公开(公告)号：WO2012146788A1

公开(公告)日：2012-11-01

申请号：PCT/EP2012/057955

申请日：2012-05-01

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  KUIPER, Vincent Sylvester ,  SLOT, Erwin ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido ,  DE JONG, Hendrik Jan

Inventor： KUIPER, Vincent Sylvester ,  SLOT, Erwin ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido ,  DE JONG, Hendrik Jan

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

Abstract: A method of processing substrates in a lithography system unit of a lithography system, the lithography system unit comprising at least two substrate preparation units (360a-360d), a load lock unit (310) comprising at least first and second substrate positions, and a substrate handling robot for transferring substrates between the substrate preparation units and the load lock unit. The method comprises providing a sequence of substrates to be exposed to the robot, including an Nth substrate, an N-1th substrate immediately preceding the Nth substrate, and an N+1th substrate immediately following the Nth substrate; transferring the Nth substrate by means of the robot to a first one of the substrate preparation units; clamping the Nth substrate on a first substrate support structure in the first substrate preparation unit, the Nth substrate and first substrate support structure together forming a clamped Nth substrate; transferring the clamped Nth substrate by means of the robot from the first substrate preparation unit to an unoccupied one of the first and second positions in the load lock unit for exposure in the lithography system unit; and exposing the clamped Nth substrate in the lithography system unit.

Abstract translation: 一种在光刻系统的光刻系统单元中处理衬底的方法，所述光刻系统单元包括至少两个衬底准备单元（360a-360d），包括至少第一和第二衬底位置的负载锁定单元（310） 用于在基板准备单元和负载锁定单元之间传送基板的基板处理机器人。 该方法包括提供要暴露于机器人的一系列衬底，包括第N衬底，紧邻第N衬底之前的第N-1衬底和紧跟第N衬底的第N + 1衬底; 通过所述机器人将所述第N基板转移到所述基板准备单元中的第一基板; 将第N基板夹持在第一基板制备单元中的第一基板支撑结构上，第N基板和第一基板支撑结构一起形成夹紧的第N基板; 通过所述机器人将所夹紧的第N基板从所述第一基板准备单元传送到所述负载锁定单元中的未被占用的所述第一和第二位置，以在所述光刻系统单元中曝光; 并将光刻系统单元中夹紧的第N基片曝光。

公开(公告)号：WO2012143555A3

公开(公告)日：2012-12-27

申请号：PCT/EP2012057385

申请日：2012-04-23

Applicant: MAPPER LITHOGRAPHY IP BV ,  SLOT ERWIN ,  VAN KERVINCK MARCEL NICOLAAS JACOBUS ,  KUIPER VINCENT SYLVESTER

Inventor： SLOT ERWIN ,  VAN KERVINCK MARCEL NICOLAAS JACOBUS ,  KUIPER VINCENT SYLVESTER

IPC: H01J37/317 ,  G03F7/20 ,  G05B19/418

CPC classification number: G06F9/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70483 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70991 ,  G05B19/41865 ,  G06F9/4881 ,  H01J37/3177

Abstract: A clustered substrate processing system comprising a plurality of lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit, and a data network arranged for communication of data logging information from the lithography subsystems to at least one data network hub, the lithography subsystems arranged to transmit data logging information to the data network hub and the data hub arranged for receiving and storing the data logging information. The system further comprises a cluster front-end for interface to an operator or host system, the cluster front-end arranged for transmitting control information to the at least one machine control unit to control operation of the lithography subsystems for exposure of one or more wafers, and the front-end further arranged for receiving at least a portion of the data logging information received by the data network hub.

Abstract translation: 一种聚集衬底处理系统，包括多个光刻元件，每个光刻元件被布置用于根据图案数据独立地曝光衬底。 每个光刻元件包括多个光刻子系统，布置用于在光刻子系统和至少一个元件控制单元之间传送控制信息的控制网络，元件控制单元布置成将命令发送到光刻子系统和光刻子系统， 响应于元件控制单元，以及数据网络，其布置用于将数据记录信息从光刻子系统传送到至少一个数据网络集线器，光刻子系统布置成将数据记录信息传送到数据网络集线器和数据集线器， 接收和存储数据记录信息。 该系统还包括用于与操作员或主机系统接口的集群前端，该集群前端被布置为向至少一个机器控制单元传输控制信息，以控制光刻子系统的操作以暴露一个或多个晶片 并且前端进一步被安排用于接收由数据网络集线器接收的至少一部分数据记录信息。

