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1.发明申请
公开(公告)号：WO2011031407A1
公开(公告)日：2011-03-17
申请号：PCT/US2010/045246
申请日：2010-08-12
Applicant: GENERAL ELECTRIC COMPANY , YAN, Min , TURNER, Larry, Gene , ERLAT, Ahmet, Gun , MONAGHAN, William, Francis , SMITH, David, J.
Inventor： YAN, Min , TURNER, Larry, Gene , ERLAT, Ahmet, Gun , MONAGHAN, William, Francis , SMITH, David, J.
CPC classification number: H01L51/56 , C23C14/042 , C23C14/562 , H01L51/0021 , H01L51/5092 , H01L51/5221
Abstract: An apparatus for applying a patterned coating to an OLED substrate in a continuous roll- to-roll vapor based deposition process is provided comprising a vapor deposition source, a processing drum, a drive roller, and a shadow mask wherein the shadow mask comprises a mask line feature that selectively prevents deposition of the coating onto the substrate. Also presented is a method for applying the coating.
Abstract translation: 提供了一种用于在连续的辊对辊蒸气基沉积工艺中将图案化涂层施加到OLED基底上的装置，其包括气相沉积源，处理鼓，驱动辊和荫罩，其中荫罩包括掩模 线性特征，其选择性地防止涂层沉积到基底上。 还提出了施加涂层的方法。
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2.发明申请
公开(公告)号：WO2008103186A1
公开(公告)日：2008-08-28
申请号：PCT/US2007/073062
申请日：2007-07-09
Applicant: GENERAL ELECTRIC COMPANY , YAN, Min , ERLAT, Ahmet, Gun , SCHAEPKENS, Marc , KIM, Tae, Won , MCCONNELEE, Paul, Alan , PELLOW, Matthew, Aaron
Inventor： YAN, Min , ERLAT, Ahmet, Gun , SCHAEPKENS, Marc , KIM, Tae, Won , MCCONNELEE, Paul, Alan , PELLOW, Matthew, Aaron
IPC: C23C16/04 , C23C16/453 , C23C16/455
CPC classification number: C23C16/045 , B05D1/60 , B05D7/02 , B05D7/227 , C23C16/45578 , C23C16/507
Abstract: Methods and devices for coating an interior surface of a container using ICPECVD are provided. In one embodiment, a method of coating an interior surface of a container comprises: depositing a barrier film on the interior surface of the container using inductively coupled plasma-enhanced chemical-vapor deposition.
Abstract translation: 提供了使用ICPECVD涂覆容器内表面的方法和装置。 在一个实施例中，涂覆容器的内表面的方法包括：使用电感耦合等离子体增强化学气相沉积将阻挡膜沉积在容器的内表面上。
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公开(公告)号：WO2007089218A3
公开(公告)日：2007-11-08
申请号：PCT/US2005041660
申请日：2005-11-15
Applicant: GEN ELECTRIC , KIM TAE WON , YAN MIN , HELLER CHRISTIAN MARIA ANTON , SCHAEPKENS MARC , GORCZYCA THOMAS BERT , MCCONNELEE PAUL ALAN , ERLAT AHMET GUN
Inventor： KIM TAE WON , YAN MIN , HELLER CHRISTIAN MARIA ANTON , SCHAEPKENS MARC , GORCZYCA THOMAS BERT , MCCONNELEE PAUL ALAN , ERLAT AHMET GUN
IPC: H01L51/50
CPC classification number: H01L51/5256
Abstract: A composite article (30) with at least one high integrity protective coating, the high integrity protective coating having at least one planarizing layer and at least one organic-inorganic composition barrier coating layer (10) . A method for depositing a high integrity protective coating.
Abstract translation: 具有至少一个高完整性保护涂层的复合制品（30），所述高完整性保护涂层具有至少一个平坦化层和至少一个有机 - 无机组合物阻挡涂层（10）。 一种沉积高完整性保护涂层的方法。
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公开(公告)号：WO2011123200A1
公开(公告)日：2011-10-06
申请号：PCT/US2011/025792
申请日：2011-02-23
Applicant: GENERAL ELECTRIC COMPANY , HELLER, Christian, Maria Anton , DUGGAL, Anil, Raj , COYLE, Dennis, Joseph , YAN, Min , ERLAT, Ahmet, Gun , ZHAO, Ri-an
Inventor： HELLER, Christian, Maria Anton , DUGGAL, Anil, Raj , COYLE, Dennis, Joseph , YAN, Min , ERLAT, Ahmet, Gun , ZHAO, Ri-an
IPC: C23C16/40 , C23C16/455 , C23C16/04 , C23C26/00
CPC classification number: C23C16/403 , C23C16/045 , C23C16/402 , C23C16/45525 , C23C26/00
Abstract: A method of processing a multilayer film is provided. The method includes providing a substrate film having a substrate film first surface and a substrate film second surface. The method also includes providing a barrier layer adjacent to the substrate film second surface. The barrier layer has at least one opening allowing fluid communication between the substrate film and an outer surface of the barrier layer. Further, the method includes contacting the substrate film first surface with a first reactant and finally contacting the outer surface of the barrier layer with a second reactant, said second reactant being reactive with said first reactant. The method of contacting the substrate film first surface to the first reactant and contacting the outer surface of the barrier layer to the second reactant is carried out under conditions under which reaction between said first reactant and the second reactant results in a formation of a reaction layer.
