公开(公告)号：WO2007059347A2

公开(公告)日：2007-05-24

申请号：PCT/US2006/044915

申请日：2006-11-17

Applicant: APPLIED MATERIALS, INC. ,  INAGAWA, Makoto ,  HOSOKAWA, Akihiro ,  LE, Hien-minh, Huu ,  LAVITSKY, Ilya ,  WHITE, John, M. ,  MARTIN, Todd ,  STIMSON, Bradley, O.

Inventor： INAGAWA, Makoto ,  HOSOKAWA, Akihiro ,  LE, Hien-minh, Huu ,  LAVITSKY, Ilya ,  WHITE, John, M. ,  MARTIN, Todd ,  STIMSON, Bradley, O.

IPC: C23C14/32 ,  C23C14/00

CPC classification number: C23C14/3407 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/3435 ,  H01J37/3452 ,  H01J37/3455

Abstract: A magnetron scanning and support mechanism in which the magnetron (326) is partially supported from an a support plate (268) in overhead scanning mechanism through multiple springs (330) coupled to different horizontal locations on the magnetron and partially supported from below on sliders or rollers (282) at multiple locations on the target. In one embodiment, the yoke plate is continuous and uniform, hi another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes (220, 224), for example, of complementary serpentine shape and each supporting magnets of respective polarity. In another embodiment, the target and magnetron are divided into respective strips (262, 264) separated by other structure. Each magnetron strip is supported partially from above from a common scanning plate and partially on a respective target strip. A centering mechanism (350, 358, 362, 368) may align the different magnetron strips.

Abstract translation: 磁控管扫描和支撑机构，其中磁控管（326）通过耦合到磁控管上的不同水平位置的多个弹簧（330）从架空扫描机构中的支撑板（268）部分地支撑并且从下方部分地支撑在滑块或 滚轮（282）在目标上的多个位置。 在一个实施例中，轭板是连续的和均匀的。在另一个实施例中，磁控管的磁轭被分成例如互补蛇形形状的两个柔性轭（220,224）和各极性的每个支撑磁体。 在另一个实施例中，靶和磁控管被分成由其他结构分开的各个条（262,264）。 每个磁控管从上面部分地从普通扫描板支撑并部分地支撑在相应的目标条上。 定心机构（350,358,362,368）可以对准不同的磁控管条。

公开(公告)号：WO2007118204A2

公开(公告)日：2007-10-18

申请号：PCT/US2007/066166

申请日：2007-04-06

Applicant: APPLIED MATERIALS, INC. ,  LAU, Allen Ka-ling ,  INAGAWA, Makoto ,  STIMSON, Bradley, O. ,  HOSOKAWA, Akihiro ,  WHITE, John, M. ,  YE, Yan ,  KADAM, Ankur ,  LI, Yanping

Inventor： LAU, Allen Ka-ling ,  INAGAWA, Makoto ,  STIMSON, Bradley, O. ,  HOSOKAWA, Akihiro ,  WHITE, John, M. ,  YE, Yan ,  KADAM, Ankur ,  LI, Yanping

IPC: C23C14/32 ,  C23C14/00

CPC classification number: C23C14/564 ,  C23C14/0063 ,  C23C14/35 ,  H01J37/3244 ,  H01J37/34 ,  H01J37/3438

Abstract: The present invention generally comprises one or more cooled anodes shadowing one or more gas introduction tubes where both the cooled anodes and the gas introduction tubes span a processing space defined between one or more sputtering targets and one or more substrates within a sputtering chamber. The gas introduction tubes may have gas outlets that direct the gas introduced away from the one or more substrates. The gas introduction tubes may introduce reactive gas, such as oxygen, into the sputtering chamber for depositing TCO films by reactive sputtering. During a multiple step sputtering process, the gas flows (i.e., the amount of gas and the type of gas), the spacing between the target and the substrate, and the DC power may be changed to achieve a desired result.

Abstract translation: 本发明通常包括遮蔽一个或多个气体引入管的一个或多个冷却阳极，其中冷却的阳极和气体引入管两者跨越限定在一个或多个溅射靶与一个或多个溅射靶之间的处理空间 衬底在溅射室内。 气体引入管可以具有气体出口，该气体出口引导从一个或多个基底引出的气体。 气体引入管可以将反应性气体例如氧气引入溅射室中以通过反应性溅射来沉积TCO膜。 在多步骤溅射过程中，可以改变气体流量（即气体量和气体种类），靶材与基材之间的间距以及DC功率，以达到所需的结果。

公开(公告)号：WO2010044895A3

公开(公告)日：2010-04-22

申请号：PCT/US2009/032776

申请日：2009-01-31

Applicant: APPLIED MATERIALS, INC ,  WHITE, John, M. ,  STIMSON, Bradley, O.

Inventor： WHITE, John, M. ,  STIMSON, Bradley, O.

IPC: H05H1/36 ,  H01L21/205 ,  H01L21/3065

Abstract: RF power is coupled with different phase offsets to different RF connection points (31- 34) on an electrode (20-26) of a plasma chamber. Preferably, the number of different RF connection points and corresponding phase offsets is at least four, and the positions of the RF connection points are distributed along two orthogonal dimensions (for example, X and Y axes) of the electrode. Preferably, power to each respective RF connection point is supplied by a respective RF power supply (41-44), wherein each power supply synchronizes its phase to a common reference RF oscillator (70).

公开(公告)号：WO1997042648A1

公开(公告)日：1997-11-13

申请号：PCT/US1997008008

申请日：1997-05-08

Applicant: APPLIED MATERIALS, INC.

Inventor： APPLIED MATERIALS, INC. ,  SUBRAMANI, Anantha ,  FORSTER, John ,  STIMSON, Bradley, O. ,  EDELSTEIN, Sergio ,  GRUNES, Howard ,  TEPMAN, Avi ,  XU, Zheng

IPC: H01J37/32

CPC classification number: H01J37/32504 ,  H01J37/321 ,  H01J37/32623 ,  H01J37/32651 ,  H01J37/34

Abstract: A recessed coil for a plasma chamber in a semiconductor fabrication system is provided. Recessing the coil reduces deposition of material onto the coil which in turn leads to a reduction in particulate matter shed by the coil onto the workpiece.

Abstract translation: 提供了一种用于半导体制造系统中的等离子体室的凹陷线圈。 嵌入线圈减少了材料在线圈上的沉积，这又导致线圈在工件上脱落的颗粒物质的减少。