公开(公告)号：WO2008115372A8

公开(公告)日：2008-09-25

申请号：PCT/US2008/003224

申请日：2008-03-12

Applicant: NIKON CORPORATION ,  POON, Alex, Ka, Tim ,  KHO, Leonard, Wai, Fung ,  KESWANI, Gaurav ,  COON, Derek

Inventor： POON, Alex, Ka, Tim ,  KHO, Leonard, Wai, Fung ,  KESWANI, Gaurav ,  COON, Derek

IPC: G03F7/20

Abstract: Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.

公开(公告)号：WO2007145725A3

公开(公告)日：2008-02-21

申请号：PCT/US2007010791

申请日：2007-05-04

Applicant: NIPPON KOGAKU KK ,  POON ALEX KA TIM ,  KHO LEONARD WAI FUNG ,  KESWANI GAURAV ,  COON DEREK

Inventor： POON ALEX KA TIM ,  KHO LEONARD WAI FUNG ,  KESWANI GAURAV ,  COON DEREK

IPC: G03B27/42 ,  G03B27/54

CPC classification number: G03F7/70341

Abstract: A lithography apparatus (10) having a fluid confinement plate (24), which completely submerges the imaging surface of a substrate (16) is disclosed A gap, filled with immersion fluid, is provided between the imaging surface of the substrate (16) and the last optical element (20) of the projection optical system (18) The fluid confinement plate (24), which is positioned within the gap is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid The fluid confinement plate (24) includes a first surface (24a) The first surface (24a) includes a droplet control element (40) to control the formation of droplets forming on the first surface (24a) In one embodiment, the droplet control element is a porous surface formed on the first surface (24a) In a second embodiment, the droplet control element is a sloped surface (44) that causes any immersion fluid on the first surface (24a) to flow toward to main body of immersion fluid in the gap.

Abstract translation: 公开了一种具有完全浸没衬底（16）的成像表面的流体限制板（24）的光刻设备（10）。在衬底（16）的成像表面和 投影光学系统（18）的最后一个光学元件（20）位于间隙内的流体限制板（24）具有足够的尺寸，使得成像表面完全浸没在浸没流体中。流体限制板（24） ）包括第一表面（24a）第一表面（24a）包括用于控制形成在第一表面（24a）上的液滴的形成的液滴控制元件（40）。在一个实施例中，液滴控制元件是形成在 第一表面（24a）在第二实施例中，液滴控制元件是使第一表面（24a）上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面（44）。

公开(公告)号：WO2005024517A3

公开(公告)日：2005-03-17

申请号：PCT/US2004/022915

申请日：2004-07-16

Applicant: NIKON RESEARCH CORPORATION OF AMERICA ,  POON, Alex Ka Tim ,  KHO, Leonard Wai Fung

Inventor： POON, Alex Ka Tim ,  KHO, Leonard Wai Fung

IPC: G02B21/00

Abstract: Embodiments of the present invention are directed to a system and a method of controlling the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space (34) between the lens (22) and the substrate (16) during the immersion lithography process. Fluid is supplied to the space and is recovered from the space through a porous member (51) in fluidic communication with the space. Maintaining the pressure in the porous member under the bubble point of the porous member can eliminate noise created by mixing air with the fluid during fluid recovery. In one embodiment, the method comprises drawing the fluid from the space via a recovery flow line through a porous member; and maintaining a pressure of the fluid in the porous member below a bubble point of the porous member during drawing of the fluid from the space.

公开(公告)号：WO2005111722A2

公开(公告)日：2005-11-24

申请号：PCT/US2005/014200

申请日：2005-04-27

Applicant: NIKON CORPORATION ,  POON, Alex, Ka, Tim ,  KHO, Leonard, Wai, Fung

Inventor： POON, Alex, Ka, Tim ,  KHO, Leonard, Wai, Fung

IPC: G03F1/00

CPC classification number: G03F7/70341

Abstract: An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity in a direction that is different than a direction in which the nozzle moves. The immersion fluid can also be injected at different rates into the inner cavity at different sides. A wafer substrate is then exposed by light through the immersion fluid.

