公开(公告)号：WO2013171216A4

公开(公告)日：2014-04-10

申请号：PCT/EP2013059948

申请日：2013-05-14

申请人： MAPPER LITHOGRAPHY IP BV

发明人： SPRENGERS JOHANNES PETRUS ,  OTTEN CHRISTIAAN ,  JAGER REMCO ,  STEENBRINK STIJN WILLEM HERMAN KAREL ,  KONING JOHAN JOOST ,  URBANUS WILLEM HENK ,  VAN VEEN ALEXANDER HENDRIK VINCENT

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/31774 ,  H01J2237/31794

摘要： A charged particle multi-beamlet lithography system comprising a beamlet generator for generating beamlets, a beamlet modulator for forming modulated beamlets, and a beamlet projector for projecting the modulated beamlets onto a target surface. The generator, modulator and/or projector comprise one or more plates provided with apertures for letting the beamlets pass through the plate. The apertures are grouped to form beam areas distinct from non-beam areas having no beamlet apertures. At least one of the plates with apertures is provided with a cooling arrangement (93) disposed on its surface in a non-beam area. The cooling arrangement comprising a plate-shaped body with an inlet (31) for receiving a cooling liquid, a plurality of cooling channels (94) for conveying the cooling liquid therein, and an outlet (35) for removing the cooling liquid. Between the cooling channels, the plate- shaped body has slots (34) that are aligned with the beam areas.

摘要翻译： 一种带电粒子多子束光刻系统，包括用于产生子束的子束发生器，用于形成调制子束的子束调制器以及用于将调制子束投影到目标表面上的子束投影器。 发生器，调制器和/或投影仪包括一个或多个提供有小孔的板，以使子束穿过板。 孔被分组以形成不同于不具有小射束孔径的非射束区域的射束区域。 至少一个带有孔的板设置有冷却装置（93），冷却装置（93）在其表面上布置在非束区域中。 该冷却装置包括具有用于接收冷却液体的入口（31）的板状主体，​​用于在其中输送冷却液体的多个冷却通道（94）以及用于移除冷却液体的出口（35）。 在冷却通道之间，板状体具有与梁区域对齐的槽（34）。

公开(公告)号：WO2013171216A9

公开(公告)日：2014-02-20

申请号：PCT/EP2013059948

申请日：2013-05-14

申请人： MAPPER LITHOGRAPHY IP BV

发明人： SPRENGERS JOHANNES PETRUS ,  OTTEN CHRISTIAAN ,  JAGER REMCO ,  STEENBRINK STIJN WILLEM HERMAN KAREL ,  KONING JOHAN JOOST ,  URBANUS WILLEM HENK ,  VAN VEEN ALEXANDER HENDRIK VINCENT

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/31774 ,  H01J2237/31794

摘要： A charged particle multi-beamlet lithography system comprising a beamlet generator for generating beamlets, a beamlet modulator for forming modulated beamlets, and a beamlet projector for projecting the modulated beamlets onto a target surface. The generator, modulator and/or projector comprise one or more plates provided with apertures for letting the beamlets pass through the plate. The apertures are grouped to form beam areas distinct from non-beam areas having no beamlet apertures. At least one of the plates with apertures is provided with a cooling arrangement (93) disposed on its surface in a non-beam area. The cooling arrangement comprising a plate-shaped body with an inlet (31) for receiving a cooling liquid, a plurality of cooling channels (94) for conveying the cooling liquid therein, and an outlet (35) for removing the cooling liquid. Between the cooling channels, the plate- shaped body has slots (34) that are aligned with the beam areas.

摘要翻译： 一种带电粒子多子束光刻系统，包括用于产生子束的子束发生器，用于形成调制子束的子束调制器和用于将调制的子束投影到目标表面上的子束投影仪。 发生器，调制器和/或投影仪包括设置有用于使子束通过板的孔的一个或多个板。 孔被分组以形成与不具有子束孔的非光束区域不同的光束区域。 具有孔的至少一个板设置有在非横梁区域中设置在其表面上的冷却装置（93）。 冷却装置包括具有用于接收冷却液的入口（31）的板状体，用于将冷却液输送到其中的多个冷却通道（94）和用于除去冷却液的出口（35）。 在冷却通道之间，板状体具有与梁区对准的槽（34）。

公开(公告)号：WO2012124319A1

公开(公告)日：2012-09-20

申请号：PCT/JP2012/001773

申请日：2012-03-14

申请人： CANON KABUSHIKI KAISHA ,  KATO, Takahisa ,  SETOMOTO, Yutaka

发明人： KATO, Takahisa ,  SETOMOTO, Yutaka

IPC分类号： H01J37/12

CPC分类号： H01J37/12 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1207 ,  H01J2237/31774

摘要： An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are smaller than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.

