公开(公告)号：WO2010118146A1

公开(公告)日：2010-10-14

申请号：PCT/US2010/030258

申请日：2010-04-07

Applicant: CYMER, INC. ,  FOMENKOV, Igor, V. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  PAXTON, Jason, A. ,  KIM, Nam-Hyong ,  HOFFMAN, Jerzy, R.

Inventor： FOMENKOV, Igor, V. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  PAXTON, Jason, A. ,  KIM, Nam-Hyong ,  HOFFMAN, Jerzy, R.

IPC: H01S3/091

CPC classification number: H01S3/2232 ,  G03F7/70033 ,  H01S3/0014 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/086 ,  H01S3/2308 ,  H05G2/008

Abstract: A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.

Abstract translation: 用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组，从而对准所述光学部件组的一个或多个光学部件。

公开(公告)号：WO2010117861A1

公开(公告)日：2010-10-14

申请号：PCT/US2010/029447

申请日：2010-03-31

Applicant: CYMER, INC. ,  CHROBAK, Christopher, P. ,  PARTLO, William N. ,  FOMENKOV, Igor, V. ,  ERSHOV, Alexander, I. ,  CROUCH, James, H.

Inventor： CHROBAK, Christopher, P. ,  PARTLO, William N. ,  FOMENKOV, Igor, V. ,  ERSHOV, Alexander, I. ,  CROUCH, James, H.

IPC: G01J3/10

CPC classification number: H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

Abstract: An extreme ultraviolet light system includes a drive laser system, an extreme ultraviolet light chamber including an extreme ultraviolet light collector and a target material dispenser including a target material outlet capable of outputting a plurality of portions of target material along a target material path, wherein the target material outlet is adjustable. The extreme ultraviolet light system further includes a drive laser steering device, a detection system including at least one detector directed to detect a reflection of the drive laser reflected from the first one of the plurality of portions of target material and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of a first one of the plurality of portions of target material from a first light reflected from the first target material.

Abstract translation: 一种极紫外光系统包括驱动激光系统，包括极紫外光收集器的极紫外光室和包括能够沿目标材料路径输出多个目标材料部分的靶材料出口的目标材料分配器，其中， 目标材料出口可调。 所述极紫外光系统还包括驱动激光转向装置，所述检测系统包括至少一个检测器，所述检测器被引导以检测从所述目标材料的所述多个部分中的第一部分反射的所述驱动激光的反射，以及耦合到所述目标的控制器 材料分配器，检测器系统和驱动激光转向装置。 控制器包括用于从第一目标材料反射的第一光检测目标材料的多个部分中的第一部分的位置的逻辑。

公开(公告)号：WO2010117859A1

公开(公告)日：2010-10-14

申请号：PCT/US2010/029441

申请日：2010-03-31

Applicant: CYMER, INC. ,  PARTLO, William N. ,  FOMENKOV, Igor V.

Inventor： PARTLO, William N. ,  FOMENKOV, Igor V.

IPC: G01J1/42

CPC classification number: H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

Abstract: A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.

Abstract translation: 一种用于极紫外光室的系统和方法，包括收集器反射镜，耦合到收集器反射镜的后侧的冷却系统，其用于冷却收集反射镜的反射表面和耦合到极紫外光室的缓冲气体源。

公开(公告)号：WO2009032055A1

公开(公告)日：2009-03-12

申请号：PCT/US2008/009755

申请日：2008-08-15

Applicant: CYMER, INC. ,  BYKANOV, Alexander, N. ,  BRANDT, David, C. ,  FOMENKOV, Igor, C. ,  PARTLO, William, N.

Inventor： BYKANOV, Alexander, N. ,  BRANDT, David, C. ,  FOMENKOV, Igor, C. ,  PARTLO, William, N.

IPC: G21G4/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70908

Abstract: A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.

Abstract translation: 气体流量管理系统可以包括至少部分地围绕第一和第二相应空间的第一和第二封闭壁; 在第一空间中产生等离子体的系统，等离子体发射极紫外光; 限制从第一空间流到第二空间的细长体，所述主体至少部分地围绕通道并且具有允许EUV光从第一空间进入通道的第一开口端，以及允许EUV光从第二空间退出的第二开口端 通道进入第二空间，身体形状以建立相对于第一和第二端具有减小的横截面面积的位置; 以及离开孔的气流，所述孔定位成在主体的第一端和具有减小的横截面积的位置之间的位置处将气体引入通道。

公开(公告)号：WO2007149282A2

公开(公告)日：2007-12-27

申请号：PCT/US2007/013875

申请日：2007-06-11

Applicant: CYMER, INC. ,  FOMENKOV, Igor, V. ,  PARTLO, William, N. ,  REILEY, Daniel, J. ,  HOWEY, James, K. ,  AGULIAR, Stanley, C.