Abstract translation: 公开了一种用于提供用于浸没光刻的流体的装置和方法。 浸入流体沿与喷嘴移动方向不同的方向注入内腔。 浸没流体也可以以不同的速率注入到不同侧的内腔中。 然后通过浸透液将光线曝光晶片衬底。

公开(公告)号：WO2007145725A2

公开(公告)日：2007-12-21

申请号：PCT/US2007/010791

申请日：2007-05-04

Applicant: NIKON CORPORATION ,  POON, Alex, Ka, Tim ,  KHO, Leonard, Wai, Fung ,  KESWANI, Gaurav ,  COON, Derek

Inventor： POON, Alex, Ka, Tim ,  KHO, Leonard, Wai, Fung ,  KESWANI, Gaurav ,  COON, Derek

IPC: G03B27/42

CPC classification number: G03F7/70341

Abstract: A lithography apparatus having a fluid confinement plate, which completely submerges the imaging surface of a substrate, is disclosed. The apparatus includes an imaging element defining an image and a stage configured to support the substrate. A projection optical system is provided to project the image defined by the imaging element onto the imaging surface of the substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of the projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface. In one embodiment, the droplet control element is a porous surface formed on the first surface. A vacuum is used to pull any excess immersion fluid through the porous region to prevent the formation of droplets. In a second embodiment, the droplet control element is a sloped surface that causes any immersion fluid on the first surface to flow toward to main body of immersion fluid in the gap.

Abstract translation: 公开了一种具有完全浸没衬底的成像表面的流体限制板的光刻设备。 该装置包括限定图像的成像元件和被配置为支撑基板的台。 提供投影光学系统以将由成像元件限定的图像投影到基板的成像表面上。 在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。 定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。 流体限制板包括面对间隙的第一表面并与基底的成像表面相对。 第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。 在一个实施例中，液滴控制元件是形成在第一表面上的多孔表面。 使用真空来吸引多余的浸渍流体通过多孔区域以防止形成液滴。 在第二实施例中，液滴控制元件是使第一表面上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面。

公开(公告)号：WO2005111722A3

公开(公告)日：2006-06-15

申请号：PCT/US2005014200

申请日：2005-04-27

Applicant: NIPPON KOGAKU KK ,  POON ALEX KA TIM ,  KHO LEONARD WAI FUNG

Inventor： POON ALEX KA TIM ,  KHO LEONARD WAI FUNG

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity (34) in a direction that is different than a direction in which the nozzle (20) moves. The immersion fluid can also be injected at different rates into the inner cavity at different sides. A wafer substrate (16) is then exposed by light through the immersion fluid.

Abstract translation: 公开了一种用于提供用于浸没光刻的流体的装置和方法。 浸入流体沿与喷嘴（20）移动方向不同的方向注入内腔（34）。 浸没流体也可以以不同的速率注入到不同侧的内腔中。 晶片衬底（16）然后通过浸入液曝光。

公开(公告)号：WO2005024517A2

公开(公告)日：2005-03-17

申请号：PCT/US2004022915

申请日：2004-07-16

Applicant: NIKON RES CORP OF AMERICA ,  POON ALEX KA TIM ,  KHO LEONARD WAI FUNG

Inventor： POON ALEX KA TIM ,  KHO LEONARD WAI FUNG

IPC: G02B21/00 ,  G03B27/52 ,  G03F20060101 ,  G03F7/20 ,  G03F

CPC classification number: G03F7/70341 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70858

Abstract: Embodiments of the present invention are directed to a system and a method of controlling the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space between the lens and the substrate during the immersion lithography process. Fluid is supplied to the space and is recovered from the space through a porous member in fluidic communication with the space. Maintaining the pressure in the porous member under the bubble point of the porous member can eliminate noise created by mixing air with the fluid during fluid recovery. In one embodiment, the method comprises drawing the fluid from the space via a recovery flow line through a porous member; and maintaining a pressure of the fluid in the porous member below a bubble point of the porous member during drawing of the fluid from the space.

