公开(公告)号：WO9901795A8

公开(公告)日：1999-05-20

申请号：PCT/GB9801953

申请日：1998-07-02

Applicant: HORSELL GRAPHIC IND LTD ,  MCCULLOUGH CHRISTOPHER DAVID ,  RAY KEVIN BARRY ,  MONK ALAN STANLEY VICTOR ,  BAYES STUART ,  SPOWAGE MARK JOHN

Inventor： MCCULLOUGH CHRISTOPHER DAVID ,  RAY KEVIN BARRY ,  MONK ALAN STANLEY VICTOR ,  BAYES STUART ,  SPOWAGE MARK JOHN

IPC: G03F7/039 ,  B41C1/10 ,  B41M5/36 ,  B41M5/46 ,  C08F12/24 ,  C08G8/28 ,  C08L25/18 ,  C08L61/14 ,  G03F7/022 ,  G03F7/023 ,  G03F7/20 ,  H05K3/00 ,  G03F7/004

CPC classification number: G03F7/2022 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/465 ,  G03F7/022 ,  G03F7/023 ,  G03F7/0233 ,  H05K3/0082

Abstract: A method for producing a predetermined resist pattern on for example a lithographic printing plate, circuit board or mask, comprises the imagewise exposure of a radiation sensitive positive working coating using a suitable radiation such as direct heat radiation, UV radiation, visible radiation, infrared radiation or electron beam radiation. The method is characterised by the use of a novel polymeric material which is functionalised by groups Q to render it insoluble in a developer, but such that exposure to the radiation renders it soluble therein. The groups Q are not diazide groups as is conventional, but are groups which do not release nitrogen on exposure to the radiation, and have hydrogen bonding capability. Examples of groups Q are 2-naphthylsulphonyloxy, 2-thienylsulphonyloxy, dansyloxy, p-toluenesulphonyloxy, benzoyloxy and n-butylsulphonyloxy.

Abstract translation: 用于在例如平版印刷版，电路板或掩模上制造预定抗蚀剂图案的方法包括使用合适的辐射如直接热辐射，紫外线辐射，可见光辐射，红外辐射的成像曝光辐射敏感的正性涂层 或电子束辐射。 该方法的特征在于使用由Q组官能化的新型聚合物材料，使其不溶于显影剂，但是使得暴露于辐射使其易溶于其中。 基团Q不是常规的二叠氮基，而是在暴露于辐射时不释放氮并具有氢键能力的基团。 基团Q的实例是2-萘基磺酰氧基，2-噻吩基磺酰氧基，二烷氧基，对甲苯磺酰氧基，苯甲酰氧基和正丁基磺酰氧基。

公开(公告)号：WO1996020429A1

公开(公告)日：1996-07-04

申请号：PCT/GB1995002774

申请日：1995-11-28

Applicant: HORSELL P.L.C. ,  BENNETT, Peter, Andrew, Reath ,  HOARE, Richard, David ,  MONK, Alan, Stanley, Victor

Inventor： HORSELL P.L.C.

IPC: G03F07/022

CPC classification number: B41C1/1016 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/262 ,  G03F7/0226

Abstract: There is described a method of forming a lithographic plate by the heat-mode imaging method which comprises coating on a base which can be used as a lithographic base, a positive working photosensitive composition which comprises a naphthoquinone diazide ester of a phenolic resin or a naphthoquinone diazide ester and a phenolic resin and at least one substance which absorbs infrared radiation, overall exposing the assembly to ultraviolet light to render the photosensitive composition developable, imaging the plate by means of a laser which emits in the infrared region of the spectrum and then developing the plate to remove those areas of the photosensitive composition not exposed to the laser.

Abstract translation: 描述了一种通过热模式成像方法形成平版印刷版的方法，该方法包括在可用作平版印刷基底的基底上涂布正性光敏组合物，其包含酚醛树脂的萘醌二叠氮化物或萘醌 二叠氮酯和酚醛树脂和至少一种吸收红外辐射的物质，将组件全部暴露于紫外光以使感光组合物显影，通过在该光谱的红外区域中发射的激光成像，然后显影 该板用于去除未暴露于激光的感光组合物的那些区域。

公开(公告)号：WO2009008961A1

公开(公告)日：2009-01-15

申请号：PCT/US2008/007957

申请日：2008-06-26

Applicant: EASTMAN KODAK COMPANY ,  SAVARIAR-HAUCK, Celin ,  MONK, Alan, Stanley, Victor ,  HAUCK, Gerhard

