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公开(公告)号：WO2019141481A1
公开(公告)日：2019-07-25
申请号：PCT/EP2018/085918
申请日：2018-12-19
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： BROUWER, Cornelis, Melchior , SHOME, Krishanu
Abstract: A system for and method of processing a wafer in which a scan signal is analyzed locally to extract information about alignment, overlay, mark quality, wafer quality, and the like.
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公开(公告)号：WO2021144066A1
公开(公告)日：2021-07-22
申请号：PCT/EP2020/084787
申请日：2020-12-07
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
IPC: G03F7/20 , G01B9/02 , G03F9/00 , H01L23/544 , G03F7/70633 , G03F7/70683 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , H01L2223/54426 , H01L2223/5446
Abstract: A substrate, associated patterning device and a method. The substrate includes at least one periodic alignment mark and at least one neighboring structure. The alignment mark comprises at least a first part having a direction of periodicity in a first direction and at least a second part having a direction of periodicity in a second direction. Over the extent of a scan length of a scanning of a measurement spot over the alignment mark, the alignment mark is such that when a first region of the measurement spot comprises neighboring structure, a second region of the measurement spot comprises no parallel structure to the neighboring structure within the first region. The first region and second region comprise regions which correspond when one is rotated 180 degrees relative to the other within the measurement spot.
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公开(公告)号：WO2020043582A1
公开(公告)日：2020-03-05
申请号：PCT/EP2019/072433
申请日：2019-08-22
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： ELAZHARY, Tamer, Mohamed, Tawfik, Ahmed, Mohamed , KREUZER, Justin, Lloyd , BIJNEN, Franciscus, Godefridus, Casper , SHOME, Krishanu
Abstract: An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark. Also disclosed is a system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to an optical fiber arrangement to obtain information such as the position of the mark and distortions within the mark.
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公开(公告)号：WO2021083649A1
公开(公告)日：2021-05-06
申请号：PCT/EP2020/078615
申请日：2020-10-12
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： ALSAQQA, Ali , EL-GHUSSEIN, Fadi , KESSELS, Lambertus, Gerardus, Maria , REZVANI NARAGHI, Roxana , SHOME, Krishanu , BRUNNER, Timothy, Allan , SOKOLOV, Sergei
IPC: G03F9/00
Abstract: A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.
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公开(公告)号：WO2019206586A1
公开(公告)日：2019-10-31
申请号：PCT/EP2019/058335
申请日：2019-04-03
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： HUISMAN, Simon, Reinald , ELAZHARY, Tamer, Mohamed, Tawfik, Ahmed, Mohamed , LIN, Yuxiang , TRAN, Vu, Quang , GOORDEN, Sebastianus, Adrianus , KREUZER, Justin, Lloyd , MASON, Christopher, John , AARTS, Igor, Matheus, Petronella , SHOME, Krishanu , TZEMAH, Irit
Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
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Patent Agency Ranking6.发明申请
公开(公告)号：WO2022223260A1
公开(公告)日：2022-10-27
申请号：PCT/EP2022/058678
申请日：2022-03-31
Applicant: ASML NETHERLANDS B.V.
Inventor： SHOME, Krishanu , COSTON, Scott, Douglas , DU, Kan
Abstract: A method includes determining optical aberrations of an optical system, identifying an illumination profile that compensates for the optical aberrations of the optical system, and curing a layer of optical cement of an optical device using a modulated energy beam to achieve the identified illumination profile.
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公开(公告)号：WO2017071925A1
公开(公告)日：2017-05-04
申请号：PCT/EP2016/073820
申请日：2016-10-06
Applicant: ASML HOLDING N.V.
Inventor： SHOME, Krishanu , KREUZER, Justin, Lloyd
CPC classification number: G03F7/70566 , G03F9/7065 , G03F9/7088
Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.
Abstract translation: 测量系统包括产生光的辐射源，光学调制单元，反射器，干涉仪和检测器。 光调制单元在时间上将光的第一偏振模式与光的第二偏振模式分离。 反射器将光导向衬底。 干涉仪干涉来自衬底上的图案的衍射光或来自衬底的反射光，并且从干涉产生输出光。 检测器接收来自干涉仪的输出光。 输出光的第一和第二偏振模式在检测器处暂时分离。
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公开(公告)号：WO2020126816A1
公开(公告)日：2020-06-25
申请号：PCT/EP2019/084870
申请日：2019-12-12
Applicant: ASML HOLDING N.V.
Inventor： DASTOURI, Zahrasadat , ANDERSSON, Greger, Göte , SHOME, Krishanu , AARTS, Igor, Matheus, Petronella
IPC: G03F9/00
Abstract: A method of applying a measurement correction includes determining an orthogonal subspace used to characterize the measurement as a plot of data. A first axis of the orthogonal subspace corresponds to constructive interference output from an interferometer of the metrology system plus a first error variable and a second axis of the orthogonal subspace corresponds to destructive interference output from the interferometer of the metrology system plus a second error variable. The method also includes determining a slope of the plot of data and determining a fitted line to the plot of data in the orthogonal subspace based on the slope.
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公开(公告)号：WO2017021131A1
公开(公告)日：2017-02-09
申请号：PCT/EP2016/067102
申请日：2016-07-19
Applicant: ASML HOLDING N.V.
Inventor： SHOME, Krishanu , KREUZER, Justin, Lloyd
CPC classification number: G03F9/7065
Abstract: An optical system for improving alignment measurement accuracy is discussed. The optical system includes first and second optical elements. The first optical element may be configured to change a first beam having a first polarization state into a second beam having a second polarization state. The second optical element may be configured to provide total internal reflection of the second beam and to change the second beam into a third beam having a third polarization state. The first, second, and third polarization states may be different from each other.
Abstract translation: 讨论了一种提高对准测量精度的光学系统。 光学系统包括第一和第二光学元件。 第一光学元件可以被配置为将具有第一偏振状态的第一光束改变成具有第二偏振状态的第二光束。 第二光学元件可以被配置为提供第二光束的全内反射并且将第二光束改变成具有第三偏振状态的第三光束。 第一，第二和第三极化状态可以彼此不同。
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公开(公告)号：WO2021156069A1
公开(公告)日：2021-08-12
申请号：PCT/EP2021/051363
申请日：2021-01-21
Applicant: ASML HOLDING N.V.
Inventor： SHOME, Krishanu , KREUZER, Justin, Lloyd
IPC: G03F9/00
Abstract: An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.
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