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    PHOTOMASK INSPECTION AND VERIFICATION BY LITHOGRAPHY IMAGE RECONSTRUCTION USING IMAGING PUPIL FILTERS
    3.
    发明申请
    PHOTOMASK INSPECTION AND VERIFICATION BY LITHOGRAPHY IMAGE RECONSTRUCTION USING IMAGING PUPIL FILTERS 审中-公开
    使用成像过滤器进行光刻图像重建的光电检测和验证

    公开(公告)号：WO2008086494A3

    公开(公告)日：2008-11-20

    申请号：PCT/US2008050798

    申请日：2008-01-10

    申请人： KLA TENCOR TECH CORP ,  XIONG YALIN ,  SHI RUI-FANG

    发明人： XIONG YALIN ,  SHI RUI-FANG

    IPC分类号： G03F1/00 ,  G01N21/956

    CPC分类号： G03F1/84 ,  G01N21/95607 ,  G03F7/7065 ,  G03F7/70666

    摘要： A method and tool for generating reconstructed images that model the high NA effects of a lithography tool used to image patterns produced by a mask. Comparison of the reconstructed images with reference images characterize the mask. The method involves providing a mask reticle for inspection. Generating matrix values associated with a high NA corrective filter matrix that characterizes a high NA lithography system used to print from the mask. Illuminating the mask to produce a patterned illumination beam that is filtered with filters associated with the high NA corrective filter matrix elements to obtain a plurality of filtered beams that include raw image data that is processed to obtain a reconstructed image that is further processed and compared with reference images to obtain mask characterization information.

    摘要翻译： 一种用于产生重建图像的方法和工具，其对用于对由掩模产生的图像进行成像的光刻工具的高NA效应进行建模。 重建图像与参考图像的比较表征掩模。 该方法涉及提供掩模掩模以进行检查。 生成与用于从掩模打印的高NA光刻系统的高NA校正滤波器矩阵相关联的矩阵值。 照亮掩模以产生图案化照明光束，其用与高NA校正滤波器矩阵元素相关联的滤波器进行滤波，以获得包括原始图像数据的多个滤波光束，该原始图像数据被处理以获得进一步处理并与 参考图像以获得掩模表征信息。

    PHOTOMASK INSPECTION AND VERIFICATION BY LITHOGRAPHY IMAGE RECONSTRUCTION USING IMAGING PUPIL FILTERS
    4.
    发明申请
    PHOTOMASK INSPECTION AND VERIFICATION BY LITHOGRAPHY IMAGE RECONSTRUCTION USING IMAGING PUPIL FILTERS 审中-公开
    用成像瞳孔滤光片进行光刻图像重建的光检测和验证

    公开(公告)号：WO2008086494A2

    公开(公告)日：2008-07-17

    申请号：PCT/US2008/050798

    申请日：2008-01-10

    申请人： KLA-TENCOR TECHNOLOGIES CORPORATION ,  XIONG, Yalin ,  SHI, Rui-fang

    发明人： XIONG, Yalin ,  SHI, Rui-fang

    CPC分类号： G03F1/84 ,  G01N21/95607 ,  G03F7/7065 ,  G03F7/70666

    摘要： A method and tool for generating reconstructed images that model the high NA effects of a lithography tool used to image patterns produced by a mask. Comparison of the reconstructed images with reference images characterize the mask. The method involves providing a mask reticle for inspection. Generating matrix values associated with a high NA corrective filter matrix that characterizes a high NA lithography system used to print from the mask. Illuminating the mask to produce a patterned illumination beam that is filtered with filters associated with the high NA corrective filter matrix elements to obtain a plurality of filtered beams that include raw image data that is processed to obtain a reconstructed image that is further processed and compared with reference images to obtain mask characterization information.

