公开(公告)号：WO2006015142A2

公开(公告)日：2006-02-09

申请号：PCT/US2005/026835

申请日：2005-07-28

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHUANG, Yung-Ho ,  ARMSTRONG, Joseph, J. ,  SHAFER, David, R.

Inventor： CHUANG, Yung-Ho ,  ARMSTRONG, Joseph, J. ,  SHAFER, David, R.

IPC: G02B1/00 ,  G02B5/20 ,  F21V9/06

CPC classification number: G03F7/70225 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/02 ,  G03F7/70341

Abstract: A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective comprises a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. The objective may provide, in certain instances, a spectral bandwidth up to approximately 193 to 266 manometers and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may comprise more than one lens and may be formed of a material different from at least one other lens in the objective.

Abstract translation: 提供了用于成像样品的相对较高的光谱带宽目标和用于成像样品的方法。 该物镜包括透镜组，该透镜组具有被配置为接收光能并形成中间图像的至少一个聚焦透镜，被定向为接收中间图像并提供中间光能的至少一个场透镜，以及定位成接收中间图像 光能并将光能施加到样品上。 在某些情况下，该目标可以提供高达约193至266压力计的光谱带宽，并且可以提供超过0.9的数值孔径。 元件的直径小于100毫米，可以安装在标准显微镜内。 场镜可以包括多于一个透镜，并且可以由与物镜中的至少一个其他透镜不同的材料形成。

公开(公告)号：WO2005026782A2

公开(公告)日：2005-03-24

申请号：PCT/US2004021691

申请日：2004-07-06

Applicant: KLA TENCOR TECH CORP ,  CHUANG YUNG-HO ,  ARMSTRONG JOSEPH J ,  SHAFER DAVID R

Inventor： CHUANG YUNG-HO ,  ARMSTRONG JOSEPH J ,  SHAFER DAVID R

IPC: G01N21/88 ,  G01N21/95 ,  G02B20060101 ,  G02B5/00 ,  G02B17/00 ,  G02B17/08 ,  G02B21/02 ,  G03F7/20 ,  G02B

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G02B5/001 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/02 ,  G03F7/70225 ,  G03F7/70341

Abstract: A system for use with a reduced size catadioptric objective is disclosed. The system including the reduced size objective includes various subsystems to allow enhanced imaging, the subsystems including illumination, imaging, autofocus, positioning, sensor, data acquisition, and data analysis. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and elements of the objective are less than 100 mm in diameter. The objective comprises a focusing lens group and at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement. The design imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90 to a specimen for imaging purposes, and the design may be employed in various environments.

Abstract translation: 公开了一种用于减小尺寸反射折射率物镜的系统。 包括缩小尺寸物镜的系统包括允许增强成像的各种子系统，子系统包括照明，成像，自动对焦，定位，传感器，数据采集和数据分析。 该目的可以通过红外光范围具有在约190纳米范围内的波长的光能，并且物镜的元件的直径小于100mm。 该目的包括聚焦透镜组和至少一个定位成从聚焦透镜组接收聚焦光能并提供中间光能的场透镜。 目的还包括一个Mangin镜面布置。 该设计为成像目的赋予数值孔径超过0.65并且高达约0.90的受控光能，并且该设计可用于各种环境中。

公开(公告)号：WO2010148293A3

公开(公告)日：2011-03-31

申请号：PCT/US2010039150

申请日：2010-06-18

Applicant: KLA TENCOR CORP ,  CHUANG YUNG-HO ,  SOLARZ RICHARD W ,  SHAFER DAVID R ,  TSAI BIN-MING BENJAMIN ,  BROWN DAVID L

Inventor： CHUANG YUNG-HO ,  SOLARZ RICHARD W ,  SHAFER DAVID R ,  TSAI BIN-MING BENJAMIN ,  BROWN DAVID L

IPC: G01N21/956 ,  G01B11/30 ,  G01N21/33 ,  H01L21/66 ,  H05K13/08

CPC classification number: G01N21/95 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/068 ,  G03F1/84 ,  G03F7/70616 ,  H05G2/008

Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100X within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.

