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    POLARIZATION INDEPENDENT METROLOGY SYSTEM
    1.
    发明申请
    POLARIZATION INDEPENDENT METROLOGY SYSTEM 审中-公开
    极化独立计量系统

    公开(公告)号：WO2017071925A1

    公开(公告)日：2017-05-04

    申请号：PCT/EP2016/073820

    申请日：2016-10-06

    Applicant: ASML HOLDING N.V.

    Inventor： SHOME, Krishanu ,  KREUZER, Justin, Lloyd

    IPC: G03F7/20 ,  G03F9/00

    CPC classification number: G03F7/70566 ,  G03F9/7065 ,  G03F9/7088

    Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.

    Abstract translation: 测量系统包括产生光的辐射源，光学调制单元，反射器，干涉仪和检测器。 光调制单元在时间上将光的第一偏振模式与光的第二偏振模式分离。 反射器将光导向衬底。 干涉仪干涉来自衬底上的图案的衍射光或来自衬底的反射光，并且从干涉产生输出光。 检测器接收来自干涉仪的输出光。 输出光的第一和第二偏振模式在检测器处暂时分离。

    NOISE CORRECTION FOR ALIGNMENT SIGNAL
    2.
    发明申请
    NOISE CORRECTION FOR ALIGNMENT SIGNAL 审中-公开

    公开(公告)号：WO2020126816A1

    公开(公告)日：2020-06-25

    申请号：PCT/EP2019/084870

    申请日：2019-12-12

    Applicant: ASML HOLDING N.V.

    Inventor： DASTOURI, Zahrasadat ,  ANDERSSON, Greger, Göte ,  SHOME, Krishanu ,  AARTS, Igor, Matheus, Petronella

    IPC: G03F9/00

    Abstract: A method of applying a measurement correction includes determining an orthogonal subspace used to characterize the measurement as a plot of data. A first axis of the orthogonal subspace corresponds to constructive interference output from an interferometer of the metrology system plus a first error variable and a second axis of the orthogonal subspace corresponds to destructive interference output from the interferometer of the metrology system plus a second error variable. The method also includes determining a slope of the plot of data and determining a fitted line to the plot of data in the orthogonal subspace based on the slope.

    OPTICAL SYSTEM OF AN ALIGNMENT SYSTEM
    3.
    发明申请
    OPTICAL SYSTEM OF AN ALIGNMENT SYSTEM 审中-公开
    对准系统的光学系统

    公开(公告)号：WO2017021131A1

    公开(公告)日：2017-02-09

    申请号：PCT/EP2016/067102

    申请日：2016-07-19

    Applicant: ASML HOLDING N.V.

    Inventor： SHOME, Krishanu ,  KREUZER, Justin, Lloyd

    IPC: G03F7/20 ,  G03F9/00

    CPC classification number: G03F9/7065

    Abstract: An optical system for improving alignment measurement accuracy is discussed. The optical system includes first and second optical elements. The first optical element may be configured to change a first beam having a first polarization state into a second beam having a second polarization state. The second optical element may be configured to provide total internal reflection of the second beam and to change the second beam into a third beam having a third polarization state. The first, second, and third polarization states may be different from each other.

    Abstract translation: 讨论了一种提高对准测量精度的光学系统。 光学系统包括第一和第二光学元件。 第一光学元件可以被配置为将具有第一偏振状态的第一光束改变成具有第二偏振状态的第二光束。 第二光学元件可以被配置为提供第二光束的全内反射并且将第二光束改变成具有第三偏振状态的第三光束。 第一，第二和第三极化状态可以彼此不同。

    APPARATUS FOR SENSING ALIGNMENT MARKS
    4.
    发明申请
    APPARATUS FOR SENSING ALIGNMENT MARKS 审中-公开

    公开(公告)号：WO2021156069A1

    公开(公告)日：2021-08-12

    申请号：PCT/EP2021/051363

    申请日：2021-01-21

    Applicant: ASML HOLDING N.V.

    Inventor： SHOME, Krishanu ,  KREUZER, Justin, Lloyd

    IPC: G03F9/00

    Abstract: An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.

    LITHOGRAPHIC APPARATUS, METROLOGY SYSTEM, AND ILLUMINATION SYSTEMS WITH STRUCTURED ILLUMINATION
    8.
    发明申请
    LITHOGRAPHIC APPARATUS, METROLOGY SYSTEM, AND ILLUMINATION SYSTEMS WITH STRUCTURED ILLUMINATION 审中-公开

    公开(公告)号：WO2021058313A1

    公开(公告)日：2021-04-01

    申请号：PCT/EP2020/075668

    申请日：2020-09-14

    Applicant: ASML HOLDING N.V.

    Inventor： LIN, Yuxiang ,  ADAMS, Joshua ,  ELAZHARY, Tamer, Mohamed, Tawfik, Ahmed, Mohamed ,  SHOME, Krishanu

    IPC: G03F7/20 ,  G01N21/956 ,  G03F9/00

    Abstract: A system (500) includes an illumination system (502), a lens element (506), and a detector (504). The illumination system generates a beam of radiation (510) having a first spatial intensity distribution (800) at a pupil plane (528) and a second spatial intensity distribution (900) at a plane of a target (514). The first spatial intensity distribution comprises an annular intensity profile (802) or an intensity profile corresponding to three or more beams. The lens element focuses the beam onto the target. The second spatial intensity distribution is a conjugate of the first intensity distribution and has an intensity profile corresponding to a central beam (902) and one or more side lobes (904) that are substantially isolated from the central beam. The central beam has a beam diameter of approximately 20 microns or less at the target. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation..

    WAFER ALIGNMENT USING FORM BIREFRINGENCE OF TARGETS OR PRODUCT
    9.
    发明申请
    WAFER ALIGNMENT USING FORM BIREFRINGENCE OF TARGETS OR PRODUCT 审中-公开

    公开(公告)号：WO2020169357A1

    公开(公告)日：2020-08-27

    申请号：PCT/EP2020/053044

    申请日：2020-02-06

    Applicant: ASML HOLDING N.V.

    Inventor： ADAMS, Joshua ,  LIN, Yuxiang ,  SHOME, Krishanu ,  NIJMEIJER, Gerrit, Johannes ,  AARTS, Igor, Matheus, Petronella

    IPC: G03F9/00

    Abstract: An alignment method includes directing an illumination beam with a first polarization state to form a diffracted beam with a second polarization state from an alignment target, and passing the diffracted beam through a polarization analyzer. The alignment method further includes measuring a polarization state of the diffracted beam and determining a location of the alignment target from the measured polarization state relative to its initial polarization state. The alignment target includes a plurality of diffraction gratings with a single pitch and two or more duty cycles, wherein the pitch is smaller than a wavelength of the illumination beam, and the location of the alignment target corresponds to the duty cycle of the diffraction grating.

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