Inventor： FOMENKOV, Igor, V. ,  PARTLO, William, N. ,  REILEY, Daniel, J. ,  HOWEY, James, K. ,  AGULIAR, Stanley, C.

IPC: H01S3/10

CPC classification number: H01S3/225 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08009 ,  H01S3/137 ,  H01S3/2256

Abstract: A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.

Abstract translation: 公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。 该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。 主动波前补偿机构可以包括气动驱动机构。

公开(公告)号：WO2007146329A2

公开(公告)日：2007-12-21

申请号：PCT/US2007013862

申请日：2007-06-11

Applicant: CYMER INC ,  ERSHOV ALEXANDER I ,  BYKANOV ALEXANDER N ,  HOFFMAN JERZY R ,  FOMENKOV IGOR V ,  PARTLO WILLIAM N

Inventor： ERSHOV ALEXANDER I ,  BYKANOV ALEXANDER N ,  HOFFMAN JERZY R ,  FOMENKOV IGOR V ,  PARTLO WILLIAM N

IPC: H01S3/00

CPC classification number: H01S3/2316 ,  H01S3/0057 ,  H01S3/11 ,  H01S3/2232 ,  H01S3/225 ,  H05G1/54 ,  H05G2/008

Abstract: A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (E s, 1 ) and a small signal gain (g o , 1 ); and the second amplifier may have a gain medium characterized by a saturation energy (E s, 2 ) and a small signal gain (g o , 2 ), with (g o , 1 ) > (g o , 2 ) and (E S , 2 ) > (E s,

Abstract translation: 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源极，第一放大器可以具有特征在于饱和能量（E S，S 1）和小信号增益（g 1，...， ）; 并且第二放大器可以具有特征在于饱和能量（E S，S 2）和小信号增益（g 0，S 2，N 2）的增益介质 （g ，＆lt; 2＆gt;）和（E

公开(公告)号：WO2007145792A3

公开(公告)日：2007-12-21

申请号：PCT/US2007/012393

申请日：2007-05-22

Applicant: CYMER, INC. ,  STEIGER, Thomas, D. ,  PARTLO, William, N.

Inventor： STEIGER, Thomas, D. ,  PARTLO, William, N.

IPC: H01S3/20

Abstract: A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.

公开(公告)号：WO2007005512A3

公开(公告)日：2007-11-22

申请号：PCT/US2006025350

申请日：2006-06-28

Applicant: CYMER INC ,  CYBULSKI RAYMOND F ,  BERGSTEDT ROBERT A ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  WANG GON

Inventor： CYBULSKI RAYMOND F ,  BERGSTEDT ROBERT A ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  WANG GON

IPC: H01S3/22 ,  H01S3/03

CPC classification number: H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/1055 ,  H01S3/225

Abstract: A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.

Abstract translation: 公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。 色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。 壳体可以包含分散中心波长选择元件和扩束器。 壳体定位元件可以包括位置锁定机构。

公开(公告)号：WO2006020080A3

公开(公告)日：2007-04-05

申请号：PCT/US2005025232

申请日：2005-07-15

Applicant: CYMER INC ,  ERSHOV ALEXANDER I ,  MARX WILLIAM F ,  BOWERING NORBERT R ,  HANSSON BJORN A M ,  KHODYKIN OLEH ,  FOMENKOV IGOR V ,  PARTLO WILLIAM N

Inventor： ERSHOV ALEXANDER I ,  MARX WILLIAM F ,  BOWERING NORBERT R ,  HANSSON BJORN A M ,  KHODYKIN OLEH ,  FOMENKOV IGOR V ,  PARTLO WILLIAM N

IPC: C25F1/00 ,  G03F7/20 ,  G21K5/10 ,  H01J35/20

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract translation: 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

公开(公告)号：WO2007005512A2

公开(公告)日：2007-01-11

申请号：PCT/US2006/025350

申请日：2006-06-28

Applicant: CYMER, INC. ,  CYBULSKI, Raymond, F. ,  BERGSTEDT, Robert, A. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  WANG, Gon

Inventor： CYBULSKI, Raymond, F. ,  BERGSTEDT, Robert, A. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  WANG, Gon

IPC: H01S3/22 ,  H01S3/03

CPC classification number: H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/1055 ,  H01S3/225

Abstract: A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.

Abstract translation: 公开了一种线变窄的气体放电激光系统及其操作方法，其可以包括色散中心波长选择元件; 包括多个折射元件的扩束器; 折射元件定位机构，所述折射元件定位机构定位所述折射元件中的至少一个，以改变所述色散中心波长选择元件上的激光束的入射角; 色散中心波长选择元件和扩束器中的每一个彼此对齐并且与至少包含色散中心波长选择元件的外壳对齐; 壳体定位机构，其相对于气体放电激光系统的光轴定位壳体。 色散元件可以包括光栅，并且扩束器可以包括多个棱镜。 外壳可以包含色散中心波长选择元件和扩束器。 外壳定位元件可以包括位置锁定机构。