Abstract translation: 对EUV图案化掩模，空白掩模和由EUV图案化掩模生成的图案化晶片的检查需要高倍率和在图像平面上的大视场。 EUV检查系统可以包括指向检查表面的光源，用于检测从被检查表面偏转的光的检测器以及用于将来自被检查表面的光引导到检测器的光学配置。 特别地，检测器可以包括多个传感器模块。 另外，光学配置可以包括在小于5米长的光路内提供至少100倍的倍率的多个反射镜。 在一个实施例中，光路大约2-3米长。

公开(公告)号：WO2006015142A3

公开(公告)日：2006-12-14

申请号：PCT/US2005026835

申请日：2005-07-28

Applicant: KLA TENCOR TECH CORP ,  CHUANG YUNG-HO ,  ARMSTRONG JOSEPH J ,  SHAFER DAVID R

Inventor： CHUANG YUNG-HO ,  ARMSTRONG JOSEPH J ,  SHAFER DAVID R

IPC: G02B5/08 ,  G02B17/08 ,  G02B21/02 ,  G03F7/20

CPC classification number: G03F7/70225 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/02 ,  G03F7/70341

Abstract: A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective comprises a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. The objective may provide, in certain instances, a spectral bandwidth up to approximately 193 to 266 manometers and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may comprise more than one lens and may be formed of a material different from at least one other lens in the objective.

Abstract translation: 提供了用于成像试样的相对高的光谱带宽目标和用于成像试样的方法。 该目的包括具有至少一个聚焦透镜的透镜组，该至少一个聚焦透镜被配置为接收光能并形成中间图像，至少一个定向成接收中间图像并提供中间光能的场透镜，以及定位成接纳中间图像的中间图像 光能并向样品施加光能。 在某些情况下，目标可以提供高达约193至266个压力计的光谱带宽，并且可以提供超过0.9的数值孔径。 元素的直径小于100毫米，并且可以适合标准显微镜。 场透镜可以包括多于一个透镜，并且可以由与物镜中的至少一个其它透镜不同的材料形成。

公开(公告)号：WO2003027747A1

公开(公告)日：2003-04-03

申请号：PCT/EP2002/010281

申请日：2002-09-13

Applicant: CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG ,  ULRICH, Wilhelm ,  SHAFER, David, R. ,  EPPLE, Alexander ,  BEIERL, Helmut ,  DODOC, Aurelian

Inventor： ULRICH, Wilhelm ,  SHAFER, David, R. ,  EPPLE, Alexander ,  BEIERL, Helmut ,  DODOC, Aurelian

IPC: G02B17/08

CPC classification number: G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275

Abstract: A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane, preferably while creating a real intermediate image, including a catadioptric first lens section having a concave mirror and a physical beamsplitter having a beamsplitting surface, as well as a second lens section that is preferably refractive and follows the beamsplitter, between its object plane and image plane. Positive refractive power is arranged in an optical near-field of the object plane, which is arranged at a working distance from the first optical surface of the projection lens. The beamsplitter lies in the vicinity of low marginal-ray heights, which allows configuring projection lenses that are fully corrected for longitudinal chromatic aberration, while employing small quantities of materials, particularly those materials needed for fabricating their beamsplitters.

Abstract translation: 一种反折射投射透镜，用于将布置在物平面中的图案成像到图像平面上，优选地在创建实际中间图像的同时，包括具有凹面镜的反折射第一透镜部分和具有分束表面的物理分束器，以及第二 透镜部分优选地折射并且在分束器之间，在其物平面和图像平面之间。 物体平面的光学近场被布置在距离投影透镜的第一光学表面的工作距离处。 分束器位于低边缘射线高度附近，这允许配置对纵向色差完全校正的投影透镜，同时使用少量材料，特别是制造其分光器所需的材料。

公开(公告)号：WO9949346A9

公开(公告)日：2000-07-06

申请号：PCT/US9906387

申请日：1999-03-23

Applicant: KLA TENCOR CORP ,  CHUANG ALEX ,  SHAFER DAVID R ,  TSAI BIN MING B ,  ARMSTRONG JOSEPH

Inventor： CHUANG ALEX ,  SHAFER DAVID R ,  TSAI BIN-MING B ,  ARMSTRONG JOSEPH

IPC: G01N21/33 ,  G02B13/14 ,  G02B17/08 ,  G02B21/16 ,  G03C5/16 ,  G03F1/00 ,  G03F1/84 ,  G03F3/00 ,  G03F7/20 ,  H04N5/225 ,  G01N21/88 ,  G02B21/10

