公开(公告)号：WO2013041323A1

公开(公告)日：2013-03-28

申请号：PCT/EP2012/066449

申请日：2012-08-23

Applicant: ASML Netherlands B.V. ,  VAN SCHOOT, Jan ,  KREUWEL, Hermanus ,  BANINE, Vadim ,  YAKUNIN, Andrei ,  MOORS, Roel ,  FRIJNS, Olav ,  SWINKELS, Gerardus ,  VANDERHALLEN, Ivo ,  STAMM, Uwe

Inventor： VAN SCHOOT, Jan ,  KREUWEL, Hermanus ,  BANINE, Vadim ,  YAKUNIN, Andrei ,  MOORS, Roel ,  FRIJNS, Olav ,  SWINKELS, Gerardus ,  VANDERHALLEN, Ivo ,  STAMM, Uwe

IPC: H05G2/00 ,  G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

Abstract translation: 一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。 预脉冲激光辐射组件在等离子体形成位置处的燃料流处引导第一激光辐射束（100）以产生经修改的燃料靶（106）。 主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。 收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。 激光辐射的第一束基本上沿着光轴被引向燃料流。

公开(公告)号：WO2011036248A1

公开(公告)日：2011-03-31

申请号：PCT/EP2010/064140

申请日：2010-09-24

Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  BANINE, Vadim ,  SWINKELS, Gerardus ,  PEKELDER, Sven ,  LABETSKI, Dzmitry ,  STAMM, Uwe ,  CYMER, INC. ,  PARTLO, William N.

Inventor： LOOPSTRA, Erik ,  BANINE, Vadim ,  SWINKELS, Gerardus ,  PEKELDER, Sven ,  LABETSKI, Dzmitry ,  STAMM, Uwe ,  PARTLO, William N.

IPC: G03F7/20 ,  C01B3/50 ,  G21K1/06

CPC classification number: G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

Abstract: An EUV lithographic apparatus (100) comprises a source collector apparatus (SO) in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma (210) emitting the radiation. The source collector apparatus (SO) includes a chamber (310) in fluid communication with a guide way (320) external to the chamber (310). A pump (BPS) for circulating buffer gas is part of the guide way (320), and provides a closed loop buffer gas flow (222). The gas flowing through the guide way (302) traverses a gas decomposer (TD1) wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path (222).

Abstract translation: EUV光刻设备（100）包括源极收集器（SO），其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体（210）。 源收集器装置（SO）包括与室（310）外部的引导方式（320）流体连通的室（310）。 用于循环缓冲气体的泵（BPS）是引导方式（320）的一部分，并且提供闭环缓冲气体流（222）。 流过引导方式（302）的气体穿过其中分解燃料和缓冲气体材料的化合物的气体分解器（TD1），使得分解的缓冲气体材料可以反馈回闭环流动路径（222）。

公开(公告)号：WO2012031841A1

公开(公告)日：2012-03-15

申请号：PCT/EP2011/063443

申请日：2011-08-04

Applicant: ASML NETHERLANDS B.V. ,  LOOPSTRA, Erik ,  SWINKELS, Gerardus ,  BUURMAN, Erik ,  STAMM, Uwe

Inventor： LOOPSTRA, Erik ,  SWINKELS, Gerardus ,  BUURMAN, Erik ,  STAMM, Uwe

IPC: H01S3/00 ,  G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  B23K26/0643 ,  G03F7/70025 ,  G03F7/70191 ,  G03F7/7055 ,  H01S3/0071 ,  H01S3/2308 ,  H05G2/001 ,  H05G2/008

Abstract: An EUV radiation generation apparatus includes a laser (300) configured to generate pulses (205) of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector (305) and a radially positioned reflector (306). The rotatably mounted reflector and the laser are synchronized such that a reflective surface (307,308) of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location (313) and cause a radiation emitting plasma to be generated via vaporization of a droplet (313a) of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation (316) reflected from the plasma formation location.

Abstract translation: EUV辐射发生装置包括被配置为产生激光辐射的脉冲（205）的激光器（300）和包括可旋转地安装的反射器（305）和径向定位的反射器（306）的光学隔离装置。 可旋转地安装的反射器和激光器被同步，使得当光隔离装置接收到激光辐射的脉冲以允许激光辐射的脉冲时，可旋转地安装的反射器的反射表面（307,308）与径向定位的反射器光学连通 传递到等离子体形成位置（313）并且通过燃料材料的液滴（313a）的蒸发而产生辐射发射等离子体。 可旋转地安装的反射器和激光器进一步同步，使得当光隔离设备接收从等离子体形成位置反射的辐射（316）时，可旋转安装的反射器的反射表面至少部分地与径向定位的反射器光学隔离。

公开(公告)号：WO2005004555A1

公开(公告)日：2005-01-13

申请号：PCT/EP2003/009842

申请日：2003-06-27

Applicant: COMMISSARIAT ENERGIE ATOMIQUE ,  SCHMIDT, Martin ,  LEBERT, Rainer-Helmut ,  STAMM, Uwe

Inventor： SCHMIDT, Martin ,  LEBERT, Rainer-Helmut ,  STAMM, Uwe

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003 ,  H05G2/005

Abstract: The device for generating extreme ultraviolet (EUV) or soft X-ray radiation comprises a laser source (12) for producing a laser radiation (11) which is focused to intensities beyond 10 6 W/cm² onto a target to produce a plasma and electrodes mounted on an electrically insulating block (6) and located around the path of the plasma produced by the laser source (12). The electrodes are combined with a device for producing a rapid electric discharge in the plasma with a characteristic time constant which is less than the time constant of the laser produced plasma expansion time.

Abstract translation: 用于产生极紫外（EUV）或软X射线辐射的装置包括用于产生激光辐射（11）的激光源（12），该激光辐射被聚焦到靶标上超过10 6 W / cm 2的强度以产生等离子体 以及安装在电绝缘块（6）上并位于由激光源（12）产生的等离子体的路径周围的电极。 电极与用于在等离子体中产生快速放电的装置组合，其特征时间常数小于激光产生的等离子体膨胀时间的时间常数。