公开(公告)号：WO2004108985A3

公开(公告)日：2005-06-30

申请号：PCT/IB2004001642

申请日：2004-05-19

Applicant: AIR LIQUIDE

Inventor： JURSICH GREGORY M ,  INMAN RONALD S

IPC: C23C16/40 ,  C23C16/44 ,  C23C16/455 ,  H01L21/314 ,  H01L21/316 ,  H01L21/318 ,  C23C16/30 ,  C23C16/34

CPC classification number: C23C16/45553 ,  C23C16/403 ,  H01L21/02178 ,  H01L21/02181 ,  H01L21/02194 ,  H01L21/02205 ,  H01L21/0228 ,  H01L21/3145 ,  H01L21/31616 ,  H01L21/31645 ,  H01L21/318

Abstract: A method of forming an aluminum containing film on a substrate includes providing a precursor having the chemical structure: AI(NR1R2)(NR3R4)(NR5R6); where each of R1, R2, R3, R4, R5 and R6 is independently selected from the group consisting of hydrogen and an alkyl group including at least two carbon atoms. The precursor is utilized to form a film on the substrate including at least one of aluminum oxide, aluminum nitride and aluminum oxy-nitride. Each of the R1 - R6 groups can be the same or different and can by straight or branched chain alkyls. An exemplary precursor that has is useful in forming aluminum containing films is tris diethylamino aluminum.

Abstract translation: 在基板上形成含铝膜的方法包括提供具有以下化学结构的前体：Al（NR1R2）（NR3R4）（NR5R6）; 其中R 1，R 2，R 3，R 4，R 5和R 6各自独立地选自氢和包括至少两个碳原子的烷基。 该前体用于在基底上形成包含氧化铝，氮化铝和氮氧化铝中的至少一种的膜。 每个R 1 -R 6基团可以相同或不同，并且可以通过直链或支链烷基。 可用于形成含铝膜的示例性前体是三乙基氨基铝。

公开(公告)号：WO2008139417A2

公开(公告)日：2008-11-20

申请号：PCT/IB2008051885

申请日：2008-05-13

Applicant: AIR LIQUIDE ,  TRANG DUY K ,  PETERSCHMITT MATTHIEU E ,  MARTIN RAUL A ,  GHANI M USMAN ,  WANG JIAN ,  LORELLI JEFFREY E ,  SOULET AXEL ,  COLIN CHRISTOPHE ,  INMAN RONALD S

Inventor： TRANG DUY K ,  PETERSCHMITT MATTHIEU E ,  MARTIN RAUL A ,  GHANI M USMAN ,  WANG JIAN ,  LORELLI JEFFREY E ,  SOULET AXEL ,  COLIN CHRISTOPHE ,  INMAN RONALD S

IPC: B01F3/08 ,  B01F5/00 ,  B01F5/04 ,  B01F5/06 ,  B01F13/10

CPC classification number: B01F3/0865 ,  B01F5/0057 ,  B01F5/045 ,  B01F5/0463 ,  B01F5/0609 ,  B01F5/0682 ,  B01F5/0688 ,  B01F13/1013 ,  B01F13/1027 ,  B01F15/00136 ,  B01F15/0022 ,  B01F15/00285 ,  B01F2215/0096 ,  H01L21/6704

Abstract: Methods and fluid delivery systems mix fluids together. A blender of the system receives and blends at least two chemical compounds together for delivery to one or more vessels, tanks or process tools, such as chemical baths that facilitate processing (e.g., cleaning) of semiconductor wafers or other components. A first fluid enters into a bore of a mixing chamber of the blender through an aperture in a wall of the chamber to enable blending of the first fluid with a second fluid injected into a central region of the bore.

Abstract translation: 方法和流体输送系统将液体混合在一起。 该系统的混合器将至少两种化合物混合在一起，将其输送到一个或多个容器，罐或加工工具，例如促进半导体晶片或其它组件的处理（例如，清洁）的化学浴池。 第一流体通过室的壁中的孔进入混合器的混合室的孔中，以使第一流体与注入孔的中心区域的第二流体相混合。