    摘要翻译： 用于生成重建图像的方法和工具，所述重建图像模拟用于成像由掩模产生的图案的光刻工具的高NA效应。 重建图像与参考图像的比较表征掩模。 该方法涉及提供用于检查的掩模光罩。 生成与高NA校正滤波器矩阵相关联的矩阵值，其表征用于从掩模打印的高NA光刻系统。 照亮掩模以产生图案化照明光束，其用与高NA校正滤波器矩阵元素相关联的滤波器滤波以获得包括原始图像数据的多个滤波的光束，所述原始图像数据被处理以获得重建图像，所述重构图像被进一步处理并与 参考图像以获得掩模表征信息。

    TWO-COMPONENT SOLVENT-LESS ADHESIVE COMPOSITION
    5.
    发明申请
    TWO-COMPONENT SOLVENT-LESS ADHESIVE COMPOSITION 审中-公开

    公开(公告)号：WO2020124542A1

    公开(公告)日：2020-06-25

    申请号：PCT/CN2018/122618

    申请日：2018-12-21

    申请人： DOW GLOBAL TECHNOLOGIES LLC ,  ROHM AND HAAS COMPANY ,  SHI, Rui ,  QU, Zhaohui ,  GUO, Yinzhong

    发明人： SHI, Rui ,  QU, Zhaohui ,  GUO, Yinzhong

    IPC分类号： C08G18/10 ,  B32B7/12

    摘要： The present disclosure provides a two-component solvent-less adhesive composition. The two-component solvent-less adhesive composition contains the reaction product of (A) an isocyanate component containing the reaction product of (i) an isocyanate monomer and (ii) a first dimer acid polyester polyol; and (B) a polyol component containing (i) a second dimer acid polyester polyol and (ii) optionally, a polyol selected from a polyether polyol, a polyester polyol, and combinations thereof. The two-component solvent-less adhesive composition contains from 15 wt% to 45 wt% units derived from dimer acid, based on the total weight of the two-component solvent-less adhesive composition.

    TWO-COMPONENT SOLVENTLESS ADHESIVE COMPOSITIONS AND METHODS OF MAKING SAME
    8.
    发明申请
    TWO-COMPONENT SOLVENTLESS ADHESIVE COMPOSITIONS AND METHODS OF MAKING SAME 审中-公开
    双组分无溶剂粘合剂组合物及其制备方法

    公开(公告)号：WO2017166003A1

    公开(公告)日：2017-10-05

    申请号：PCT/CN2016/077477

    申请日：2016-03-28

    申请人： DOW GLOBAL TECHNOLOGIES LLC ,  ROHM AND HAAS COMPANY ,  QU, Zhaohui ,  SHI, Rui

    发明人： QU, Zhaohui ,  SHI, Rui

    IPC分类号： C09J175/04

    摘要： A solventless adhesive is disclosed, the adhesive comprising an isocyanate component comprising at least one isocyanate prepolymer that is the reaction product of reactants comprising at least one isocyanate, at least one polyol, and a branched alkane diol, and a polyol component comprising at least one polyol and a branched alkane diol. The branched alkane diol can comprise a single side alkyl chain, such as 3-methyl-1, 5-pentanediol, 2-methyl-1, 3-propanediol, and combinations thereof. Further, a method for forming a laminate is disclosed, the method comprising forming a solventless adhesive composition comprising a branched alkane diol, applying a layer of the adhesive composition to a surface of a film, bringing the layer into contact with a surface of another film to form a laminate, and curing the adhesive composition. Still further, a laminate formed by the method is disclosed.

    摘要翻译： 公开了一种无溶剂粘合剂，所述粘合剂包含异氰酸酯组分，所述异氰酸酯组分包含至少一种异氰酸酯预聚物，所述异氰酸酯预聚物是包含至少一种异氰酸酯，至少一种多元醇和支化链烷二醇的反应物的反应产物， 和包含至少一种多元醇和支链烷二醇的多元醇组分。 支化烷烃二醇可以包含单一侧烷基链，例如3-甲基-1,5-戊二醇，2-甲基-1,3-丙二醇及其组合。 此外，公开了一种用于形成层压体的方法，该方法包括形成包含支链烷二醇的无溶剂粘合剂组合物，将粘合剂组合物层施加到膜的表面，使该层与另一膜的表面接触 以形成层压体，并且使粘合剂组合物固化。 更进一步地，公开了通过该方法形成的层压体。