公开(公告)号：WO2019089190A1

公开(公告)日：2019-05-09

申请号：PCT/US2018/054918

申请日：2018-10-09

Applicant: APPLIED MATERIALS, INC.

Inventor： BABAYAN, Viachslav ,  ALLEN, Adolph Miller ,  CITLA, Bhargav ,  DEDORE, Ronald D. ,  FAUNE, Vanessa ,  HUA, Zhong Qiang ,  SONI, Vaibhav ,  WU, Menglu

IPC: H01L21/02 ,  H05H1/46 ,  H01L21/67 ,  C23C16/455 ,  H01L21/28

Abstract: An apparatus and method of forming a dielectric film layer using a physical vapor deposition process include delivering a sputter gas to a substrate positioned in a processing region of a process chamber, the process chamber having a dielectric-containing sputter target, delivering an energy pulse to the sputter gas to create a sputtering plasma, the sputtering plasma being formed by energy pulses having an average voltage between about 800 volts and about 2000 volts and an average current between about 50 amps and about 300 amps at a frequency which is less than 50 kHz and greater than 5 kHz and directing the sputtering plasma toward the dielectric-containing sputter target to form an ionized species comprising dielectric material sputtered from the dielectric-containing sputter target, the ionized species forming a dielectric-containing film on the substrate.

公开(公告)号：WO2011109337A3

公开(公告)日：2011-09-09

申请号：PCT/US2011/026601

申请日：2011-03-01

Applicant: APPLIED MATERIALS, INC. ,  RASHEED, Muhammad M. ,  DEDORE, Ronald D. ,  COX, Michael S. ,  MILLER, Keith A. ,  YOUNG, Donny ,  FORSTER, John C. ,  ALLEN, Adolph M. ,  HAWRYLCHAK, Lara

Inventor： RASHEED, Muhammad M. ,  DEDORE, Ronald D. ,  COX, Michael S. ,  MILLER, Keith A. ,  YOUNG, Donny ,  FORSTER, John C. ,  ALLEN, Adolph M. ,  HAWRYLCHAK, Lara

IPC: C23C14/34 ,  C23C14/54 ,  C23C14/35

Abstract: Apparatus and methods for performing plasma processing on a wafer supported on a pedestal are provided. The apparatus can include a pedestal on which the wafer can be supported, a variable capacitor having a variable capacitance, a motor attached to the variable capacitor which varies the capacitance of the variable capacitor, a motor controller connected to the motor that causes the motor to rotate, and an output from the variable capacitor connected to the pedestal. A desired state of the variable capacitor is associated with a process recipe in a process controller. When the process recipe is executed the variable capacitor is placed in the desired state.