公开(公告)号：WO2014124769A1

公开(公告)日：2014-08-21

申请号：PCT/EP2014/050552

申请日：2014-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： KUZNETSOV, Alexey ,  BOOGAARD, Arjen ,  HUIJBREGTSE, Jeroen ,  NIKIPELOV, Andrey ,  VAN KAMPEN, Maarten

IPC: G21K1/06 ,  H05G2/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  C23C28/34 ,  G03F1/24 ,  G03F7/70033 ,  G21K2201/067 ,  H05G2/008

Abstract: A method of manufacturing a multi-layer mirror (500) comprising a multi-layer stack of pairs of alternating layers of a first material (510) and silicon (520), the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer (540) of the first material with a dopant material.

Abstract translation: 一种制造多层反射镜（500）的方法，所述多层反射镜（500）包括第一材料（510）和硅（520）的交替层对的多层堆叠，所述方法包括沉积第一 材料和硅层，所述堆叠由衬底支撑并且用掺杂剂材料掺杂所述第一材料的至少第一层（540）。

公开(公告)号：WO2016001351A1

公开(公告)日：2016-01-07

申请号：PCT/EP2015/065080

申请日：2015-07-02

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey, Alexandrovich ,  BANINE, Vadim, Yevgenyevich ,  BENSCHOP, Jozef, Petrus, Henricus ,  BOOGAARD, Arjen ,  DHALLUIN, Florian, Didier, Albin ,  KUZNETSOV, Alexey, Sergeevich ,  PÉTER, Mária ,  SCACCABAROZZI, Luigi ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  YAKUNIN, Andrei, Mikhailovich

IPC: G03F7/20 ,  G03F1/00 ,  G03F1/62 ,  G02B5/08 ,  G02B5/20

CPC classification number: G03F1/62 ,  G02B5/1838 ,  G02B5/208 ,  G03F1/24 ,  G03F1/38 ,  G03F7/70191 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983

Abstract: Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 10 17 cm -3 , and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.

Abstract translation: 公开了对EUV辐射透射的膜，其可以用作光刻设备中的防护薄膜组件或光谱过滤器。 膜包括一个或多个高掺杂区域，其中所述膜掺杂有大于1017cm-3的掺杂剂浓度，以及具有低（或不）掺杂的一个或多个区域。 膜可以具有具有低掺杂和一个或多个附加层的主衬底，其中所述高掺杂区域包含在所述附加层的一些或全部内。