Abstract:
The objects of the present invention are to provide pattern forming materials capable of effectively suppressing sensitivity drop of photosensitive layers as well as capable of forming highly fine and precise patterns, pattern forming apparatuses equipped with the pattern forming materials, and pattern forming processes utilizing the pattern forming materials. In order to attain the objects, a pattern forming material is provided which comprises a support, and a photosensitive layer on the support, wherein the photosensitive layer comprises a polymerization inhibitor, a binder, a polymerizable compound, and a photopolymerization initiator, the photosensitive layer is exposed by means of a laser beam and developed by means of a developer to form a pattern, and the minimum energy of the laser beam is 0.1 mJ/cm2 to 10 mJ/cm2, which is required to yield substantially the same thickness of photosensitive layer subsequent to the developing as the thickness of the photosensitive layer prior to the exposing.
Abstract translation:本发明的目的是提供能够有效抑制感光层的灵敏度下降以及能够形成高精度和精确图案的图案形成材料,配备有图案形成材料的图案形成装置和利用图案的图案形成工艺 成型材料。 为了达到上述目的,提供了一种图案形成材料,其包括载体和载体上的感光层,其中感光层包含聚合抑制剂,粘合剂,可聚合化合物和光聚合引发剂,感光层 通过激光束曝光并通过显影剂显影以形成图案,并且激光束的最小能量为0.1mJ / cm 2至10mJ / cm 2,这是产生基本上相同厚度的感光体所必需的 在显影之前的感光层的厚度在曝光之前。
Abstract:
A spindle control system for a numerical controller capable of independently controlling a plurality of spindles through a plurality of paths. Coupling relations of paths (11 to 14) and spindles (61 to 65) are defined in a region (3), the contents in the region (3) are changed depending on a working program, and the spindles (61 to 65) to be controlled of the paths (11 to 14) are switched to carry out the working efficiently.
Abstract:
The object of the present invention is to provide pattern forming processes that may properly suppress image distortion on pattern forming materials, and may efficiently form highly fine and precise patterns such as wiring patterns. In order to attain the object, a pattern forming process according to the present invention is provided that comprises modulating a laser beam irradiated from a laser source, compensating the modulated laser beam, and exposing a photosensitive layer in a pattern forming material by means of the modulated and compensated laser beam, wherein the pattern forming material comprises a support and the photosensitive layer, the photosensitive layer comprises a polymerization inhibitor, a binder, a polymerizable compound, and a photopolymerization initiator, the modulating is performed by a laser modulator which comprises plural imaging portions each capable of receiving the laser beam and outputting the modulated laser beam, and the compensating is performed by transmitting the modulated laser beam through plural microlenses each having a non-spherical surface.
Abstract:
The present invention provides a method for producing an internal cell structure without using a photo-mask by alleviating variations in resolution and nonuniformity of density of a pattern formed on an exposed surface of a photosensitive layer; a fine internal cell structure produced by the aforesaid method; and a display device using the internal cell structure. The method for producing an internal cell structure includes exposing a photosensitive layer, using an exposure head by designating pixel parts to be used for N multiple exposure, controlling the pixel parts such that only the designated pixel parts are involved in the exposure, and making the exposure head relatively move toward the scanning direction; and developing the exposed photosensitive layer, wherein the exposure head is arranged such that the column-wise direction of the pixel parts has a setting angle of inclination relative to the scanning direction of the exposure head.
Abstract:
A novel liquid crystal display device is disclosed. The liquid crystal display device comprises a first substrate, a second substrate, liquid crystal held between the first substrate and the second substrate, patterned layers divided into fine areas, disposed on the first substrate, comprising at least a patterned color filter layer and a patterned first optically anisotropic layer laminated in the direction of the normal line of the substrate, and a barrier wall disposed at a boundary portion of the adjacent fine areas of the patterned layers.
Abstract:
A position correction system in a machine tool having a plurality of machining positions of a work. A position correction quantity corresponding to each machining position is stored in a position correction register (81) of a control block (80). Pre-processing operation means (72) calculates distribution data (X1, Z1) from a machining program (71). A position correction quantity (ΔX1, ΔZ1) is added to the distribution data (X1, Z1) by an adder (82), and a position instruction of a machining head corresponding to a machining position is outputted. Receiving this position instruction, interpolation means (83) executes pulse interpolation and outputs an output pulse. Such a control block (80) is attempted for each machining head (90, 100). In this manner, the error between the work and the machining head can be corrected for all the machining positions and accurate machining can be made.
Abstract:
A numerical controller which controls multiple spindles through multiple channels. The numerical controller includes a channel bus (1) having a plurality of slots; a plurality of channels (10, 20, 30) connected to the channel bus (1) to read, decode and execute numerical control instructions of a group of axes; and axis control modules (3, 4) for controlling a plurality of servomotors. These channels (10, 20, 30) share the processing, commonly utilize the external equipment, and constitute a more flexible numerical control system.
Abstract:
A numerical controller in which a servo motor is used selectively for position control or speed control. A distribution processing unit (3) forms a position instruction signal based on a part program (1) decoded by a decode processing unit (2). A mode control processing and speed instruction unit (41) or PMC (5) forms a mode signal and a speed instruction signal. A servo control processing unit (71) drives a servo motor (9) based on a mode signal, position instruction signal and speed instruction signal that are input through an axis control processing unit (61).