Abstract:
Method for preparing a superhydrophilic coating consisting essentially of silicon oxide is provided. The method includes providing an aqueous mixture comprising a fluorine-containing silicon complex and a fluorine scavenger; and contacting a substrate with the aqueous mixture at a temperature of less than about 100 °C to obtain said superhydrophilic coating on the substrate. Superhydrophilic coating consisting essentially of silicon dioxide islands with each island having a size in the range of about 10 nm to about 50 nm, and use of the superhydrophilic coating in various applications, such as lens, goggles, anti-fouling coatings, self-cleaning surfaces, mirrors, windshields, windows, primer layer for surfaces, and covers for cookware, are also provided.
Abstract:
The invention relates to a method for forming low emissivity doped zinc oxide films on a substrate, and in particular, to a method for forming low emissivity gallium doped zinc oxide films on a substrate via a low temperature chemical bath deposition technique.