公开(公告)号：WO2004044944A3

公开(公告)日：2004-08-19

申请号：PCT/US0334785

申请日：2003-10-31

Applicant: APPLIED MATERIALS ISRAEL LTD ,  APPLIED MATERIALS INC ,  ALONI MEIR ,  FREIDMAN MULA ,  VISHNIPOLSKY JIMMY ,  ALMOGY GILAD ,  LITMAN ALON ,  LEHMAN YONATAN ,  MESHULACH DORON ,  TIROSH EHUD

Inventor： ALONI MEIR ,  FREIDMAN MULA ,  VISHNIPOLSKY JIMMY ,  ALMOGY GILAD ,  LITMAN ALON ,  LEHMAN YONATAN ,  MESHULACH DORON

IPC: G03F7/20 ,  H01J37/317

CPC classification number: G03F7/70375 ,  G03F7/70275

Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.

Abstract translation: 用于在基底上写入主图像的方法包括将主图像分成帧矩阵，每个帧包括在主图像内的相应帧位置中定义相应帧图像的像素阵列。 当电子束在相应的帧位置上扫描时，电子束在衬底上以光栅图案扫描，同时响应于每个帧的相应帧图像而对电子束进行整形，使得在每一帧中，电子束 同时将多个像素写入到衬底上。

公开(公告)号：WO2004044653A3

公开(公告)日：2004-07-29

申请号：PCT/US0334779

申请日：2003-10-30

Applicant: APPLIED MATERIALS ISRAEL LTD ,  APPLIED MATERIALS INC ,  AVIEL DAVID ,  VISHNIPOLSKY JIMMY ,  BEN-AV RADEL

Inventor： AVIEL DAVID ,  VISHNIPOLSKY JIMMY ,  BEN-AV RADEL

IPC: G03F7/00 ,  G09G3/10 ,  G21G5/00 ,  H01J37/302 ,  H01J37/317 ,  H05B37/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31762 ,  H01J2237/31766 ,  H01J2237/31767 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a source 106 and the same plurality of target points is scanned with at least one further charged particle beam emitted by at least one further source. Further, the charged particle beams from the source and the at least one further source are emitted on the same target point at different times. Additionally, a multiple charged particle beam source and a data feed system are provided. A source array 104 comprises at least one logical emitting unit 106, wherein patterning information is shifted in a shift circuit 140, and redundancy emitting units 106, wherein individual redundancy emitting units obtain patterning information from the shift register.

Abstract translation: 用源组的带电粒子束102扫描标本105的方法。 由此，利用源106发射的带电粒子束扫描多个目标点402，并且利用由至少一个另外的源发射的至少一个另外的带电粒子束扫描相同的多个目标点。 此外，来自光源的带电粒子束和至少一个另外的源在不同的时间在相同的目标点上发射。 另外，还提供了多个带电粒子束源和数据馈送系统。 源阵列104包括至少一个逻辑发射单元106，其中图案化信息在移位电路140中被移位，以及冗余发射单元106，其中各个冗余发射单元从移位寄存器获得图案化信息。

公开(公告)号：WO2004044944A2

公开(公告)日：2004-05-27

申请号：PCT/US2003/034785

申请日：2003-10-31

Applicant: APPLIED MATERIALS ISRAEL, LTD. ,  APPLIED MATERIALS, INC. ,  TIROSH, Ehud ,  ALONI, Meir ,  FREIDMAN, Mula ,  VISHNIPOLSKY, Jimmy ,  ALMOGY, Gilad ,  LITMAN, Alon ,  LEHMAN, Yonatan ,  MESHULACH, Doron

Inventor： ALONI, Meir ,  FREIDMAN, Mula ,  VISHNIPOLSKY, Jimmy ,  ALMOGY, Gilad ,  LITMAN, Alon ,  LEHMAN, Yonatan ,  MESHULACH, Doron

IPC: H01J37/317

CPC classification number: G03F7/70375 ,  G03F7/70275

Abstract: A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.

Abstract translation: 用于在基板上写入主图像的方法包括将主图像分割为帧矩阵，每个帧包括在主图像内的相应帧位置中限定相应帧图像的像素阵列。 当电子束在相应的帧位置上被扫描时，电子束以光栅图案扫描在衬底上，同时响应于每个帧的各个帧图像而对电子束进行成形，使得在每个帧中，电子束 同时将多个像素写入基板。

公开(公告)号：WO2004044653A2

公开(公告)日：2004-05-27

申请号：PCT/US2003/034779

申请日：2003-10-30

Applicant: APPLIED MATERIALS ISRAEL, LTD. ,  APPLIED MATERIALS, INC. ,  AVIEL, David ,  VISHNIPOLSKY, Jimmy ,  BEN-AV, Radel

Inventor： AVIEL, David ,  VISHNIPOLSKY, Jimmy ,  BEN-AV, Radel

IPC: G03F7/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31762 ,  H01J2237/31766 ,  H01J2237/31767 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a source 106 and the same plurality of target points is scanned with at least one further charged particle beam emitted by at least one further source. Further, the charged particle beams from the source and the at least one further source are emitted on the same target point at different times. Additionally, a multiple charged particle beam source and a data feed system are provided. A source array 104 comprises at least one logical emitting unit 106, wherein patterning information is shifted in a shift circuit 140, and redundancy emitting units 106, wherein individual redundancy emitting units obtain patterning information from the shift register.

Abstract translation: 用于用源组的带电粒子的束102扫描试样105的方法。 因此，用源106发射的带电粒子束扫描多个目标点402，并且用至少一个另外的源发射的至少一个另外带电的粒子束扫描相同的多个目标点。 此外，来自源极和至少一个另外的源的带电粒子束在不同时间被发射在相同的目标点上。 另外，提供多重带电粒子束源和数据馈送系统。 源阵列104包括至少一个逻辑发射单元106，其中图形化信息在移位电路140中移位，以及冗余发射单元106，其中各个冗余发射单元从移位寄存器获得图形信息。