Abstract translation: 提供了一种处理多层膜的方法。 该方法包括提供具有基底膜第一表面和基底膜第二表面的基底膜。 该方法还包括提供与衬底膜第二表面相邻的阻挡层。 阻挡层具有允许衬底膜和阻挡层的外表面之间流体连通的至少一个开口。 此外，该方法包括使基底膜第一表面与第一反应物接触，最后使阻挡层的外表面与第二反应物接触，所述第二反应物与所述第一反应物反应。 将基材膜第一表面与第一反应物接触并使阻挡层的外表面与第二反应物接触的方法在所述第一反应物和第二反应物之间的反应导致形成反应层的条件下进行 。
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公开(公告)号：WO2009082566A1
公开(公告)日：2009-07-02
申请号：PCT/US2008/083506
申请日：2008-11-14
Applicant: GENERAL ELECTRIC COMPANY , YAKIMOV, Aharon , ERLAT, Ahmet, Gun , LITZ, Kyle, Erik , GLASER, John, Stanley , HELLER, Christian Marie, Anton
Inventor： YAKIMOV, Aharon , ERLAT, Ahmet, Gun , LITZ, Kyle, Erik , GLASER, John, Stanley , HELLER, Christian Marie, Anton
IPC: H05B33/08
CPC classification number: H05B33/0896 , H01F27/365 , H01F38/14
Abstract: A contactless power and data transfer system is disclosed. The system includes an encapsulated optoelectronic semiconductor device at least partly disposed within a barrier encapsulation, and a contactless power transfer system configured to transfer at least one of power and data across the barrier encapsulation. A method for manufacturing a contactless power and data transfer system is also disclosed.
Abstract translation: 公开了一种非接触式电力和数据传输系统。 该系统包括至少部分地设置在阻挡层封装内的封装的光电子半导体器件，以及被配置为跨屏障封装传输功率和数据中的至少一个的非接触式功率传输系统。 还公开了一种用于制造非接触式电力和数据传输系统的方法。
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Patent Agency Ranking6.发明申请SYSTEMS AND METHODS FOR ROLL-TO-ROLL ATOMIC LAYER DEPOSITION ON CONTINUOUSLY FED OBJECTS 审中-公开连续FED对象的滚动到滚动原子层沉积的系统和方法
公开(公告)号：WO2008057625A3
公开(公告)日：2009-03-19
申请号：PCT/US2007066029
申请日：2007-04-05
Applicant: GEN ELECTRIC , ERLAT AHMET GUN , BREITUNG ERIC MICHAEL , HELLER CHRISTIAN MARIA ANTON
Inventor： ERLAT AHMET GUN , BREITUNG ERIC MICHAEL , HELLER CHRISTIAN MARIA ANTON
IPC: C23C16/455 , C23C16/54
CPC classification number: C23C16/45551 , C23C16/45514 , C23C16/545
Abstract: Embodiments of the invention include a roll-to-roll atomic layer deposition (ALD) device. The device includes mechanisms to enable relative movement between a substrate to be deposited upon and various chambers containing ALD precursor gases.
Abstract translation: 本发明的实施例包括卷对卷原子层沉积（ALD）装置。 该装置包括使得要沉积的基底和含有ALD前体气体的各种室之间的相对运动的机构。
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7.发明申请SYSTEMS AND METHODS FOR ROLL-TO-ROLL ATOMIC LAYER DEPOSITION ON CONTINUOUSLY FED OBJECTS 审中-公开连续FED对象的滚动到滚动原子层沉积的系统和方法
公开(公告)号：WO2008057625A2
公开(公告)日：2008-05-15
申请号：PCT/US2007/066029
申请日：2007-04-05
Applicant: GENERAL ELECTRIC COMPANY , ERLAT, Ahmet, Gun , BREITUNG, Eric, Michael , HELLER, Christian Maria, Anton
IPC: C23C16/455 , C23C16/54
CPC classification number: C23C16/45551 , C23C16/45514 , C23C16/545
Abstract: Embodiments of the invention include a roll-to-roll atomic layer deposition (ALD) device. The device includes mechanisms to enable relative movement between a substrate to be deposited upon and various chambers containing ALD precursor gases.
