公开(公告)号：WO2013106800A1

公开(公告)日：2013-07-18

申请号：PCT/US2013/021346

申请日：2013-01-13

Applicant: MEADWESTVACO PACKAGING SYSTEMS, LLC ,  ZHU, Lin

Inventor： ZHU, Lin

IPC: B65D71/42

CPC classification number: B65D71/42 ,  B65D2571/00141 ,  B65D2571/0016 ,  B65D2571/00283 ,  B65D2571/0029 ,  B65D2571/00444 ,  B65D2571/0066 ,  B65D2571/00796

Abstract: A blank (10, 110, 210, 310, 410) for forming a package, includes a top panel (12) and at least one article receiving aperture (31). The one article receiving aperture is defined by a notional endless line along which a series of major tabs (31a, 31'a, 31b, 31'b) and a series of minor tabs (24, 24', 25) are disposed. The major tabs include four oppositely disposed tabs and the minor tabs include four oppositely disposed tabs. Each minor tab is formed between or from two adjacent major tabs. The major tabs are shaped and sized to contact the upper portion of an article when received in the article receiving aperture.

Abstract translation: 用于形成包装的坯件（10,110,210,310,410）包括顶板（12）和至少一个物品接收孔（31）。 一个物品接收孔由一个意想不到的环形线限定，沿着该线形成一系列主突片（31a，31'a，31b，31'b）和一系列小突片（24,24'，25）。 主要标签包括四个相对设置的突片，并且次突片包括四个相对布置的突片。 每个小突片形成在两个相邻的主标签之间或之间。 主要突片的形状和尺寸在接收物品接收孔时接触物品的上部。

公开(公告)号：WO2002081767A2

公开(公告)日：2002-10-17

申请号：PCT/US2002/010516

申请日：2002-04-04

Applicant: TOSOH SMD, INC. ,  WICKERSHAM, Charles, E., Jr. ,  POOLE, John, E. ,  LEYBOVICH, Alexander ,  ZHU, Lin

Inventor： WICKERSHAM, Charles, E., Jr. ,  POOLE, John, E. ,  LEYBOVICH, Alexander ,  ZHU, Lin

IPC: C23C

CPC classification number: H01J37/3426 ,  C23C14/3414

Abstract: The present invention relates to a method for determining a critical size for a diameter of an Al 2 O 3 inclusion (38) in an Al or Al alloy sputter target (42) to prevent arcing during sputtering thereof. This method includes providing a sputtering apparatus having an argon plasma. The plasma has a plasma sheath of a known thickness during sputtering under a selected sputtering environment of an Al or Al alloy sputter target having an Al 2 O 3 inclusion-free sputtering surface. When the thickness of the sheath is known for a selected sputtering environment, the critical size of an Al 2 O 3 inclusion (38) can be determined based upon the thickness of the sheath. More specifically, the diameter of an Al 2 O 3 inclusion (38) in an Al or Al alloy sputter target (42) must be less than the thickness of the plasma sheath during sputtering under the selected sputtering environment to inhibit arcing.

Abstract translation: 本发明涉及一种用于确定Al或Al合金溅射靶（42）中的Al 2 O 3夹杂物（38）的直径的临界尺寸的方法，以防止溅射期间的电弧。 该方法包括提供具有氩等离子体的溅射装置。 在Al或Al合金溅射靶的选择溅射环境下，溅射中等离子体具有已知厚度的等离子体护套，其具有不含Al 2 O 3的不含杂质的溅射表面。 当对于所选择的溅射环境已知护套的厚度时，可以基于护套的厚度确定Al 2 O 3夹杂物（38）的临界尺寸。 更具体地，Al或Al合金溅射靶（42）中的Al 2 O 3夹杂物（38）的直径必须小于在所选择的溅射环境下溅射期间等离子体护套的厚度以抑制电弧。

公开(公告)号：WO2008115313A1

公开(公告)日：2008-09-25

申请号：PCT/US2008/001249

申请日：2008-01-30

Applicant: THE GATES CORPORATION ,  FAN, Xinjian ,  YUAN, Jing ,  ZHU, Lin ,  FENG, Yuding

Inventor： FAN, Xinjian ,  YUAN, Jing ,  ZHU, Lin ,  FENG, Yuding

IPC: B62M21/00 ,  F16H55/14 ,  F16H55/30

CPC classification number: F16H55/14 ,  B62M21/00 ,  F16H55/171

Abstract: A motorcycle wheel isolator comprising a first sprocket member (600), the first sprocket member having a first projecting member (300), a second hub member (400), the second hub member having a second projecting member (401), at least one first projecting member disposed between two second projecting members (401), whereby a receiving portion (601) is defined, at least one resilient isolator (10) having a first portion and a second portion connected by a connecting member (150), the resilient isolator disposed in the receiving portion, an edge of each first portion and second portion having a chamfer (175, 176) disposed adjacent either the first projecting member or second. projecting member, each first portion and second portion having a projecting member (102, 104, 204,. 205) disposed on an outer surface of each first portion and second portion such that a compressive force applied to the first portion and second portion causes a bending mode in each first portion and second portion, and each first portion and second portion having- a relief portion (40, 50, 60) disposed on an outer surface of each first portion and second portion such that the first portion and second portion may expand under the compressive force.

