公开(公告)号：WO2019115144A1

公开(公告)日：2019-06-20

申请号：PCT/EP2018/081498

申请日：2018-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： MA, Yue ,  DZIOMKINA, Nina, Vladimirovna ,  STEWART IV, John, Tom ,  LI, Tianqi

IPC: G01N29/02 ,  G01N29/036 ,  G01N21/15

CPC classification number: G01N29/022 ,  G01N29/036 ,  G01N2291/0256

Abstract: An apparatus includes: a vessel; a target delivery system that directs a target toward an interaction region in the vessel, the target including target matter that emits extreme ultraviolet light when in a plasma state; and a metrology apparatus. The metrology apparatus includes a measurement system having a measurement surface configured to measure a flux of target matter; and a regeneration tool configured to regenerate the measurement system. Regeneration includes: preventing the measurement surface from becoming saturated, and/or de-saturating the measurement surface if it has become saturated.

公开(公告)号：WO2019158492A1

公开(公告)日：2019-08-22

申请号：PCT/EP2019/053350

申请日：2019-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： XIA, Chunguang ,  BAEK, Jonghoon ,  STEWART IV, John, Tom ,  LAFORGE, Andrew, David ,  VAN HEIJNSBERGEN, Deniz ,  EVANS, David, Robert ,  DZIOMKINA, Nina, Vladimirovna ,  MA, Yue

IPC: G03F7/20 ,  B08B5/00 ,  H05G2/00 ,  H05H1/24

Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

公开(公告)号：WO2019001931A1

公开(公告)日：2019-01-03

申请号：PCT/EP2018/065180

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： STEVENS, Lucas, Henricus, Johannes ,  DZIOMKINA, Nina, Vladimirovna ,  FERNANDEZ DIAZ, Laura, Maria ,  PIJNENBURG, Johannes, Adrianus, Cornelis, Maria

IPC: G03F7/20

Abstract: A system comprising: a substrate support configured to hold a substrate; a conductive or semi- conductive element contacting the substrate support and covering at least part of the substrate support; and a charging device configured to apply a positive potential to the conductive or semi-conductive element with respect to the part of the substrate support that is covered by the conductive or semi- conductive element.