Inventor： SAVARIAR-HAUCK, Celin ,  MONK, Alan, Stanley, Victor ,  HAUCK, Gerhard

IPC: G03F7/023 ,  B41C1/10 ,  B41M5/36

CPC classification number: G03F7/0236 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/106 ,  Y10S430/127 ,  Y10S430/145 ,  Y10S430/146

Abstract: Single- and multi-layer positive-working imageable elements include an ink receptive outer layer includes a primary polymeric binder that is a poly(vinyl phenol) or a phenolic polymer having certain acidic groups. The use of this type of polymeric binder makes the imaged elements developable in low pH (11 or less) alkaline developers.

Abstract translation: 单层和多层正性可成像元件包括油墨接收外层，其包括作为聚（乙烯基苯酚）的主要聚合物粘合剂或具有某些酸性基团的酚类聚合物。 使用这种类型的聚合物粘合剂使得成像元件可在低pH（11个或更少）碱性显影剂中显影。

公开(公告)号：WO9901795A3

公开(公告)日：1999-04-15

申请号：PCT/GB9801953

申请日：1998-07-02

Applicant: HORSELL GRAPHIC IND LTD ,  MCCULLOUGH CHRISTOPHER DAVID ,  RAY KEVIN BARRY ,  MONK ALAN STANLEY VICTOR ,  BAYES STUART ,  SPOWAGE MARK JOHN

Inventor： MCCULLOUGH CHRISTOPHER DAVID ,  RAY KEVIN BARRY ,  MONK ALAN STANLEY VICTOR ,  BAYES STUART ,  SPOWAGE MARK JOHN

IPC: G03F7/039 ,  B41C1/10 ,  B41M5/36 ,  B41M5/46 ,  C08F12/24 ,  C08G8/28 ,  C08L25/18 ,  C08L61/14 ,  G03F7/022 ,  G03F7/023 ,  G03F7/20 ,  H05K3/00 ,  G03F7/004

CPC classification number: G03F7/2022 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/465 ,  G03F7/022 ,  G03F7/023 ,  G03F7/0233 ,  H05K3/0082

Abstract: A method for producing a predetermined resist pattern on for example a lithographic printing plate, circuit board or mask, comprises the imagewise exposure of a radiation sensitive positive working coating using a suitable radiation such as direct heat radiation, UV radiation, visible radiation, infrared radiation or electron beam radiation. The method is characterised by the use of a novel polymeric material which is functionalised by groups Q to render it insoluble in a developer, but such that exposure to the radiation renders it soluble therein. The groups Q are not diazide groups as is conventional, but are groups which do not release nitrogen on exposure to the radiation, and have hydrogen bonding capability. Examples of groups Q are 2-naphthylsulphonyloxy, 2-thienylsulphonyloxy, dansyloxy, p-toluenesulphonyloxy, benzoyloxy and n-butylsulphonyloxy.

Abstract translation: 用于在例如平版印刷版，电路板或掩模上产生预定抗蚀剂图案的方法包括使用合适的辐射如直接热辐射，UV辐射，可见辐射，红外辐射对辐射敏感的正性工作涂层进行成像曝光 或电子束辐射。 该方法的特征在于使用由基团Q官能化的新型聚合物材料以使其不溶于显影剂，但暴露于辐射使其可溶于其中。 基团Q不是常规的二叠氮基团，而是在暴露于辐射时不释放氮并且具有氢键能力的基团。 基团Q的实例为2-萘基磺酰氧基，2-噻吩基磺酰氧基，丹磺酰氧基，对甲苯磺酰氧基，苯甲酰氧基和正丁基磺酰氧基。

公开(公告)号：WO9901796A2

公开(公告)日：1999-01-14

申请号：PCT/GB9801957

申请日：1998-07-02

Applicant: HORSELL GRAPHIC IND LTD ,  MCCULLOUGH CHRISTOPHER DAVID ,  RAY KEVIN BARRY ,  MONK ALAN STANLEY VICTOR ,  BAYES STUART ,  KITSON ANTHONY PAUL

Inventor： MCCULLOUGH CHRISTOPHER DAVID ,  RAY KEVIN BARRY ,  MONK ALAN STANLEY VICTOR ,  BAYES STUART ,  KITSON ANTHONY PAUL

IPC: G03F7/039 ,  B41C1/10 ,  B41M5/36 ,  B41M5/46 ,  C08F12/24 ,  C08G8/28 ,  C08L25/18 ,  C08L61/14 ,  G03F7/022 ,  G03F7/023 ,  G03F7/20 ,  H05K3/00

CPC classification number: G03F7/2022 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/465 ,  G03F7/022 ,  G03F7/023 ,  G03F7/0233 ,  H05K3/0082

Abstract: A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development.

