公开(公告)号：WO2009019316A2

公开(公告)日：2009-02-12

申请号：PCT/EP2008/060486

申请日：2008-08-08

Applicant: INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZW ,  KATHOLIEKE UNIVERSITEIT LEUVEN, K.U. LEUVEN R & D ,  STOFFELS, Steve ,  WITVROUW, Ann

Inventor： STOFFELS, Steve ,  WITVROUW, Ann

IPC: B81C1/00

CPC classification number: B81C1/00063 ,  B81B2201/0271 ,  B81C2203/0145 ,  H03H3/0078 ,  H03H9/1057

Abstract: A method for forming narrow gaps, for ex ample gaps narrower than 400nm, e.g. less than 200nm or 100 nm, between elements of a MEMS structure is described, as well as a method for forming micromachined or MEMS structures comprising narrow gaps. The method may for example be used for forming high frequency micromechanical resonators comprising narrow transduction gaps.

Abstract translation: 形成窄间隙的方法，例如窄于400nm的间隙，例如 描述了MEMS结构的元件之间小于200nm或100nm，以及用于形成包括窄间隙的微加工或MEMS结构的方法。 该方法可以例如用于形成包括窄换能间隙的高频微机械谐振器。

公开(公告)号：WO2009019316A3

公开(公告)日：2009-05-22

申请号：PCT/EP2008060486

申请日：2008-08-08

Applicant: IMEC INTER UNI MICRO ELECTR ,  UNIV LEUVEN KATH ,  STOFFELS STEVE ,  WITVROUW ANN

Inventor： STOFFELS STEVE ,  WITVROUW ANN

IPC: B81C1/00 ,  H03H3/007

CPC classification number: B81C1/00063 ,  B81B2201/0271 ,  B81C2203/0145 ,  H03H3/0078 ,  H03H9/1057

Abstract: A method for forming narrow gaps, for ex ample gaps narrower than 400nm, e.g. less than 200nm or 100 nm, between elements of a MEMS structure is described, as well as a method for forming micromachined or MEMS structures comprising narrow gaps. The method may for example be used for forming high frequency micromechanical resonators comprising narrow transduction gaps.

Abstract translation: 用于形成狭窄间隙的方法，用于例如窄于400nm的间隙，例如 描述了MEMS结构的元件之间的小于200nm或100nm，以及用于形成包括窄间隙的微加工或MEMS结构的方法。 该方法可以例如用于形成包括窄换能间隙的高频微机械谐振器。