公开(公告)号：WO2012143555A2

公开(公告)日：2012-10-26

申请号：PCT/EP2012/057385

申请日：2012-04-23

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  SLOT, Erwin ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  KUIPER, Vincent Sylvester

Inventor： SLOT, Erwin ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  KUIPER, Vincent Sylvester

IPC: H01J37/317

CPC classification number: G06F9/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70483 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70991 ,  G05B19/41865 ,  G06F9/4881 ,  H01J37/3177

Abstract: A clustered substrate processing system comprising a plurality of lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit, and a data network arranged for communication of data logging information from the lithography subsystems to at least one data network hub, the lithography subsystems arranged to transmit data logging information to the data network hub and the data hub arranged for receiving and storing the data logging information. The system further comprises a cluster front-end for interface to an operator or host system, the cluster front-end arranged for transmitting control information to the at least one machine control unit to control operation of the lithography subsystems for exposure of one or more wafers, and the front-end further arranged for receiving at least a portion of the data logging information received by the data network hub.

Abstract translation: 包括多个光刻元件的聚集基板处理系统，每个光刻元件被布置成根据图案数据独立地曝光基板。 每个光刻元件包括多个光刻子系统，布置成用于在光刻子系统与至少一个元件控制单元之间传送控制信息的控制网络，所述元件控制单元被布置成将命令传送到光刻子系统和布置成传输的光刻子系统 对元件控制单元的响应，以及布置成用于将从光刻子系统到至少一个数据网络集线器的数据记录信息进行通信的数据网络，布置成将数据记录信息发送到数据网络集线器的光刻子系统和布置成 接收和存储数据记录信息。 该系统还包括用于与操作员或主机系统接口的群集前端，群集前端被布置成将控制信息发送到至少一个机器控制单元，以控制用于曝光一个或多个晶片的光刻子系统的操作 并且所述前端还被布置成用于接收由所述数据网络集线器接收的所述数据记录信息的至少一部分。

公开(公告)号：WO2012143548A3

公开(公告)日：2012-10-26

申请号：PCT/EP2012/057366

申请日：2012-04-23

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido

Inventor： VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido

IPC: G03F7/20 ,  H01J37/317

Abstract: A clustered substrate processing system comprising one or more lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit. Each lithography element also comprises a cluster front-end for interface to an operator or host system, the front-end arranged for issuing control information to the at least one element control unit to control operation of the one or more lithography subsystems for exposure of one or more wafers. The front-end is arranged for issuing a process program to the element control unit, the process program comprising a set of predefined commands and associated parameters, each command corresponding to a predefined action or sequence of actions to be performed by one or more of the lithography subsystems, and the parameters further defining how the action or sequence of actions are to be performed.

公开(公告)号：WO2012143548A2

公开(公告)日：2012-10-26

申请号：PCT/EP2012057366

申请日：2012-04-23

Applicant: MAPPER LITHOGRAPHY IP BV ,  VAN KERVINCK MARCEL NICOLAAS JACOBUS ,  DE BOER GUIDO

Inventor： VAN KERVINCK MARCEL NICOLAAS JACOBUS ,  DE BOER GUIDO

IPC: H01J37/317

CPC classification number: G06F9/48 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70483 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70991 ,  G05B19/41865 ,  G06F9/4881 ,  H01J37/3177

Abstract: A clustered substrate processing system comprising one or more lithography elements, each lithography element arranged for independent exposure of substrates according to pattern data. Each lithography element comprises a plurality of lithography subsystems, a control network arranged for communication of control information between the lithography subsystems and at least one element control unit, the element control unit arranged to transmit commands to the lithography subsystems and the lithography subsystems arranged to transmit responses to the element control unit. Each lithography element also comprises a cluster front-end for interface to an operator or host system, the front-end arranged for issuing control information to the at least one element control unit to control operation of the one or more lithography subsystems for exposure of one or more wafers. The front-end is arranged for issuing a process program to the element control unit, the process program comprising a set of predefined commands and associated parameters, each command corresponding to a predefined action or sequence of actions to be performed by one or more of the lithography subsystems, and the parameters further defining how the action or sequence of actions are to be performed.

