公开(公告)号：WO2023076182A1

公开(公告)日：2023-05-04

申请号：PCT/US2022/047603

申请日：2022-10-24

Applicant: APPLIED MATERIALS, INC.

Inventor： MOYNE, James Robert ,  ISKANDAR, Jimmy

IPC: G05B19/418 ,  G05B23/02 ,  G06N20/00

Abstract: A method includes receiving one or more fingerprint dimensions to be used to generate a fingerprint. The method further includes receiving trace data associated with a manufacturing process. The method further includes applying the one or more fingerprint dimensions to the trace data to generate at least one feature. The method further includes generating the fingerprint based on the at least one feature. The method further includes causing, based on the fingerprint, performance of a corrective action associated with one or more manufacturing processes.

公开(公告)号：WO2016048622A1

公开(公告)日：2016-03-31

申请号：PCT/US2015/048481

申请日：2015-09-04

Applicant: APPLIED MATERIALS, INC.

Inventor： KOMMISETTI, Subrahmanyam Venkata Rama ,  LUO, Haw Jyue ,  ISKANDAR, Jimmy ,  LAI, Hsincheng ,  HAWKINS, Parris

IPC: H01L21/66 ,  H01L21/67 ,  G05B23/02

CPC classification number: G06F17/5009 ,  G05B23/0221 ,  G05B23/024 ,  G05B2219/37537 ,  G06F7/556 ,  G06F2207/556

Abstract: Embodiments disclosed herein include methods for reducing or eliminating the impact of tuning disturbances during prediction of lamp failure. In one embodiment, the method comprises monitoring data of a lamp module for a process chamber using one or more physical sensors disposed at different locations within the lamp module, creating virtual sensors based on monitoring data of the lamp module, and providing a prediction model for the lamp module using the virtual sensors as inputs.

Abstract translation: 本文公开的实施例包括用于在灯故障预测期间减少或消除调谐干扰的影响的方法。 在一个实施例中，该方法包括使用布置在灯模块内的不同位置处的一个或多个物理传感器来监视处理室的灯模块的数据，基于灯模块的监视数据创建虚拟传感器，并且为 灯模块使用虚拟传感器作为输入。

公开(公告)号：WO2022016011A1

公开(公告)日：2022-01-20

申请号：PCT/US2021/041885

申请日：2021-07-15

Applicant: APPLIED MATERIALS, INC.

Inventor： ISKANDAR, Jimmy ,  ARMACOST, Michael D.

IPC: G05B23/02 ,  G05B19/418 ,  H01L21/67 ,  G06K9/627 ,  G06K9/6284 ,  G06K9/6289 ,  G06K9/6298 ,  G06N3/04

Abstract: Implementations disclosed describe a method and a system to perform the method of obtaining a reduced representation of a plurality of sensor statistics representative of data collected by a plurality of sensors associated with a device manufacturing system performing a manufacturing operation. The method further includes generating, using a plurality of outlier detection models, a plurality of outlier scores, each of the plurality of outlier scores generated based on the reduced representation of the plurality of sensor statistics using a respective one of the plurality of outlier detection models. The method further includes processing the plurality of outlier scores using a detector neural network to generate an anomaly score indicative of a likelihood of an anomaly associated with the manufacturing operation.

公开(公告)号：WO2007038382A2

公开(公告)日：2007-04-05

申请号：PCT/US2006/037165

申请日：2006-09-22

Applicant: APPLIED MATERIALS, INC.

Inventor： STOVALL, Scott, C. ,  BULLER, Benyamin ,  ISKANDAR, Jimmy ,  YU, Ming, Lun

IPC: G01K1/08

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304

Abstract: A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by subtracting a previous deflector voltage value with a current deflector voltage value; determining a plurality of correction values using the voltage step value and an exposure time for the current deflector voltage value; selecting a current voltage correction value from the plurality of correction values using the current deflector voltage value; and calculating a corrected deflector voltage value by adding the current voltage correction value to the current deflector voltage value.

Abstract translation: 确定在诸如粒子束光刻的系统中使用的诸如粒子或其它束的束的形状和位置校正的系统和方法。 提供校正的偏转器电压的方法可以包括通过用电流偏转器电压值减去先前的偏转器电压值来确定电压阶跃值; 使用所述电压阶跃值和所述电流偏转器电压值的曝光时间来确定多个校正值; 使用所述电流偏转器电压值从所述多个校正值中选择当前电压校正值; 以及通过将当前电压校正值与当前偏转器电压值相加来计算校正的偏转器电压值。