摘要翻译： 静电带电粒子束透镜包括：电极，其包括平板，该平板具有沿光轴方向延伸的法线的第一表面和与该第一表面相对的第二表面，该电极具有从第一表面延伸的通孔 表面到第二表面。 当开口横截面被定义为沿着垂直于法线的平面截取的通孔的横截面，并且代表性直径被定义为通过对开口横截面进行回归分析而获得的圆的直径时，代表 在第一表面侧的第一区域中的开口横截面的直径和位于第二表面侧的第二区域中的开口横截面的代表性直径小于开口横截面的代表性直径 第三区域，其是设置在第一表面和第二表面之间的电极中的区域。

公开(公告)号：WO2012062854A1

公开(公告)日：2012-05-18

申请号：PCT/EP2011/069840

申请日：2011-11-10

申请人： MAPPER LITHOGRAPHY IP B.V. ,  VAN VEEN, Alexander, Hendrik, Vincent ,  ZHANG, Yanxia ,  BERGLUND, Gun Sari Mari ,  KRUIT, Pieter

发明人： VAN VEEN, Alexander, Hendrik, Vincent ,  ZHANG, Yanxia ,  BERGLUND, Gun Sari Mari ,  KRUIT, Pieter

IPC分类号： H01J37/04 ,  H01J37/22 ,  H01J37/317 ,  H01J37/09 ,  H01J37/24

CPC分类号： H01J37/09 ,  H01J2237/002 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/31774

摘要： A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.

摘要翻译： 一种用于将图案转印到诸如晶片的靶的表面上的带电粒子光刻系统，包括适于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置，所述会聚装置包括 第一电极和包括多个孔的孔阵列元件，所述孔阵列元件形成第二电极，其中所述系统适于在所述第一电极和所述第二电极之间产生电场。

公开(公告)号：WO2011051301A1

公开(公告)日：2011-05-05

申请号：PCT/EP2010/066195

申请日：2010-10-26

申请人： MAPPER LITHOGRAPHY IP B.V. ,  WIELAND, Marco Jan-Jaco ,  POSTMA, Ferry Michael

发明人： WIELAND, Marco Jan-Jaco ,  POSTMA, Ferry Michael

IPC分类号： H01J37/317 ,  H01J37/04

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

摘要： The invention relates to a modulation device for use in a charged particle multi -beamlet lithography system. The device includes a body comprising an interconnect structure 100) provided with a plurality of modulators and interconnects at different levels within the interconnect structure for enabling connection of the modulators to one or more pattern data receiving elements. A modulator includes a first electrode (132), a second electrode (134), and an aperture (135) extending through the body. The electrodes are located on opposing sides of the aperture for generating an electric field across the aperture. At least one of the first electrode and the second electrode includes a first conductive element (110) formed at a first level of the interconnect structure and a second conductive element (110) formed at a second level of the interconnect structure. The first and second conductive elements are electrically connected with each other.

摘要翻译： 本发明涉及一种用于带电粒子多光束光刻系统的调制装置。 该装置包括具有在互连结构内的不同级别的多个调制器和互连的互连结构100）的主体，用于使调制器能够连接到一个或多个模式数据接收元件。 调制器包括第一电极（132），第二电极（134）和延伸穿过本体的孔（135）。 电极位于孔的相对侧上，以产生穿过孔的电场。 第一电极和第二电极中的至少一个包括形成在互连结构的第一水平处的第一导电元件（110）和形成在互连结构的第二级处的第二导电元件（110）。 第一和第二导电元件彼此电连接。

公开(公告)号：WO2007048433A1

公开(公告)日：2007-05-03

申请号：PCT/EP2005/011593

申请日：2005-10-28

申请人： CARL ZEISS SMS GMBH ,  PLATZGUMMER, Elmar ,  KNIPPELMEYER, Rainer

发明人： PLATZGUMMER, Elmar ,  KNIPPELMEYER, Rainer

IPC分类号： H01J37/04 ,  H01J37/317

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3023 ,  H01J2237/0435 ,  H01J2237/30472 ,  H01J2237/31754 ,  H01J2237/31774

摘要： A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.

摘要翻译： 带电粒子束曝光系统具有由移位寄存器（75）控制的孔组（53）的消隐孔阵列（31），其中对移位寄存器的不同输入（C）影响不同数量的孔。 与移位寄存器的时钟信号同步地，穿过孔的带电粒子子束跨带电粒子敏感衬底扫描。

公开(公告)号：WO2007028595A2

公开(公告)日：2007-03-15

申请号：PCT/EP2006/008693

申请日：2006-09-06

申请人： CARL ZEISS SMT AG ,  APPLIED MATERIALS ISRAEL, LTD ,  CASARES, Antonio ,  KNIPPELMEYER, Rainer ,  KEMEN, Thomas ,  BAYER, Thomas ,  FRITZ, Georg ,  GRESCHNER, Johann ,  KALT, Samuel

发明人： CASARES, Antonio ,  KNIPPELMEYER, Rainer ,  KEMEN, Thomas ,  BAYER, Thomas ,  FRITZ, Georg ,  GRESCHNER, Johann ,  KALT, Samuel

IPC分类号： H01J37/09 ,  H01J37/04 ,  H01J37/317

CPC分类号： H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

摘要： The present invention relates to a particle-optical component comprising a first multi -aperture plate, and a second multi -aperture plate forming a gap between them; wherein a plurality of apertures of the first multi -aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.

