reference flux measurement for one or more boundary areas of one or more reference SRAF's is determined. The test flux measurement is compared with the reference flux measurements. The comparison is used to then determine whether the test SRAF is undersized or oversized. If the test SRAF is determined to be oversized, it may then be determined whether the test SRAF is defective based on the comparison using a first threshold.

Abstract translation: 公开了用于检查掩模版上的分解度辅助特征（SRAF）的方法和装置。 确定包含测试SRAF的宽度和长度部分的边界区域的测试磁通量测量，并且确定一个或多个参考SRAF的一个或多个边界区域的至少一个参考通量测量。 将测试磁通量测量与参考通量测量值进行比较。 比较用于确定测试SRAF是否尺寸过小或过大。 如果测试SRAF被确定为过大，则可以基于使用第一阈值的比较来确定测试SRAF是否有缺陷。

公开(公告)号：WO2012051245A3

公开(公告)日：2012-06-21

申请号：PCT/US2011055891

申请日：2011-10-12

Applicant: KLA TENCOR CORP ,  HESS CARL E

Inventor： HESS CARL E

IPC: G01N21/94 ,  H01L21/66

CPC classification number: G01N21/94 ,  G01N21/956 ,  G01N2021/95676 ,  G03F1/84

Abstract: A system and method for detecting defects on a reticle is disclosed. The method may comprise determining a best focus setting for imaging the reticle; obtaining a first image of the reticle, the first image obtained at the best focus setting plus a predetermined offset; obtaining a second image of the reticle, the second image obtained at the best focus setting minus the predetermined offset; generating a differential image, the differential image representing a difference between the first image and the second image; and identifying a defect on the reticle based on the differential image. The method in accordance with the present disclosure may also be utilized for detecting defects on at least a portion of the reticle.

Abstract translation: 公开了用于检测光罩上的缺陷的系统和方法。 该方法可以包括确定用于对掩模版进行成像的最佳焦点设置; 获得所述掩模版的第一图像，所述第一图像在所述最佳焦点设置处获得，加上预定的偏移量; 获得所述标线的第二图像，所述第二图像在最佳聚焦设置减去所述预定偏移后获得; 产生差分图像，所述差分图像表示所述第一图像和所述第二图像之间的差异; 以及基于差分图像来识别掩模版上的缺陷。 根据本公开的方法也可以用于检测至少一部分光罩上的缺陷。

公开(公告)号：WO2014093732A3

公开(公告)日：2014-11-27

申请号：PCT/US2013074841

申请日：2013-12-13

Applicant: KLA TENCOR CORP

Inventor： HESS CARL E

IPC: H01L21/66

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G01N2021/95615 ,  G06T2207/10056 ,  G06T2207/20021 ,  G06T2207/30148

Abstract: With an optical inspection tool, images of a plurality of patches of a plurality of dies of a reticle are obtained. The patch images are obtained so that each patch image is positioned relative to a same reference position within its respective die as another die- equivalent one of the patch images in each the other ones of the dies. For each patch image, an integrated value is determined for an image characteristic of sub-portions of such patch image. For each patch image, a reference value is determined based on the integrated values of the patch image's corresponding die-equivalent patch images. For each patch image, a difference between that patch image's integrated value and an average or median value of its die-equivalent patch images is determined whereby a significant difference indicates a variance in a pattern characteristic of a patch and an average or median pattern characteristic of its die-equivalent patches.

Abstract translation: 利用光学检查工具，获得了光罩的多个裸片的多个贴片的图像。 获得贴片图像，使得每个贴片图像相对于其相应裸片内的相同基准位置被定位成与另外一个芯片中的另一个片上相当的贴片图像之一。 对于每个贴片图像，针对这种贴片图像的子部分的图像特性确定积分值。 对于每个补丁图像，基于补丁图像的相应的管芯等效补丁图像的积分值来确定参考值。 对于每个贴片图像，确定该贴片图像的积分值与其芯片等效贴片图像的平均值或中值之间的差异，其中显着差异指示贴片的图案特性的变化，以及贴片的图案特性的平均或中值图案特性 其模具等效补丁。