公开(公告)号：WO2007117294A3

公开(公告)日：2008-01-10

申请号：PCT/US2006047919

申请日：2006-12-14

Applicant: GEN ELECTRIC ,  KIM TAE WON ,  DUGGAL ANIL RAJ ,  MCCONNELEE PAUL ALAN ,  RUMSEY MICHAEL ANTHONY ,  SCHAEPKENS MARC ,  WIRTH REINHOLD FRANZ ,  YAN MIN ,  ERLAT AHMET GUN ,  FEIST THOMAS PAUL

Inventor： KIM TAE WON ,  DUGGAL ANIL RAJ ,  MCCONNELEE PAUL ALAN ,  RUMSEY MICHAEL ANTHONY ,  SCHAEPKENS MARC ,  WIRTH REINHOLD FRANZ ,  YAN MIN ,  ERLAT AHMET GUN ,  FEIST THOMAS PAUL

IPC: C23C14/56 ,  C23C16/54

CPC classification number: C23C16/45591 ,  C23C16/30 ,  C23C16/545 ,  H01J37/3277 ,  H01J2237/3325 ,  H01L51/5253 ,  H01L51/56 ,  H01L2251/5338 ,  H01L2251/5346

Abstract: Embodiments of the invention include a deposition machine that allows for continuous deposition of an object or substrate with a coating having a graded composition. The deposition machine includes a deposition chamber separated into a plurality of chamber areas by a baffle having an opening. The opening allows for migration of deposition material from one chamber area to another, allowing for a graded composition coating to be deposited on the object or substrate. Other embodiments include a system for forming an electronic device and a system and method for forming a graded composition on an object.

Abstract translation: 本发明的实施例包括一种沉积机，其允许用具有渐变组成的涂层连续沉积物体或基底。 沉积机包括通过具有开口的挡板分离成多个室区域的沉积室。 开口允许沉积材料从一个室区域迁移到另一个室区域，允许将渐变的组合物涂层沉积在物体或衬底上。 其他实施例包括用于形成电子装置的系统和用于在物体上形成渐变组合物的系统和方法。

公开(公告)号：WO2007117294A2

公开(公告)日：2007-10-18

申请号：PCT/US2006/047919

申请日：2006-12-14

Applicant: GENERAL ELECTRIC COMPANY ,  KIM, Tae, Won ,  DUGGAL, Anil, Raj ,  MCCONNELEE, Paul, Alan ,  RUMSEY, Michael, Anthony ,  SCHAEPKENS, Marc ,  WIRTH, Reinhold, Franz ,  YAN, Min ,  ERLAT, Ahmet, Gun ,  FEIST, Thomas, Paul

Inventor： KIM, Tae, Won ,  DUGGAL, Anil, Raj ,  MCCONNELEE, Paul, Alan ,  RUMSEY, Michael, Anthony ,  SCHAEPKENS, Marc ,  WIRTH, Reinhold, Franz ,  YAN, Min ,  ERLAT, Ahmet, Gun ,  FEIST, Thomas, Paul

IPC: C23C14/56 ,  C23C16/54

CPC classification number: C23C16/45591 ,  C23C16/30 ,  C23C16/545 ,  H01J37/3277 ,  H01J2237/3325 ,  H01L51/5253 ,  H01L51/56 ,  H01L2251/5338 ,  H01L2251/5346

Abstract: Embodiments of the invention include a deposition machine that allows for continuous deposition of an object or substrate with a coating having a graded composition. The deposition machine includes a deposition chamber separated into a plurality of chamber areas by a baffle having an opening. The opening allows for migration of deposition material from one chamber area to another, allowing for a graded composition coating to be deposited on the object or substrate. Other embodiments include a system for forming an electronic device and a system and method for forming a graded composition on an object.

Abstract translation: 本发明的实施例包括一种沉积机器，其允许用具有渐变组成的涂层连续沉积物体或基底。 沉积机包括通过具有开口的挡板分离成多个室区域的沉积室。 该开口允许沉积材料从一个室区域迁移到另一个室区域，允许将渐变的组合物涂层沉积在物体或衬底上。 其他实施例包括用于形成电子装置的系统和用于在物体上形成分级组合物的系统和方法。