公开(公告)号：WO2023039094A1

公开(公告)日：2023-03-16

申请号：PCT/US2022/042945

申请日：2022-09-08

Applicant: APPLIED MATERIALS, INC.

Inventor： CRIMINALE, Phillip ,  MYLES, Andrew ,  ZHANG, Chunlei ,  SHAH, Vivek B. ,  UMMETHALA, Upendra

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/66

Abstract: An electronic device manufacturing system includes a transfer chamber, a tool station situated within the transfer chamber, a process chamber coupled to the transfer chamber, and a transfer chamber robot. The transfer chamber robot is configured to transfer substrates to and from the process chamber. The transfer chamber robot is further configured to be coupled to a sensor tool comprising one or more sensors configured to take measurements inside the process chamber. The sensor tool is retrievable from the tool station by an end effector of the transfer chamber robot.

公开(公告)号：WO2023034559A1

公开(公告)日：2023-03-09

申请号：PCT/US2022/042442

申请日：2022-09-02

Applicant: APPLIED MATERIALS, INC.

Inventor： DOERING, Kenneth Brian ,  SHAH, Vivek B. ,  AGARWAL, Ashutosh ,  BALUJA, Sanjeev ,  SAMPATHKUMAR, Shrihari ,  ZHANG, Chunlei

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687 ,  C23C16/52 ,  C23C16/455 ,  C23C16/458

Abstract: Metrology slot plates, processing chamber lids and processing chambers having metrology slot plates are described. Each of the metrology slot plates independently comprises one or more of a plate blank, a reflectometer, a capacitance sensor, a gas flow meter, a manometer, a pyrometer, a distance sensor (laser) or an emissometer.

公开(公告)号：WO2023283271A1

公开(公告)日：2023-01-12

申请号：PCT/US2022/036263

申请日：2022-07-06

Applicant: APPLIED MATERIALS, INC.

Inventor： SHAH, Vivek B. ,  ZHANG, Chunlei

IPC: H01L21/677 ,  H01L21/67 ,  B25J11/00 ,  B25J19/02

Abstract: Disclosed herein are embodiments of a transfer chamber robot and methods of using the same. In one embodiment, a process tool for an electronic device manufacturing system comprises a transfer chamber, process chamber coupled to the transfer chamber, and a transfer chamber robot. The transfer chamber robot is configured to transfer substrates to and from the process chamber, and comprises a sensor configured to take measurements inside the process chamber.

公开(公告)号：WO2020023853A1

公开(公告)日：2020-01-30

申请号：PCT/US2019/043624

申请日：2019-07-26

Applicant: APPLIED MATERIALS, INC.

Inventor： SHAH, Vivek B. ,  HASSAN, Vinayak Vishwanath ,  KUMAR, Bhaskar ,  BALASUBRAMANIAN, Ganesh

IPC: H01J37/32 ,  H01L21/67

Abstract: Apparatus and methods for generating a flow of radicals are provided. An ion blocker is positioned a distance from a faceplate of a remote plasma source. The ion blocker has openings to allow the plasma to flow through. The ion blocker is polarized relative to a showerhead positioned on an opposite side of the ion blocker so that there are substantially no plasma gas ions passing through the showerhead.