公开(公告)号：WO2022098567A1

公开(公告)日：2022-05-12

申请号：PCT/US2021/057195

申请日：2021-10-29

Applicant: APPLIED MATERIALS, INC.

Inventor： KONNOTH JOSEPH, Job George ,  GANTA, Sathya Swaroop ,  BERA, Kallol ,  NGUYEN, Andrew ,  PINSON, II, Jay D. ,  DHANAKSHIRUR, Akshay ,  ALAYAVALLI, Kaushik Comandoor ,  LAI, Canfeng ,  DUAN, Ren-Guan ,  SUN, Jennifer Y. ,  KALAL, Anil Kumar ,  PANDEY, Abhishek

IPC: H01J37/32 ,  H01F1/04 ,  C23C16/50 ,  C23C16/44

Abstract: A plasma chamber includes a chamber body having a processing region therewithin, a liner disposed on the chamber body, the liner surrounding the processing region, a substrate support disposed within the liner, a magnet assembly comprising a plurality of magnets disposed around the liner, and a magnetic-material shield disposed around the liner, the magnetic-material shield encapsulating the processing region near the substrate support.

公开(公告)号：WO2021252140A1

公开(公告)日：2021-12-16

申请号：PCT/US2021/032660

申请日：2021-05-17

Applicant: APPLIED MATERIALS, INC.

Inventor： WANG, Huiyuan ,  KUSTRA, Rick ,  ALAYAVALLI, Kaushik ,  VENKATASUBRAMANIAN, Eswaranand ,  PINSON, II, Jay D. ,  MALLICK, Abhijit B.

IPC: C23C16/44 ,  C23C16/505 ,  C23C16/26 ,  B08B2209/08 ,  B08B5/00 ,  B08B7/00 ,  B08B9/08 ,  H01J2237/335 ,  H01J37/32862

Abstract: Embodiments of the present disclosure generally relate to clean methods for processing chambers, and more specifically relate to plasma clean methods for removing carbon films from surfaces within the processing chamber. A method for cleaning includes introducing a cleaning gas into a processing region within a processing chamber, where interior surfaces of the processing chamber have a coating containing amorphous carbon. The cleaning gas contains oxygen gas and a noble gas. The method also includes generating an ion coupled plasma (ICP) from the cleaning gas within an upper portion of the processing region and generating a bias across a substrate support in a lower portion of the processing region. The method further includes exposing the amorphous carbon to atomic oxygen ions produced from the oxygen gas and the ICP and removing the amorphous carbon from the interior surfaces with the atomic oxygen ions during a cleaning process.