公开(公告)号：WO2016112050A9

公开(公告)日：2016-07-14

申请号：PCT/US2016/012242

申请日：2016-01-05

Applicant: MARSUPIAL HOLDINGS LLC

Inventor： PARKER, William, P. ,  PARKER, Julie

IPC: G03F1/00

Abstract: A method of fabricating a multi-tone amplitude photomask (50) includes providing a mask substrate (24). The method includes providing a stepped pattern in at least one layer (20a, 20b) of material on a surface of the mask substrate. The stepped pattern includes at least two steps and at least three levels (42, 44, 48). Each level of the stepped pattern provides a different intensity of light when a light source shines light on the stepped pattern.

公开(公告)号：WO2016112050A1

公开(公告)日：2016-07-14

申请号：PCT/US2016/012242

申请日：2016-01-05

Applicant: MARSUPIAL HOLDINGS LLC

Inventor： PARKER, William, P. ,  PARKER, Julie

IPC: G03F1/00

CPC classification number: G03F1/80 ,  B05B1/00 ,  C25D1/00 ,  C25D3/56 ,  G02B3/0012 ,  G02B5/1857 ,  G03F1/22 ,  G03F1/50 ,  G03F1/68 ,  G03F7/0005 ,  G03F7/2004 ,  G03F7/36 ,  H01L21/0334

Abstract: A method of fabricating a multi-tone amplitude photomask (50) includes providing a mask substrate (24). The method includes providing a stepped pattern in at least one layer (20a, 20b) of material on a surface of the mask substrate. The stepped pattern includes at least two steps and at least three levels (42, 44, 48). Each level of the stepped pattern provides a different intensity of light when a light source shines light on the stepped pattern.

Abstract translation: 一种制造多色调幅度光掩模（50）的方法包括提供掩模基板（24）。 该方法包括在掩模衬底的表面上的材料的至少一层（20a，20b）中提供阶梯状图案。 阶梯形图案包括至少两个步骤和至少三个层次（42,44,48）。 当光源在台阶图案上照射光时，阶梯图案的每个级别提供不同的光强度。