摘要翻译： 本发明涉及一种包括第一多孔板的颗粒光学部件和在它们之间形成间隙的第二多孔板; 其中所述第一多孔板的多个孔被布置成使得所述第一多孔板的所述多个孔的每个孔与所述第二多孔板的多个孔的对应孔对齐; 并且其中所述间隙在第一位置具有第一宽度，在第二位置处具有第二宽度，并且其中所述第二宽度比所述第一宽度大至少5％。 此外，本发明涉及包含这些部件的带电粒子系统和布置以及制造具有弯曲表面的多孔板的方法。

公开(公告)号：WO2005074002A2

公开(公告)日：2005-08-11

申请号：PCT/US2005/001756

申请日：2005-01-20

申请人： APPLIED MATERIALS ISRAEL, LTD. ,  APPLIED MATERIALS, INC. ,  ROGERS, Steve, Robert

发明人： ROGERS, Steve, Robert

IPC分类号： H01J37/21

CPC分类号： H01J37/21 ,  H01J37/153 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/2538 ,  H01J2237/2817 ,  H01J2237/31774

摘要： Apparatus for focusing a charged particle beam onto a surface, including a charged particle beam generator which is adapted to project the charged particle beam onto a location on the surface, thereby causing charges to be emitted from the location. The apparatus further includes an imaging detector which is adapted to receive the charges so as to form an image of the location, and an aberrating element which is positioned before the imaging detector and which is adapted to produce an aberration in the image. A processor is adapted to receive the image and to adjust at least one of the charged particle beam generator and a position of the surface in response to the aberration.

摘要翻译： 用于将带电粒子束聚焦到表面上的装置，包括带电粒子束发生器，其适于将带电粒子束投射到表面上的位置，从而导致从该位置发射电荷。 该装置还包括成像检测器，其适于接收电荷以形成该位置的图像，以及位于成像检测器之前并且适于产生图像中的像差的像差元件。 处理器适于接收图像并且响应于像差而调整带电粒子束发生器和表面中的至少一个。

公开(公告)号：WO2016036246A2

公开(公告)日：2016-03-10

申请号：PCT/NL2015/050610

申请日：2015-09-03

申请人： TECHNISCHE UNIVERSITEIT DELFT

发明人： KRUIT, Pieter

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01J2237/31774 ,  H01J2237/31798

摘要： The invention relates to an assembly for inspecting the surface of a sample. The assembly comprises two or more multi-beam electron column units. Each unit comprises : a single thermal field emitter for emitting a diverging electron beam towards a beam splitter; wherein the beam splitter comprises a first multi-aperture plate comprising multiple apertures for creating multiple primary electron beams; a collimator lens for collimating the diverging electron beam from the emitter; an objective lens unit for focusing said multiple primary electron beams on said sample; and a multi-sensor detector system for separately detecting the intensity of secondary electron beams created by each one of said focused primary electron beams on said sample. The two or more multi-beam electron column units are arranged adjacent to each other for inspecting different parts of the surface of the sample at the same time.

摘要翻译： 本发明涉及一种用于检查样品表面的组件。 组件包括两个或多个多光束电子柱单元。 每个单元包括：单个热场发射器，用于朝向分束器发射发散的电子束; 其中所述分束器包括包括用于产生多个一次电子束的多个孔的第一多孔板; 用于准直来自发射器的发散电子束的准直透镜; 用于将所述多个一次电子束聚焦在所述样品上的物镜单元; 以及用于分别检测由所述样品上的所述聚焦的一次电子束中的每一个产生的二次电子束的强度的多传感器检测器系统。 两个以上的多光束电子柱单元彼此相邻布置，用于同时检查样品表面的不同部分。

公开(公告)号：WO2015039101A1

公开(公告)日：2015-03-19

申请号：PCT/US2014/055868

申请日：2014-09-16

申请人： KLA-TENCOR CORPORATION

发明人： PLETTNER, Thomas ,  NASSER-GHODSI, Mehran

IPC分类号： H01J1/30

CPC分类号： H01J37/153 ,  B82Y15/00 ,  B82Y40/00 ,  H01J9/025 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/28 ,  H01J37/285 ,  H01J2203/0216 ,  H01J2237/06375 ,  H01J2237/28 ,  H01J2237/31774 ,  Y10S977/842 ,  Y10S977/939

摘要： A field emission device comprises one or more emitter elements, each having a high aspect ratio structure with a nanometer scaled cross section; and one or more segmented electrodes, each surrounding one of the one or more emitters. Each of the one or more segmented electrodes has multiple electrode plates. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

摘要翻译： 场发射器件包括一个或多个发射极元件，每个发射极元件具有纳米尺度横截面的高纵横比结构; 以及一个或多个分段电极，每个围绕所述一个或多个发射器中的一个发射器。 一个或多个分段电极中的每一个具有多个电极板。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。