Abstract translation: 一种制备例如预定抗蚀剂图案的方法。 平版印刷版，电路板或掩模包括将辐射敏感的含二氮化物的涂层（通常被认为是UV敏感材料）成像曝光于非UV辐射，例如直接热辐射或红外辐射。 曝光的图像的积极性在开发中被揭示。 此外，已经发现在成像曝光到非UV辐射之后的紫外线辐射的泛滥暴露意味着在显影时显露出曝光图像的负面。

公开(公告)号：WO1997039894A1

公开(公告)日：1997-10-30

申请号：PCT/GB1997001117

申请日：1997-04-22

Applicant: HORSELL GRAPHIC INDUSTRIES LIMITED ,  PARSONS, Gareth, Rhodri ,  RILEY, David, Stephen ,  HOARE, Richard, David ,  MONK, Alan, Stanley, Victor

Inventor： HORSELL GRAPHIC INDUSTRIES LIMITED

IPC: B41C01/10

CPC classification number: B41M5/368 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

Abstract: There is described coated on a lithographic base a complex of a developer-insoluble phenolic resin and a compound which forms a thermally frangible complex with the phenolic resin. This complex is less soluble in the developer solution than the uncomplexed phenolic resin. However when this complex is imagewise heated the complex breaks down so allowing the non-complexed phenolic resin to the dissolved in the developing solution. Thus the solubility differential between the heated areas of the phenolic resin and the unheated areas is increased when the phenolic resin is complexed. Preferably a laser-radiation absorbing material is also present on the lithographic base. A large number of compounds which form a thermally frangible complex with the phenolic resin have been located. Examples of such compounds are quinolinium compounds, benzothiazolium compounds, pyridinium compounds and imidazoline compounds.

Abstract translation: 描述了在平版印刷基底上涂覆显影剂不溶性酚醛树脂和与酚醛树脂形成热脆性复合物的化合物的复合物。 该复合物比未络合的酚醛树脂在显影剂溶液中的溶解性较差。 然而，当该复合物成像加热时，复合物分解，使得非络合的酚醛树脂溶解在显影溶液中。 因此，当酚醛树脂复合时，酚醛树脂的加热区域与未加热区域之间的溶解度差异增加。 优选地，激光辐射吸收材料也存在于光刻基底上。 已经定位了大量与酚醛树脂形成热脆性复合物的化合物。 这些化合物的实例是喹啉鎓化合物，苯并噻唑鎓化合物，吡啶鎓化合物和咪唑啉化合物。

公开(公告)号：WO1995009383A1

公开(公告)日：1995-04-06

申请号：PCT/GB1994002056

申请日：1994-09-22

Applicant: HORSELL PLC ,  MONK, Alan, Stanley, Victor ,  BENNETT, Peter, Andrew, Reath ,  McCULLOGH, Christopher, David ,  HORNE, Geoffrey

Inventor： HORSELL PLC

IPC: G03F07/029

CPC classification number: G03F7/031 ,  G03F7/029 ,  Y10S430/107 ,  Y10S430/112 ,  Y10S430/116 ,  Y10S430/12 ,  Y10S430/124 ,  Y10S430/127 ,  Y10S430/146 ,  Y10S430/148

Abstract: There is described a lithographic plate which comprises a base coated with a photopolymerisable composition which comprises a polymeric binder, at least one free-radically polymerisable ethylenically unsaturated compound and as the photoinitiator combination a metallocene compound, N-phenyl glycine or a substituted N-phenyl glycine or an N-phenyl glycine derivative together with a third component which is a substance which helps in the reaction initiation but also increases the sensitivity of the photopolymerisable composition to a desired region of the spectrum.

Abstract translation: 描述了一种平版印刷版，其包括涂覆有可光聚合组合物的基底，其包含聚合物粘合剂，至少一种可自由基聚合的烯键式不饱和化合物，并且作为光引发剂组合，茂金属化合物，N-苯基甘氨酸或取代的N-苯基 甘氨酸或N-苯基甘氨酸衍生物以及有助于反应引发的物质的第三组分，但也增加了可光聚合组合物对光谱的所需区域的敏感性。