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公开(公告)号：WO2018140430A1
公开(公告)日：2018-08-02
申请号：PCT/US2018/014945
申请日：2018-01-24
Applicant: ORELTECH LTD. , M&B IP ANALYSTS, LLC
Inventor： ZAMOSHCHIK, Natalia , LIVANOV, Konstantin , SHEYNIN, Yana
IPC: C23C18/14
Abstract: A method for forming a crystalline metal layer on a three-dimensional (3D) substrate is provided. The method includes applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a structuring liquid; and exposing the 3D substrate to plasma irradiation from plasma in a vacuum chamber to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters.
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Patent Agency Ranking
公开(公告)号：WO2016064860A2
公开(公告)日：2016-04-28
申请号：PCT/US2015/056438
申请日：2015-10-20
Applicant: ORELTECH LTD. , M&B IP ANALYSTS, LLC
Inventor： ZAMOSHCHIK, Natalia
CPC classification number: C09D11/52 , B41M3/006 , B41M5/0023 , B41M5/0047 , B41M5/007 , B41M7/00 , B41M7/0081 , C09D11/037 , C09D11/322 , C23C4/02 , C23C4/134 , C23C18/06 , C23C18/08 , C23C18/14 , H05H1/46 , H05H2001/4645 , H05H2245/123
Abstract: A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.
Abstract translation: 介绍了用于在基板上形成图案化的金属薄膜的组合物。 该组合物包含金属阳离子; 和至少一种溶剂，其中当至少金属阳离子暴露于低能等离子体时，图案化的薄金属膜粘附至基底的表面。
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公开(公告)号：WO2018049322A1
公开(公告)日：2018-03-15
申请号：PCT/US2017/050951
申请日：2017-09-11
Applicant: ORELTECH LTD. , M&B IP ANALYSTS, LLC
Inventor： ZAMOSHCHIK, Natalia , LIANOV, Konstantin , KOZLOV, Leonid , SHEYNIN, Yana
IPC: C23C18/14
Abstract: A method for forming a metal active component in a hybrid material is provided. The method includes applying a metal precursor formulation on a substrate; and exposing the metal precursor formulation applied on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a set of exposure parameters.
Abstract translation: 提供了一种用于在混合材料中形成金属活性组分的方法。 该方法包括将金属前体制剂施用于基材上; 和将施加在衬底上的金属前体制剂暴露于低能等离子体，其中低能等离子体根据一组曝光参数进行操作。
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公开(公告)号：WO2016064860A3
公开(公告)日：2016-06-23
申请号：PCT/US2015056438
申请日：2015-10-20
Applicant: ORELTECH LTD , M&B IP ANALYSTS LLC
Inventor： ZAMOSHCHIK NATALIA
IPC: C09D11/03 , C09D11/101 , C09D11/34 , C09D11/38
CPC classification number: C09D11/52 , B41M3/006 , B41M5/0023 , B41M5/0047 , B41M5/007 , B41M7/00 , B41M7/0081 , C09D11/037 , C09D11/322 , C23C4/02 , C23C4/134 , C23C18/06 , C23C18/08 , C23C18/14 , H05H1/46 , H05H2001/4645 , H05H2245/123
Abstract: A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma.
Abstract translation: 提出了一种用于在基板上形成图案化金属薄膜的组合物。 该组合物包括金属阳离子; 和至少一种溶剂，其中所述图案化金属薄膜在将所述至少金属阳离子暴露于低能量等离子体时粘附到所述基板的表面。
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公开(公告)号：WO2020115680A1
公开(公告)日：2020-06-11
申请号：PCT/IB2019/060441
申请日：2019-12-04
Applicant: ORELTECH LTD.
Inventor： ZAMOSHCHIK, Natalia , LIVANOV, Konstantin
Abstract: A method for growing a transparent conductive metal layer on a substrate is disclosed. The method includes the steps of applying crystal growth ink to a surface of the substrate, wherein the crystal growth ink includes a metal ionic precursor; and exposing the substrate to plasma irradiation to cause the growing of a crystalline metal framework on the substrate, wherein the exposure is based on a set of predefined exposure parameters.
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6.发明申请
公开(公告)号：WO2016064858A1
公开(公告)日：2016-04-28
申请号：PCT/US2015/056435
申请日：2015-10-20
Applicant: ORELTECH LTD. , M&B IP ANALYSTS, LLC
Inventor： ZAMOSHCHIK, Natalia
CPC classification number: C09D11/52 , B41M3/006 , B41M5/0023 , B41M5/0047 , B41M5/007 , B41M7/00 , B41M7/0081 , C09D11/037 , C09D11/322 , C23C4/02 , C23C4/134 , C23C18/06 , C23C18/08 , C23C18/14 , H05H1/46 , H05H2001/4645 , H05H2245/123
Abstract: A method and system for forming a thin patterned metal film on a substrate are presented. The method includes applying an ink composition on a pre-treated surface of the substrate, wherein the ink composition includes at least metal cations; and exposing at least the applied ink composition on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a first set of exposure parameters.
Abstract translation: 提出了一种在衬底上形成薄图案化金属膜的方法和系统。 所述方法包括将油墨组合物施加到所述基材的预处理表面上，其中所述油墨组合物至少包含金属阳离子; 以及至少将所述衬底上施加的油墨组合物暴露于低能量等离子体，其中根据第一组曝光参数操作所述低能量等离子体。
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