公开(公告)号：WO2019240915A1

公开(公告)日：2019-12-19

申请号：PCT/US2019/033259

申请日：2019-05-21

Applicant: APPLIED MATERIALS, INC.

Inventor： WU, Jian ,  LIU, Wei ,  WANG, Linlin ,  GUARINI, Theresa Kramer ,  BEVAN, Malcolm ,  HAWRYLCHAK, Lara

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/02 ,  H01L21/56

Abstract: Embodiments described herein generally relate to a method and apparatus for fabricating a chamber component for a plasma process chamber. In one embodiment a chamber component used within a plasma processing chamber is provided that includes a metallic base material comprising a roughened non-planar first surface, wherein the roughened non-planar surface has an Ra surface roughness of between 4 micro-inches and 80 micro-inches, a planar silica coating formed over the roughened non-planar surface, wherein the planar silica coating has a surface that has an Ra surface roughness that is less than the Ra surface roughness of the roughened non-planar surface, a thickness between about 0.2 microns and about 10 microns, less than 1% porosity by volume, and contains less than 2E 12 atoms/centimeters 2 of aluminum.

公开(公告)号：WO2022010599A1

公开(公告)日：2022-01-13

申请号：PCT/US2021/035639

申请日：2021-06-03

Applicant: APPLIED MATERIALS, INC.

Inventor： WU, Jian ,  HAWRYLCHAK, Lara ,  DUAN, Ren-Guan ,  HWANG, Bernard L. ,  BEVAN, Malcolm J. ,  LIU, Wei

IPC: H01J37/32 ,  H01L21/683 ,  B08B7/0035 ,  H01J2237/334 ,  H01J2237/335 ,  H01J37/3244 ,  H01J37/32495 ,  H01J37/32513 ,  H01L21/67028 ,  H01L21/67069 ,  H01L21/6833

Abstract: A method and apparatus for the use of hydrogen plasma treatments is described herein. The process chamber includes a plurality of chamber components. The plurality of chamber components may be coated with a yttrium zirconium oxide composition, such as a Y2O3-ZrO2 solid solution. Some of the plurality of chamber components are replaced with a bulk yttrium zirconium oxide ceramic. Yet other chamber components are replaced with similar components of different materials.