CPC classification number: G03F7/7065 ,  G02B13/12 ,  G02B13/22 ,  G02B17/08 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0852 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/16 ,  G03F1/84 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70616

Abstract: A system for multiple mode imaging is disclosed herein. The system is a catadioptric system preferably having an NA greater than 0.9, highly corrected for low and high order monochromatic aberrations. This system uses unique illumination entrances and can collect reflected, diffracted, and scattered light over a range of angles. The system includes a catadioptric group, focusing optics group, and tube lens group. The varifocal tube lens group can continuously change magnifications from 20 to 200x. Imaging modes include bright-field, full sky, ring dark-field, inverted ring dark-field, directional dark-field, double dark-field, Manhattan geometry, confocal bright-field, confocal dark-field, conoscopic, etc. Illumination can enter the catadioptric optical system using an auxiliary beamsplitter or mirror, or through the catadioptric group at any angle from 0 to 85 degrees from vertical.

Abstract translation: 这里公开了一种用于多模式成像的系统。 该系统是一个反射折射系统，最好具有大于0.9的NA，对低和高阶单色像差进行高度校正。 该系统使用独特的照明入口，可以在一定角度范围内收集反射光，衍射光和散射光。 该系统包括反射折射组，聚焦光学组和管透镜组。 变焦管镜头组可以连续改变20至200倍的放大倍数。 成像模式包括明场，全天空，环形暗场，倒环暗场，定向暗场，双暗场，曼哈顿几何，共焦明场，共焦暗场，锥光等。 使用辅助分束器或反射镜进入反射折射光学系统，或通过反射折射率组从垂直0到85度之间的任何角度进入。

公开(公告)号：WO2005094304A2

公开(公告)日：2005-10-13

申请号：PCT/US2005010322

申请日：2005-03-28

Applicant: KLA TENCOR TECH CORP ,  ARMSTRONG J JOSEPH ,  CHUANG YUNG-HO ,  SHAFER DAVID R

Inventor： ARMSTRONG J JOSEPH ,  CHUANG YUNG-HO ,  SHAFER DAVID R

IPC: G02B17/02 ,  G02B17/08 ,  G02B21/02 ,  G02B21/04 ,  G02B21/33 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G02B17/023 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/02 ,  G02B21/04 ,  G02B21/33 ,  G03F7/70225

Abstract: A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The objective comprises a focusing lens group, a field lens, a Mangin mirror arrangement, and an immersion substance or liquid between the Mangin mirror arrangement and the specimen. A variable focal length optical system for use with the objective in the catadioptric inspection system is also disclosed.

Abstract translation: 公开了一种使用反射折射物镜和浸没物质的缩小尺寸反射折射检查系统。 该目的可以通过红外光范围具有在约190纳米范围内的波长的光能，并且可以提供超过0.9的数值孔径。 元素的直径小于100毫米，并且可以适合标准显微镜。 该目的包括聚焦透镜组，场透镜，Mangin镜布置以及Mangin镜布置和样品之间的浸没物质或液体。 还公开了用于反射折射检查系统中的目的的可变焦距光学系统。

公开(公告)号：WO2005022204A3

公开(公告)日：2005-03-10

申请号：PCT/US2004/026782

申请日：2004-08-18

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  SHAFER, David, R. ,  CHUANG, Yung-Ho ,  ARMSTRONG, J., Joseph

Inventor： SHAFER, David, R. ,  CHUANG, Yung-Ho ,  ARMSTRONG, J., Joseph

IPC: G02B17/00

Abstract: A system and method for inspection is disclosed. The design includes an objective employed for use with light energy having a wavelength in various ranges, including approximately 266 to 1000nm, 157nm through infrared, and other ranges. The objective comprises a focusing lens group (311) comprising at least one focusing lens (304) configured to receive light, a field lens (305) oriented to receive focused light energy from said focusing lens group (311) and provide intermediate light energy, and a Mangin mirror arrangement (312) positioned to receive the intermediate light energy from the field lens (305) and form controlled light energy. Each focusing lens has a reduced diameter, such as a diameter of less than approximately 100mm, and a maximum corrected field size of approximately 0.15mm. An immersion substance, such as oil, water, or silicone gel, may be employed prior to passing controlled light energy to the specimen (310) inspected.

