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公开(公告)号:WO2004103039A1
公开(公告)日:2004-11-25
申请号:PCT/JP2004/006649
申请日:2004-05-18
Inventor: 小田 和範
IPC: H05K1/11
CPC classification number: H01L21/486 , H01L23/142 , H01L2224/16 , H01L2224/73204 , H01L2924/00011 , H01L2924/00014 , H01L2924/01078 , H01L2924/01079 , H01L2924/15311 , H05K3/108 , H05K3/26 , H05K3/28 , H05K3/4069 , H05K3/426 , H05K3/427 , H05K2201/09563 , H05K2201/0959 , H05K2201/09827 , H05K2203/025 , H05K2203/0353 , Y10T29/49165 , H01L2224/0401
Abstract: Wiring layers (191, 192) are formed on both roughened base surfaces (110S) of a core base (110) by a semi-additive method, only one layer on each surface. The wirings of the wiring layers are electrically connected through a though hole (180) made in the core base. The through hole is made in the core base by using a laser and filled with an electrical connection portion (193) formed by plating. The both sides of the core base are coated with a solder resist (160), with a predetermined terminal portion (170) exposed. The outer surfaces of the through hole and the outer surfaces of the wiring layers are planalized by mechanical polishing, chemical-mechanical polishing, or the like.
Abstract translation: 通过半添加法在芯基(110)的两个粗糙化的基面(110S)上形成布线层(191,192),每个表面上只有一层。 布线层的布线通过在芯基部中形成的通孔(180)电连接。 通孔使用激光器形成在芯基体中,并且填充有通过电镀形成的电连接部分(193)。 核心基座的两侧涂覆有防焊剂(160),暴露预定的端子部分(170)。 通孔的外表面和布线层的外表面通过机械抛光,化学机械抛光等进行平面化。