Abstract:
A system for imposing and analyzing surface acoustic waves in a substrate to determine characteristics of the substrate is disclosed. Optical elements and arrangements for imposing and analyzing surface acoustic waves in a substrate are also disclosed. NSOM's, gratings, and nanolight elements may be used to impose surface acoustic waves in a substrate and may also be used to measure transient changes in the substrate due to the passage of surface acoustic waves therethrough.
Abstract:
A system comprising a means for generating an optical pump beam pulse (15) and for directing the optical pump beam pulse (15) to a first area of a surface of a sample (27) having a plurality of film layers to generate an acoustic signal, a means for generating an x-ray probe pulse (17) and for directing the x-ray probe pulse (17) to a second area of the surface, a means for detecting (33) an intensity of a diffracted x-ray probe pulse (17') the intensity varying in response to the acoustic signal to form a probe pulse response signal, and a means for calculating (51) an expected transient response to a theoretical acoustic signal propagated through a model of the sample and fitting the probe pulse response to the transient response to derive at least one characteristic of the sample (27).
Abstract:
An optical metrology system (50) is provided with a data analysis method to determine the elastic moduli of optically transparent dielectric films (310) such as silicon dioxide, other carbon doped oxides over metal or semiconductor substrates. An index of refraction is measured by an ellipsometer and a wavelength of a laser beam is measured using a laser spectrometer. The angle of refraction is determined by directing a light pulse (325)focused onto a wafer surface, measuring a first set of x 1 , y 1 and z 1 coordinates (330) moving the wafer in the z direction, directing the light pulse (325) onto the wafer surface and measuring a second set of x 2 , y 2 and z 2 coordinates, using the coordinates to calculate an angle of incidence, calculating an angle of refraction from the calculated angle of incidence, obtaining a sound velocity v, from the calculated angle of refraction and using the determined sound velocity v, to calculate a bulk modulus. Hardware calibration and adjustments for the optical metrology system are also provided in order to minimize the variation of the results from tool to tool down to about 0.5 % or below.
Abstract:
A system comprising a means for generating an optical pump beam pulse and for directing the optical pump beam pulse to a first area of a surface of a sample having a plurality of film layers to generate an acoustic signal, a means for generating an x-ray probe pulse and for directing the x-ray probe pulse to a second area of the surface, a means for detecting an intensity of a diffracted x-ray probe pulse the intensity varying in response to the acoustic signal to form a probe pulse response signal, and a means for calculating an expected transient response to a theoretical acoustic signal propagated through a model of the sample and fitting the probe pulse response to the transient response to derive at least one characteristic of the sample.