公开(公告)号：WO2003052462A2

公开(公告)日：2003-06-26

申请号：PCT/EP2002/013887

申请日：2002-12-07

Applicant: CARL ZEISS SMT AG ,  SHAFER, David, R. ,  EPPLE, Alexander

Inventor： SHAFER, David, R. ,  EPPLE, Alexander

IPC: G02B

CPC classification number: G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275

Abstract: A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane while creating a real intermediate image, having a catadioptric first lens section having a concave mirror and a beam-deflection device, as well as a dioptric second lens section that follows the catadioptric lens section, between its object plane and image plane. The beam-deflection device has a first reflective surface for deflecting radiation coming from the object plane to the concave mirror. Positive refractive power is arranged following the first reflective surface, between the latter and the concave mirror, within an optical near-field of the object plane, within which the height of the principal ray of the outermost field point of radiation coming from the object exceeds the marginal-ray height. The intermediate image lies well ahead of a second reflective surface that is provided for the purpose of allowing arranging the object plane and image plane such that they will be parallel to one another. A lens is provided between the intermediate image and second reflective surface.

Abstract translation: 一种反射折射投影透镜，用于将布置在物平面中的图案成像到图像平面上，同时产生具有凹面镜和光束偏转装置的反射折射率第一透镜部分的实际中间图像，以及屈光度第二透镜部分， 在反射折射透镜部分之间，在其物平面和图像平面之间。 光束偏转装置具有用于将来自物平面的辐射偏转到凹面镜的第一反射表面。 在物平面的光学近场内，在第一反射表面之间，后者和凹面镜之间布置正屈光力，其中来自物体的最外面的辐射场点的主光线的高度超过 边缘射线高度。 中间图像位于第二反射表面之前，其被提供用于允许布置物平面和图像平面以使得它们彼此平行。 在中间图像和第二反射表面之间设置透镜。

公开(公告)号：WO9949346A8

公开(公告)日：2000-05-18

申请号：PCT/US9906387

申请日：1999-03-23

Applicant: KLA TENCOR CORP ,  CHUANG ALEX ,  SHAFER DAVID R ,  TSAI BIN MING B ,  ARMSTRONG JOSEPH

Inventor： CHUANG ALEX ,  SHAFER DAVID R ,  TSAI BIN-MING B ,  ARMSTRONG JOSEPH

IPC: G01N21/33 ,  G02B13/14 ,  G02B17/08 ,  G02B21/16 ,  G03C5/16 ,  G03F1/00 ,  G03F1/84 ,  G03F3/00 ,  G03F7/20 ,  H04N5/225 ,  G01N21/88 ,  G02B21/10

CPC classification number: G03F7/7065 ,  G02B13/12 ,  G02B13/22 ,  G02B17/08 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0852 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/16 ,  G03F1/84 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70616

Abstract: A system for multiple mode imaging is disclosed herein. The system is a catadioptric system preferably having an NA greater than 0.9, highly corrected for low and high order monochromatic aberrations. This system uses unique illumination entrances and can collect reflected, diffracted, and scattered light over a range of angles. The system includes a catadioptric group, focusing optics group, and tube lens group. The varifocal tube lens group can continuously change magnifications from 20 to 200x. Imaging modes include bright-field, full sky, ring dark-field, inverted ring dark-field, directional dark-field, double dark-field, Manhattan geometry, confocal bright-field, confocal dark-field, conoscopic, etc. Illumination can enter the catadioptric optical system using an auxiliary beamsplitter or mirror, or through the catadioptric group at any angle from 0 to 85 degrees from vertical.

Abstract translation: 本文公开了一种用于多模式成像的系统。 该系统是优选地具有NA大于0.9的反折射系统，对于低和高阶单色像差高度校正。 该系统使用独特的照明入口，并可在一定范围的角度收集反射，衍射和散射光。 该系统包括反射折射组，聚焦光学组和管透镜组。 变焦镜头组可以将放大倍数从20倍连续变化到200倍。 成像模式包括明场，全天，环暗场，倒环暗场，定向暗场，双暗场，曼哈顿几何，共焦光场，共焦暗场，锥视光等。照明可以 使用辅助分光镜或反射镜进入反折射光学系统，或通过反射折射组以垂直方向从0到85度的角度进入反折射光学系统。