Abstract translation: 包括一个或多个光刻元件的聚集基板处理系统，每个光刻元件被布置成根据图案数据独立地曝光基板。 每个光刻元件包括多个光刻子系统，布置成用于在光刻子系统与至少一个元件控制单元之间传送控制信息的控制网络，所述元件控制单元被布置成将命令传送到光刻子系统和布置成传输的光刻子系统 对元件控制单元的响应。 每个光刻元件还包括用于与操作员或主机系统接口的簇前端，前端被布置为向至少一个元件控制单元发出控制信息，以控制一个或多个光刻子系统的操作以暴露一个 或更多的晶片。 前端被布置成用于向元件控制单元发出处理程序，该处理程序包括一组预定义的命令和相关联的参数，每个命令对应于由一个或多个 光刻子系统，以及进一步定义如何执行动作或动作序列的参数。

公开(公告)号：WO2013028066A1

公开(公告)日：2013-02-28

申请号：PCT/NL2012/050494

申请日：2012-07-10

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  LOOIJE, Alexius Otto ,  DANSBERG, Michel Pieter ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido

Inventor： LOOIJE, Alexius Otto ,  DANSBERG, Michel Pieter ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70775

Abstract: The invention relates to a lithography system (1) for patterning a target (30), said system comprising a feedback control system (90) comprising an actuator (40) for displacing the target, a measurement system (50) for measuring a position of said target, and a control unit (60) adapted for controlling the actuator based on the position measured by the measurement system, said feedback control system having a first latency {λι) being a maximum latency between measuring and controlling the actuator based on said measuring, a storage system (70) for storing the measured positions, comprising a receive buffer (71) and a storage unit (72) with a second latency (λ2) being an average latency between receiving measured positions in the receive buffer and storing said measured positions in the storage unit, wherein the first latency is at least an order of magnitude smaller than the second latency, the feedback control system comprising a unidirectional connection (82) for transmitting said measured positions to the storage system.

Abstract translation: 本发明涉及一种用于图案化目标（30）的光刻系统（1），所述系统包括反馈控制系统（90），所述反馈控制系统（90）包括用于移动所述目标的致动器（40），测量系统（50） 所述目标，以及控制单元（60），其适于基于由所述测量系统测量的位置来控制所述致动器，所述反馈控制系统具有第一等待时间（Δε），所述第一等待时间是基于所述致动器测量和控制所述致动器之间的最大等待时间 测量，用于存储测量位置的存储系统（70），包括接收缓冲器（71）和存储单元（72），其中第二等待时间（α2）是在接收缓冲器中接收测量位置和存储 所述存储单元中的所述测量位置，其中所述第一延迟比所述第二等待时间小至少一个数量级，所述反馈控制系统包括用于发送所述我的单向连接（82） 对存储系统进行定位。

公开(公告)号：WO2012146789A1

公开(公告)日：2012-11-01

申请号：PCT/EP2012/057959

申请日：2012-05-01

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  KUIPER, Vincent Sylvester ,  SLOT, Erwin ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido ,  DE JONG, Hendrik Jan

Inventor： KUIPER, Vincent Sylvester ,  SLOT, Erwin ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido ,  DE JONG, Hendrik Jan

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

Abstract: An apparatus (401) for transferring substrates (405) within a lithography system (300), the lithography system comprising a substrate preparation unit (360a-d) for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system (315) for receiving unclamped substrates. The apparatus comprises a body (680) provided with a first set of fingers (684a, b) for carrying an undamped substrate and a second set of fingers (685a, b) for carrying a substrate support structure (403), and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.

Abstract translation: 一种用于在光刻系统（300）内传送衬底（405）的设备（401），所述光刻系统包括用于将衬底夹持到衬底支撑结构上以形成夹持衬底的衬底制备单元（360a-d） 具有用于接收未夹紧衬底的衬底供应系统（315）。 该设备包括：主体（680），其设置有用于承载无阻尼基板的第一组指状物（684a，b）和用于承载基板支撑结构（403）的第二组指状物（685a，b），第一组 的手指位于第二组手指之下，并且第一组手指的手指具有与第二组手指的手指不同的形状。