Abstract translation: 一种摩托车车轮隔离器，包括第一链轮构件（600），所述第一链轮构件具有第一突出构件（300），第二轮毂构件（400），所述第二轮毂构件具有第二突出构件（401），至少一个 第一突出构件设置在两个第二突出构件（401）之间，由此限定接收部分（601），至少一个弹性隔离器（10），具有第一部分和由连接构件（150）连接的第二部分，弹性 隔离器设置在接收部分中，每个第一部分的边缘和第二部分具有邻近第一突出部件或第二部分设置的倒角（175,176）。 每个第一部分和第二部分具有设置在每个第一部分和第二部分的外表面上的突出部件（102,104,204,205），使得施加到第一部分和第二部分的压缩力导致 每个第一部分和第二部分具有设置在每个第一部分和第二部分的外表面上的释放部分（40,50,60），使得第一部分和第二部分可以 在压缩力下膨胀。

公开(公告)号：WO02081767A3

公开(公告)日：2002-12-05

申请号：PCT/US0210516

申请日：2002-04-04

Applicant: TOSOH SMD INC ,  WICKERSHAM CHARLES E JR ,  POOLE JOHN E ,  LEYBOVICH ALEXANDER ,  ZHU LIN

Inventor： WICKERSHAM CHARLES E JR ,  POOLE JOHN E ,  LEYBOVICH ALEXANDER ,  ZHU LIN

IPC: C23C14/34

CPC classification number: H01J37/3426 ,  C23C14/3414

Abstract: The present invention relates to a method for determining a critical size for a diameter of an Al2O3 inclusion (38) in an Al or Al alloy sputter target (42) to prevent arcing during sputtering thereof. This method includes providing a sputtering apparatus having an argon plasma. The plasma has a plasma sheath of a known thickness during sputtering under a selected sputtering environment of an Al or Al alloy sputter target having an Al2O3 inclusion-free sputtering surface. When the thickness of the sheath is known for a selected sputtering environment, the critical size of an Al2O3 inclusion (38) can be determined based upon the thickness of the sheath. More specifically, the diameter of an Al2O3 inclusion (38) in an Al or Al alloy sputter target (42) must be less than the thickness of the plasma sheath during sputtering under the selected sputtering environment to inhibit arcing.

Abstract translation: 本发明涉及一种用于确定Al或Al合金溅射靶（42）中的Al2O3夹杂物（38）的直径的临界尺寸的方法，以防止溅射期间的电弧放电。 该方法包括提供具有氩等离子体的溅射设备。 在具有不含Al 2 O 3夹杂物的溅射表面的Al或Al合金溅射靶的选定溅射环境下，等离子体具有已知厚度的等离子体鞘。 当对于选择的溅射环境已知鞘的厚度时，可基于鞘的厚度确定Al2O3夹杂物（38）的临界尺寸。 更具体地，Al或Al合金溅射靶（42）中的Al 2 O 3夹杂物（38）的直径必须小于溅射期间溅射过程中等离子体鞘的厚度以抑制电弧放电。

公开(公告)号：WO2002086186A1

公开(公告)日：2002-10-31

申请号：PCT/US2002/004819

申请日：2002-02-20

Applicant: TOSOH SMD, INC. ,  IVANOV, Eugene, Y. ,  SMATHERS, David, B. ,  WICKERSHAM, Charles, E., Jr. ,  ZHU, Lin

Inventor： IVANOV, Eugene, Y. ,  SMATHERS, David, B. ,  WICKERSHAM, Charles, E., Jr. ,  ZHU, Lin

IPC: C23C14/35

CPC classification number: H01J37/3482 ,  C23C14/3407 ,  C23C14/35

Abstract: A method of constructing increased life sputter targets and targets made by the method are disclosed. The method comprises starting with a precursor target design or profile and making magnetic field strength measurements along the radial surface of same and at a plurality of vertical dimensions above the surface. An optimal magnetic field strength ratio is provided between the erosion tracks of the target. The vertical dimension of the material to be added to one of the erosion tracks is determined and then the height of the other erosion track is calculated by utilizing this optimal magnetic field strength ratio.

Abstract translation: 公开了一种通过该方法制造增加寿命的溅射靶和靶的方法。 该方法包括从前体靶设计或轮廓开始，并沿着相同的表面的径向表面和在表面上方的多个垂直尺寸进行磁场强度测量。 在目标的侵蚀轨迹之间提供最佳磁场强度比。 确定要添加到一个侵蚀轨迹中的材料的垂直尺寸，然后通过利用该最佳磁场强度比来计算另一个侵蚀轨迹的高度。