公开(公告)号：WO2016003758A1

公开(公告)日：2016-01-07

申请号：PCT/US2015/037607

申请日：2015-06-25

Applicant: ADVANCED ENERGY INDUSTRIES, INC.

Inventor： MUELLER, Michael ,  CHOI, Sam

IPC: H05H1/46 ,  H03B28/00

CPC classification number: H01J37/32155 ,  H01J37/32146 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32926 ,  H01J37/32935 ,  H01J37/3299 ,  H05H1/46 ,  H05H2001/4645 ,  H05H2001/4682

Abstract: This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.

Abstract translation: 本公开描述了用于脉冲RF功率输送到等离子体负载以用于衬底的等离子体处理的系统，方法和装置。 为了最大化功率传递，使用在腔室中使用虚设衬底或无衬底的校准阶段来确定每个脉冲的优选的固定初始RF频率。 然后，在处理阶段，在每个脉冲的开始处使用该固定的初始RF频率，其中在腔室中使用和处理实际的基板。