Abstract translation: 本发明的实施例涉及一种控制流体流动和压力以为浸没式光刻提供稳定条件的系统和方法。 在浸没光刻工艺期间，在透镜和基板之间的空间中提供流体。 流体被供应到空间，并通过与该空间流体连通的多孔构件从空间中回收。 保持多孔构件在多孔构件的泡点之下的压力可以消除在流体回收过程中将空气与流体混合而产生的噪声。 在一个实施例中，该方法包括经由回收流动线通过多孔构件从空间抽取流体; 以及在从所述空间抽出流体期间将所述多孔构件中的流体的压力维持在所述多孔构件的起泡点以下。

公开(公告)号：WO2013090123A1

公开(公告)日：2013-06-20

申请号：PCT/US2012/068294

申请日：2012-12-06

Applicant: NIKON CORPORATION ,  BINNARD, Michael B. ,  PHARAND, Michel ,  MORIMOTO, Shigeru ,  POON, Alex Ka Tim ,  COON, Derek ,  KHO, Leonard Wai Fung ,  KESWANI, Gaurav

Inventor： BINNARD, Michael B. ,  PHARAND, Michel ,  MORIMOTO, Shigeru ,  POON, Alex Ka Tim ,  COON, Derek ,  KHO, Leonard Wai Fung ,  KESWANI, Gaurav

IPC: H02K9/22

CPC classification number: H02K9/22 ,  G03F7/70758 ,  G03F7/70858 ,  H02K41/031

Abstract: A lithography tool having a stage for supporting and positioning a substrate, an array configured to move the stage, and a cover plate positioned between the stage and the array. In various embodiments, the array may be either a magnet or coil array. The cover plate acts as a thermal insulator that helps even out temperature variations across the array. Consequently, thermal disturbances to the array or other parts of the lithography tool are reduced, resulting in a minimization of positioning errors. In addition, the cover plate also protects the array and provides a smooth surface in the event of a "crash" of the substrate stage.

Abstract translation: 一种光刻工具，具有用于支撑和定位基板的台架，配置成移动台架的阵列以及位于台架和阵列之间的盖板。 在各种实施例中，阵列可以是磁体或线圈阵列。 盖板用作有助于均匀排列阵列温度变化的绝热材料。 因此，光刻工具的阵列或其他部分的热干扰减少，导致定位误差的最小化。 此外，盖板还保护阵列，并且在衬底台的“碰撞”的情况下提供光滑的表面。

公开(公告)号：WO2012174273A1

公开(公告)日：2012-12-20

申请号：PCT/US2012/042506

申请日：2012-06-14

Applicant: NIKON CORPORATION ,  KHO, Leonard, Wai-fung ,  LEE, Sandy ,  COON, Derek ,  SOGARD, Michael

Inventor： KHO, Leonard, Wai-fung ,  LEE, Sandy ,  COON, Derek ,  SOGARD, Michael

IPC: G01B13/12 ,  G05D7/01

CPC classification number: G01B13/02 ,  G01B13/12 ,  G03F9/7034 ,  G03F9/7057

Abstract: Fluid gauges are disclosed having first and second gas passageways each conducting a respective flow of gas. A third gas passageway is connected to the first and second gas passageways and conducts a respective flow of gas from the first and/or second gas passageways. The third gas passageway includes a gas sensor flanked in the third gas passageway by a first flow restrictor and a second flow restrictor to reduce noise in an electronic signal produced by the sensor.

Abstract translation: 公开了具有第一和第二气体通道的流体计，每个气体通道各自传导各自的气体流。 第三气体通道连接到第一和第二气体通道并且导引来自第一和/或第二气体通道的相应气体流。 第三气体通道包括通过第一限流器在第三气体通道中侧翼的气体传感器和第二限流器，以减少由传感器产生的电子信号中的噪声。

公开(公告)号：WO2008115372A1

公开(公告)日：2008-09-25

申请号：PCT/US2008003224

申请日：2008-03-12

Applicant: NIPPON KOGAKU KK ,  POON ALEX KA TIM ,  KHO LEONARD WAI FUNG ,  KESWANI GAURAV ,  COON DEREK

Inventor： POON ALEX KA TIM ,  KHO LEONARD WAI FUNG ,  KESWANI GAURAV ,  COON DEREK

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.

Abstract translation: 装置和方法将浸没液体保持在与光学组件相邻的空间中。 光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。 可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间， 第二部分设置在插入构件和衬底之间，衬底台或两者。 当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。