Abstract translation: 本发明的实施例包括卷对卷原子层沉积（ALD）装置。 该装置包括使得要沉积的基底和含有ALD前体气体的各种室之间的相对运动的机构。
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8.发明申请SYSTEMS AND METHODS FOR DEPOSITION OF GRADED MATERIALS ON CONTINUOUSLY FED OBJECTS 审中-公开分级材料对连续FED物体沉积的系统和方法
公开(公告)号：WO2007117294A2
公开(公告)日：2007-10-18
申请号：PCT/US2006/047919
申请日：2006-12-14
Applicant: GENERAL ELECTRIC COMPANY , KIM, Tae, Won , DUGGAL, Anil, Raj , MCCONNELEE, Paul, Alan , RUMSEY, Michael, Anthony , SCHAEPKENS, Marc , WIRTH, Reinhold, Franz , YAN, Min , ERLAT, Ahmet, Gun , FEIST, Thomas, Paul
Inventor： KIM, Tae, Won , DUGGAL, Anil, Raj , MCCONNELEE, Paul, Alan , RUMSEY, Michael, Anthony , SCHAEPKENS, Marc , WIRTH, Reinhold, Franz , YAN, Min , ERLAT, Ahmet, Gun , FEIST, Thomas, Paul
CPC classification number: C23C16/45591 , C23C16/30 , C23C16/545 , H01J37/3277 , H01J2237/3325 , H01L51/5253 , H01L51/56 , H01L2251/5338 , H01L2251/5346
Abstract: Embodiments of the invention include a deposition machine that allows for continuous deposition of an object or substrate with a coating having a graded composition. The deposition machine includes a deposition chamber separated into a plurality of chamber areas by a baffle having an opening. The opening allows for migration of deposition material from one chamber area to another, allowing for a graded composition coating to be deposited on the object or substrate. Other embodiments include a system for forming an electronic device and a system and method for forming a graded composition on an object.
Abstract translation: 本发明的实施例包括一种沉积机器，其允许用具有渐变组成的涂层连续沉积物体或基底。 沉积机包括通过具有开口的挡板分离成多个室区域的沉积室。 该开口允许沉积材料从一个室区域迁移到另一个室区域，允许将渐变的组合物涂层沉积在物体或衬底上。 其他实施例包括用于形成电子装置的系统和用于在物体上形成分级组合物的系统和方法。
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公开(公告)号：WO2011014307A1
公开(公告)日：2011-02-03
申请号：PCT/US2010/038523
申请日：2010-06-14
Applicant: GENERAL ELECTRIC COMPANY , RAKUFF, Stefan , FARQUHAR, Donald, Seton , HELLER, Christian, Maria Anton , ERLAT, Ahmet, Gun
Inventor： RAKUFF, Stefan , FARQUHAR, Donald, Seton , HELLER, Christian, Maria Anton , ERLAT, Ahmet, Gun
IPC: H01L51/52
CPC classification number: H01L51/5268 , H01L51/5246 , H01L51/5259
Abstract: Organic light emitting devices include a transparent substrate, a first transparent electrode disposed on the transparent substrate, a second electrode, an electroluminescent layer sandwiched between the electrodes, and a getter layer disposed on a light emitting surface of the substrate opposite the first transparent electrode, and comprising a metal selected from beryllium, magnesium, calcium, strontium, barium, radium and titanium.
Abstract translation: 有机发光器件包括透明衬底，设置在透明衬底上的第一透明电极，第二电极，夹在电极之间的电致发光层，以及设置在与第一透明电极相对的衬底的发光表面上的吸气剂层， 并且包含选自铍，镁，钙，锶，钡，镭和钛的金属。
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公开(公告)号：WO2007117294A3
公开(公告)日：2008-01-10
申请号：PCT/US2006047919
申请日：2006-12-14
Applicant: GEN ELECTRIC , KIM TAE WON , DUGGAL ANIL RAJ , MCCONNELEE PAUL ALAN , RUMSEY MICHAEL ANTHONY , SCHAEPKENS MARC , WIRTH REINHOLD FRANZ , YAN MIN , ERLAT AHMET GUN , FEIST THOMAS PAUL
Inventor： KIM TAE WON , DUGGAL ANIL RAJ , MCCONNELEE PAUL ALAN , RUMSEY MICHAEL ANTHONY , SCHAEPKENS MARC , WIRTH REINHOLD FRANZ , YAN MIN , ERLAT AHMET GUN , FEIST THOMAS PAUL
CPC classification number: C23C16/45591 , C23C16/30 , C23C16/545 , H01J37/3277 , H01J2237/3325 , H01L51/5253 , H01L51/56 , H01L2251/5338 , H01L2251/5346
Abstract: Embodiments of the invention include a deposition machine that allows for continuous deposition of an object or substrate with a coating having a graded composition. The deposition machine includes a deposition chamber separated into a plurality of chamber areas by a baffle having an opening. The opening allows for migration of deposition material from one chamber area to another, allowing for a graded composition coating to be deposited on the object or substrate. Other embodiments include a system for forming an electronic device and a system and method for forming a graded composition on an object.
Abstract translation: 本发明的实施例包括一种沉积机，其允许用具有渐变组成的涂层连续沉积物体或基底。 沉积机包括通过具有开口的挡板分离成多个室区域的沉积室。 开口允许沉积材料从一个室区域迁移到另一个室区域，允许将渐变的组合物涂层沉积在物体或衬底上。 其他实施例包括用于形成电子装置的系统和用于在物体上形成渐变组合物的系统和方法。
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